分类
规格型号
全部 更多 98% 97% 95% ≥95% ≥98% 99% 96% >98.0%(GC) ≥97% ≥98%(HPLC) ≥99% >97.0%(GC) >98.0%(HPLC) 分析标准品 >98.0%(T) 90% >99% >95.0%(GC) >98.0% ≥98.0% AR ≥98.0%(GC) 99.99% metals basis ≥99%(HPLC) >98.0%(GC)(T) 99.9% metals basis >98.0%(HPLC)(T) >96.0%(GC) / ≥96% >99.0%(GC) MW 5000 Da >98% >98%(HPLC) ≧95% ≥98.0%(HPLC) >97.0%(T) ≥90% 99.95% metals basis BR MW 2000 Da ≥98%(GC) >97.0%(HPLC) ≥97.0% MW 3400 Da >97% >97.0% >95% Sublimed,>99%(HPLC) >95.0%(T) >98.0%(HPLC)(N) ≥98% (HPLC) 99.999% metals basis ≥95%(HPLC) 分析标准品,≥98% ≥97.0%(GC) 98% (HPLC) 93% 85% >90.0%(GC) A solution in ethanol >95.0%(HPLC) ≥97%(HPLC) A solution in methyl acetate 98%,99% ee ≥95.0% >98.0%(N) MW 10000 Da AR,99% 94% ≥98%(T) ≥95.0%(GC) CP ACS AR,99.0% 99.50% ≥97% (HPLC) 80% >95.0% >97.0%(GC)(T) >99.0%(T) 99.5% >99%(HPLC) AR,99% MW 20000 Da ≥98%(GC)(T) AR,98% 0.5 M in THF 98.00% AR,99.0% 99.90% 100 ug/mL in Isooctane 92% MW 1000 Da >93.0%(GC) 99.99% Sublimed,>99% ≥97%(GC) ≥99.0% >97.0%(HPLC)(T) ≥95% (HPLC) 1000ug/ml in Purge and Trap Methanol AR,98% 分析对照品 >96.0%(HPLC) CP,98% Standard for GC,≥99.5%(GC) AR,99.5% >94.0%(GC) >96.0%(T) 2000ug/ml in Purge and Trap Methanol standard for GC,≥99.5%(GC) GR ≥85% >97%(HPLC) ≥94% ≥95%(GC) ≥96.0%(GC) AR,99.5% ≥98.0% (HPLC) ≥99.99% metals basis 1000μg/ml,in Purge and Trap Methanol >85.0%(GC) 分析标准品,≥99.5%(GC) analytical standard,1000ug/ml in methanol ≥99.5% 分析标准品,>98% 98.0% (HPLC) 99.9% trace metals basis 99.9% >96.0% 分析标准品,99% 超干级, 99.99% metals basis 99.5% metals basis ≥98%(HPLC)(T) 分析标准品,98% ≥80% >90.0%(HPLC) ≥93% ≥99%(GC) ≥99.0%(GC) SP 75% ≥97.0%(HPLC) 99.995% metals basis >99.0%(HPLC) ≥98.0%(T) 100μg/mL in Methanol,不确定度3% In solution >96% 70% 99.9% (REO) 99.99% trace metals basis >95.0%(GC)(T) >97.0%(N) ≥98 % 95%,99% ee >90.0%(T) Biological stain 试剂级 1.0 M in THF >98.0%(N)(T) ≥96%(HPLC) >95.0%(HPLC)(T) >98%(NMR) 100-200 mesh, 1%DVB,Substitution 0.3-0.8mmol/g 95% (HPLC) >97.0%(HPLC)(N) CP,98% MW 40000 Da ≥96.0% 指示剂级 >98%(GC) MW 600 Da ≥90%(HPLC) 91% 98 atom % D CP,98.0% Standard for GC,>99.5%(GC) USP级 analytical standard,1.00mg/ml in methanol analytical standard,100ug/ml in acetone analytical standard,10ug/ml in acetone ≥92% ≥97.0% (HPLC) 分析标准品,99.5% 分析标准品,≥99% 药用级 97%,>99% ee 97.0% (HPLC) 99.8% metals basis 99.95% >99%(NMR) AR,98.0% MW 30000 Da Standard for GC, ≥99.5% (GC) 1000μg/mL in Acetonitrile,不确定度2% 99% metals basis >96.0%(GC)(T) None 超干级, 99.99% (REO) 1000μg/mL in Methanol,不确定度2% 95%,MW 10000 Da 99.99% (REO) 99.999% trace metals basis >95%(HPLC) ACS,≥99.0% ≥95%(T) ≥97 % ≥97%(T) 超纯级 98%(GC) 99.98% metals basis >80.0%(GC) >95.0%(N) >99.0% >99.5% natural ≥99%(T) 分析标准品,>99.5%(GC) 无水级,≥99% 70 kDa 97.00% >98.0%(GC)(N) analytical standard ≥96%(GC) 分析标准品,用于环境分析 >93.0%(T) >99%(GC) >99.5%(GC) ≥90%(GC) ≥98%(LC) 填充液 离子强度调节剂 100μg/mL in Acetonitrile,不确定度3% 50 μg/mL in isooctane 97.0% (GC) 99.8% >93.0%(HPLC) >98%(LC) A solution in ethanol,≥98% AR,98.0% analytical standard,100ug/ml in petroleum ether ≥97%(GC)(T) ≥99.5%(GC) 指示剂 >95% 0.1M 标准液 50 μg/ml in ethanol 95%, MW 1000 Da 95%,MW 2000 Da 95%,MW 20000 Da 98.5% ACS, ≥99.0% ≥90% (HPLC) ≥98%(N) 分析标准品,≥99.8%(GC) >98% 0.1% 1000ppm 标准液 1000μg/ml ±1% (20℃) 100μg/mL in Methanol,不确定度:3% 10× 95% (LC/MS-ELSD) 97% (HPLC) 99% trace metals basis 99.00% 99.998% metals basis >90% >99.0% (GC) ≥90.0% ≥95.0%(HPLC) 元素分析仪专用 分析标准品,≥98% 熔点标准品 >97% 1000μg/mL in Methanol,不确定度:2% 100μg/ml ±2% (20℃) 20 kDa 4 kDa 40 kDa 40% 95%,MW 1000 Da 95%,MW 3400 Da 95%,MW 5000 Da AR,98.5% Standard for GC analytical standard,10ug/ml in petroleum ether standard for GC, ≥99.5% (GC) ≥70% 高纯级 1mg/ml in water 98%,GC >85.0%(HPLC) >96.0%(HPLC)(T) Analytical Volumetric Solution,0.05M Analytical Volumetric Solution,0.1M Analytical Volumetric Solution,0.5M Standard for GC,>99%(GC) ≥90.0%(GC) ≥95 % ≥98%(HPLC)(N) ≥99 % 工业级 强度:100% 生物技术级 100% 100.00% 1000ug/ml in Acetone 50% 95%, MW 10000 Da 97% 98.0% (TLC) >99% (HPLC) Analytical Volumetric Solution,1.0M GR,99% MW 400 Da MW 750 Da Standard for GC,≥99.7%(GC) ≥98%(LC&N) ≥99.0% (GC) ≥99.0%(HPLC) ≥99.9% trace metals basis 无水, 粉末, 99.99% metals basis 1 L/pouch 10% (w/v) 1000μg/mL in Methanol 1000μg/ml in Water (20℃) 100μg/mL in Methanol 25μg/mL in acetonitrile 50% in H2O 98.50% 99.9% (metals basis) A solution in acetonitrile A solution in ethanol,>98% AR,99.8% CP,97% CP,98.0% analytical standard,100ug/ml in methanol ≥97.0%(T) ≥99.9% 分析标准品,≥99.0%(GC) 0.3~0.8 mmol/g, 100~200 mesh 1% DVB 0.5 M solution in THF 1.00mg/ml 10 kDa 150 kDa 65% 99.997% metals basis >70.0%(GC) >92.0%(HPLC) >99.0%(GC)(T) AR,97% MW 350 Da Sublimed product ≥98.0% (GC) ≥98.5% 分析标准品,98.5% 分析标准品,≥99.7%(GC) 0.1mg/ml (100ppm) 1.0 M in methylene chloride 100μg/ml in Water (20℃) 1mg/ml (1,000ppm) 2.0 M in THF 20 wt. % in H2O 40-60目 500 kDa 60-80目 80-100目 89% 95+% 98%,T 99.5% trace metals basis 99.9%-Ce(REO) 99.9999% metals basis >80.0%(T) >92.0%(GC) >94.0%(HPLC) >99.0%(HPLC)(T) >99.5% , recrystallized 4 times ACS, ≥99% CP,99.0% D,99% GR,99% GR,99.5% GR,99.8% Isotopic purity: 98% MW 550 Da USP ≥98% (TLC) 分析对照品,98% 分析标准品,≥97% 无水, 粉末, 99.99% metals basis 0.3~0.8mmol/g, 100~200 mesh, 1% DVB 1.0M in THF 1000μg/mL 1mg/ml in 0.005% HN03 500μg/ml ±1% (20℃) 60% 95%,MW 600 Da 95.0% (GC) 95% 97%(GC) 98%(HPLC) 98%,ee99% 98.0% (GC) 98% 99 atom % D 99%,用于细胞培养 99.7% >75.0%(GC) >80.0%(HPLC) >88.0%(GC) >95.0%(HPLC)(N) >96.0%(N) >97.0%(N)(T) A solution in ethanol,≥95% ACS,≥99.5% AR,95% AR,97.0% AR,98.5% AR,≥99% GR,99.5% Indicator Type:Concentration:200ug/ml in high-purity Hexane;US EPA Methods:625,8270C analytical standard,100μg/ml in acetone standard for GC,>99.5%(GC) ≥75% ≥85%(GC) ≥95.0% (HPLC) ≥95.0%(T) ≥96.0%(HPLC) ≥97%(HPLC)(T) ≥97.0% (GC) ≥98%(GC&T) ≥98%(T)(HPLC) ≥98.0 % ≥99% (GC) 丰度:10atom%;化学纯度:≥98.5% 农残级 分析标准品,97% 分析标准品,>99%(GC) 分析标准品,>99% 分析标准品,≥99.5% 分析标准品,≥99.9%(GC) 无水级,99.8% 粒径:20 nm,单位:>0.75 A520 Units/ml,溶剂:柠檬酸钠溶液 超干级, 99.9% metals basis 0.85-1.7mm,元素分析仪专用 1.0 M in diethyl ether 10ug/ml in methanol 2000ug/ml in Toluene 200目 400目 50% in water 95% (GC) 95.0% (HPLC) 97+% 98% Isotopic Purity 99% 98%,LC&T 98%,顺反混合物 98+% 98.0% 99 atom % 13C 99.9%-Er(REO) 99.999% (metals basis) >90.0% >98 % (HPLC) ), Sublimed >99% (GC) AR,96% AR,≥99.0% AR,≥99.5% AR,97% Analytical Volumetric Solution,0.02M BS MW 4000 Da Standard for GC,≥99.9%(GC) analytical standard,10μg/ml in acetone technical grade ≥88% ≥98%(LC&T) ≥99.5% (GC) ≥99.9% metals basis 丰度:99atom%;化学纯度:≥98.5% 无水, 粉末, 99.9% metals basis 无水,99.99% metals basis 无水级,99.99% metals basis 无水, 粉末, 99.9% metals basis 环保级 用于分子生物学,≥99% 电子级,99.9999% metals basis 粒径:10 nm,单位:>0.75 A520 Units/ml,溶剂:柠檬酸钠溶液 铁浓度:1 mg/mL 0.04% 0.1M 0.5% 0.5M in THF 1% 1%(w/v)in water 10% (v/v) 1000μg/mL in Acetonitrile,不确定度:2% 1000μg/mL in methanol,不确定度:2% 1000μg/ml in Methanol 100μg/mL in Methanol,uncertainty 3% 100μg/ml 2% (w/v) 2.0 M in diethyl ether 2000μg/ml in Toluene 40 wt. % in H2O 50%水溶液 5U/μl 60%水溶液 88% 95% by SDS-PAGE 95%(GC) 95%, MW 5000 Da 95%,GC 96.0% (HPLC) 98%,含稳定剂铜屑 98%,GC&T 98%,mixture of isomers 99% (metals basis) 99.5% (metals basis) 99.70% 99.9%-Gd(REO) 99.95% trace metals basis 99.99% metals basis,200目 >60.0%(GC) >85.0%(T) ACS, 99% ACS,99.5% AR,≥99% AR,≥99.5% Analysis of titration solution,0.1M Analytical Volumetric Solution,0.01M CP,97% D,99.5% IND PT Reagent Grade Standard for GC,>99.5% Standard for GC,≥99.0%(GC) Standard for GC,≥99.8%(GC) Sublimed,>99%(NMR) tech. 90% ≥93.0%(GC) ≥95%(GC)(T) ≥97% ,≥99% ee ≥97%HPLC,≥99% ee ≥99% trace metals basis ≥99.5%(T) ≥99.9%(GC) 分子生物学级 分析标准品,≥98%(HPLC) 无水级,99% 无水级,99.5% 无水,99.9% metals basis 用于GC衍生化 细胞培养级 色谱级,≥99.9% 药典级 非离子表面活性剂 0.05% 0.1%(w/v)in water 0.3~0.8mmol/g, 100~200 mesh 1% DVB 0.5M 0.5μg/mL in acetonitrile 1.00 Normal 100-200目 1000ug/ml in 1.0mol/L HNO3 1000ug/ml in 10%HCl 1000μg/mL in Acetonitrile,不确定度 2% 1000μg/mL in Methanol,uncertainty 2% 1000μg/ml,in Methanol 100μg/mL in methanol,不确定度:3% 100μg/mL 100μg/ml in Methanol 1M in THF 1M 1mol/L in THF 2.00 Normal 20% (v/v) 20% (w/v) 2000ug/ml in high purity Methanol 300-400目 5% (v/v) 5% on activated carbon50-70% wetted powder 50 wt. % in H2O 60 wt. % in H2O 82% 87% 95%, MW 3400 Da 95%,顺反混合物 96.5% (GC) 98%,异构体混合物 99%,升华纯化 99.0% (HPLC) 99.80% 99.9% trace rare earth metals basis 99.9%-La(REO) >92.0%(T) >95%(GC) >95%(LC) >95%(NMR) >95.0%(W) >98.0%(HPLC) >98.0%(T)(HPLC) >99.5% (GC) A solution in ethanol,>95% A solution in methanol ACS, ≥99.5% ACS,98.0-102.0% ACS,≥99.5% AR,>99.0%(GC) Biological Stain CP,95% HPLC≥98% Type:Concentration:1,000ug/ml in high-purity Hexane;US EPA Methods:625,8270C a solution in ethanol analytical standard,10ug/ml in methanol spectrophotometric grade, ≥99% standard for GC,≥99.0%(GC) standard for GC,≥99.9%(GC) ~50% in methanol: water (2:3) ≥ 98% ≥60% ≥80%(GC) ≥85.0%(GC) ≥85.0% ≥90%(T) ≥90.0%(HPLC) ≥90.0%(T) ≥93%(GC) ≥95.0% (GC) ≥96% (HPLC) ≥96%(T) ≥97%(LC) ≥97%,≥99% ee ≥98% (HPLC), powder ≥98%(T&LC) ≥98%(HPLC) ≥98%,GC ≥99%(HPLC) ≥99.0% (HPLC) ≥99.99% trace metals basis ≥99.99% 丰度:98atom%;化学纯度:≥98.5% 分析标准品,96% 分析标准品,99.8% 分析标准品,>99.7%(GC) 生物染料 生物染色剂 用于植物细胞培养 研发级 稀释成1升使用,稀释后的浓度为0.1M 色谱级,≥99.0%(T) 蛋白质组级 超干级, 99.9% (REO) 超干级, 99.95% metals basis >90% (99.9%-Y(REO) 0.05%(w/v)in water 0.1 mg/mL in isooctane 0.100 Normal (N/10) 0.1000mol/L(0.1N) 0.25 M in THF 0.5mmol/L盐酸溶液 1% (v/v) 1.0 M in toluene 10% (w/w) 10% 100 ng/μL in acetonitrile 10000× in DMSO 1000ug/ml in H2O 1000μg/mL in Hexane,不确定度2% 1000μg/mL in Methanol,不确定度2% 100μg/mL in Acetonitrile,不确定度 3% 100μg/mL in Methanol,不确定度 3% 100μg/mL in Methanol,不确定度3% 10μg/mL in acetonitrile 15% (w/v) 1mol/L 2% (v/v) 20%溶液 2000 kDa 2mm-3mm,干燥剂用 3% (w/w) 30% (w/v) 35 ug/mL in Isooctane 40-60目,气相、液相色谱柱专用 40目 45%水溶液 5 mM in DMSO 5% (w/v) 5.00 Normal 500μg/ml in Water (20℃) 55% 60-80目,气相、液相色谱柱专用 80-100目,气相、液相色谱柱专用 90% (HPLC) 95%, MW 2000 Da 95%, MW 400 Da 95%, MW 600 Da 95%,MW 30000 Da 95%,MW 400 Da 95.0% (TLC) 95.5% (GC) 96.00% 97% (TLC) 97%(10 wt% in THF) 97%,GC 97.5% (HPLC) 98% (TLC) 98%(T) 98%(mixture of isomers) 98%,无水级 98%purity 98%,LC&N 98.0% (T) 98.0%(GC) 99%(GC) 99%,GC 99.0% metals basis 99.0% 99.9% metals basis,200目 99.9% metals basis,50nm 99.9% metals basis,粉末 99.9%(REO) 99.9%-Nd(REO) 99.9%-Pr(REO) 99.9%-Sm((REO)) 99.9%metals basis 99.97% metals basis 99.98% trace metals basis 99.99%(REO) 99.99%-Ta 99.995% trace metals basis 99.999% >70.0%(HPLC) >80.0% >83.0%(GC) >90.0%(N) >93.0%(N) >94% >94.0%(T) >96%(HPLC) >96.0%(HPLC)(N) >98% (HPLC) >98%(GC&T) >98%(LC&N) >98%(T) >98.0%(W) >98.5%(GC) >= 95 % >= 97 % >= 98 % ACS,98% AR,90% AR,90.0% AR,>99.0%(T) AR,≥98% AR,90% AR,97.0% AR,99.8% AR,≥98% Analytical Volumetric Solution,0.025M Analytical reference Analytical standard CP,95% CP,97.0% HPLC MW 1500 Da Standard for GC,≥99%(GC) Sublimed>99% ULC-MS analytical standard ,1000ug/ml in water analytical standard,1000ug/ml in carbon disulfide analytical standard,100ug/mL in methanol analytical standard,100ug/ml in hexane analytical standard,10ug/ml in hexane average Mn ~2,000 for cell culture,≥99% pellets standard for GC,≥99%(GC) Φ:0.5mm,元素分析仪专用 ≥40% ≥90.0% (HPLC) ≥91% ≥94%(GC) ≥95% SDS-PAGE ≥95%(HPLC)(T) ≥95%(LC&T) ≥95%,≥99% ee ≥96%(GC)(T) ≥96.0% (HPLC) ≥97%(LC&N) ≥97%(N)(T) ≥97.0 % ≥98%(N)(T) ≥98% ≥99%(GC)(T) ≥99.0%(T) ≥99.999% metals basis 分析对照品,≥99.5% 分析标准品,97.5% 分析标准品,≥96% 分析标准品,≥97%(HPLC) 分析标准品,≥99.5%(HPLC) 分析标准品,98% 基质:SiO2,表面基团:-NH2,粒径:1-2μm,单位:10mg/ml 基质:SiO2,表面基团:-NH2,粒径:2-3μm,单位:10mg/ml 异构体混合物 无吡啶,F≥5mgH2O/ml 无抑制剂 无水,99.9% metals basis 无水、粉末、99.99% 无水级,99.9% metals basis 无水,99.99% metals basis 环保试剂 离子对色谱级,≥99% 离子对色谱级,≥99.0% 粉末 粉末,99.9% metals basis 粒径:40 nm,单位:>0.75 A520 Units/ml,溶剂:柠檬酸钠溶液 粒径:5 nm,单位:>0.75 A520 Units/ml,溶剂:柠檬酸钠溶液 红外碳硫分析仪专用 色谱级, ≥99.5% 色谱级,≥99% 色谱级,≥99.0% 荧光发射波长:525 nm,0.05 μmol/L 荧光发射波长:565 nm,0.05 μmol/L 荧光发射波长:585 nm,0.05 μmol/L 重蒸馏,≥99.5% 非动物源,EP,JP,USP ;用于细胞培养,98.5 to 101.0% 非离子型 >98% (HPLC) >98%(HPLC) 0.05000mol/L(0.05M) 0.05M 0.1 wt. % in ethanol 0.200 Normal (N/5) 0.25M in Tetrahydrofuran 0.4% 0.5 M in Tetrahydrofuran 0.5%(w/v)in water 0.98 1% (w/v) 1.0 M in hexanes 1.0 M solution in THF, MkSeal 1.00 Molar 1.50 Normal 10 mM in water,≥98% 10 wt. % in H2O 10 μg/ml in acetone 100 μg/mL in acetonitrile 100 μg/ml in ethanol 1000 μg/mL in methyl tert-butyl ether 10000 × 1000ug/mL,in 1%HNO3 1000ug/ml in 1.0 mol/L HNO3 1000ug/ml in 10% HCl 1000μg/mL in Acetonitrile,uncertainty 2% 1000μg/mL in H2O 1000μg/mL in Hexane,不确定度:2% 1000μg/mL in Methanol,不确定度2% 1000μg/ml in H2O(不确定度 1%) 1000μg/ml in 1.0 mol/L HNO3 1000μg/ml transPermethrin 1000μg/ml 100mg/L in 1%HCl 100mg/L in water 100ug/ml in 1%HCl 100μg/mL in Acetonitrile,uncertainty 3% 100μg/mL in Acetonitrile,不确定度3% 100μg/mL in H2O 100μg/mL in Hexane,不确定度3% 100μg/ml in H2O(不确定度 2%) 10U/μl 10μg/g 12% (w/v) 14% in H2O 1mg/ml 1×,无菌,DEPC处理 2.0 M solution in THF 2.0M in THF 20-40目,气相、液相色谱柱专用 200-300目 2000ug/ml in Methanol 200u/g 25 ug/mL in acetonitrile 3% (w/v) 3.00 Normal 30% (v/v) 30% 35% 3mm-5mm,干燥剂用 40% (w/w) 40% in Water 40%水溶液 400 kDa 40U/μl 4mm-6mm,干燥剂用 5% on activated carbon, reduced,50% water wet paste 5% 50 wt. % in water 500mg/L in 1%HCl 500μg/ml in 1% HNO3 5X 70% in H2O 70%水溶液 75-150目 80-85% 800目 90% (LC/MS-ELSD) 90% (T) 90% active ingredients basis 90%,T 95% (TLC) 95%(HPLC) 95%(T) 95%, MW 20000 Da 95%, MW 750 Da 95%,MW 350 Da 95%,MW 550 Da 95%,异构体混合物 95%,stabilized with TBC 95.00% 96% (HPLC) 96%,异构体混合物 96.0% (GC) 96.0%(GC) 96.5% 97% (GC) 97%(10 wt% in hexanes) 97%(HPLC) 97%(T) 97%,含铜稳定剂 97.0% 97.5% (GC) 98 atom% D 98% (CP) 98% metals basis 98% 异构体混合物 98%(cis- and trans- mixture) 98%,用于细胞培养 98%,顺反异构混合物 98.0% (AT) 98.0%(HPLC) 99% (CP) 99% (HPLC) 99%,99.9%-Ir 99%,无水级,含分子筛,水≤50ppm 99%(GC) 99%,升华纯化 99%,含稳定剂MEHQ 99+% 99.5%,100目 99.9 % metals basis 99.9% metal basis 99.9% metals basis,1μm 99.9% metals basis,≥200目 99.9%-Eu(REO) 99.9%-Re 99.9%-Y(REO) 99.9%,粉末 99.98% 99.99% (metals basis) 99.99% metal basis 99.99% metals basis,1-3mm 99.99% metals basis,≥200目 99.99% metals basis,0.5mm 直径 99.998% trace metals basis 99.9995% metals basis 99.99999% metals basis >40.0%(GC) >50.0%(GC) >65.0%(GC) >75.0%(HPLC) >90%(HPLC) >90%,内径:5-10nm,外径:10-30nm,长度:10-30μm >90%,内径:5-10nm,外径:20-40nm,长度:10-30μm >92% >93.0% >95%(LC&T) >95%(T) >96%(with isomers) >97% (HPLC) >97%(GC) >97%(NMR) >97.0%(W) >98%(LC&T) >98.0% (GC) >98.5%(HPLC) >99 % (HPLC) ), Sublimed >99% (TLC) >99.0% (HPLC) >99.0%(HPLC)(N) >99.0%(LC) >99.0%(N) >99.9%,内径:3-5nm,外径:8-15nm,长度:~50μm >99.9%,内径:5-10nm,外径:10-20nm,长度:10-30μm >99.9%,内径:5-10nm,外径:20-30nm,长度:10-30μm >99.9%,内径:5-12nm,外径:30-50nm,长度:10-20μm A solution in methyl acetate,>98% A solution in methyl acetate,≥98% ACS reagent, ≥99% ACS, ≥98% ACS, ≥98.0% ACS, ≥99.8% ACS, ≥99.0% AR 99% AR, ≥99.0% AR, ≥99.5% AR,96.0% AR,99.0 % AR,96% AR,>99.0%(GC) Analytical Volumetric Solution,0.005M Analytical Volumetric Solution,2.0M CP,98.5% CP,99% CP,99.5% CP,98.5% CP,99.0% D,98% Dye content 80% Dye content 85 % Dye content 85% Dye content 90 % Dye content 95 % Dye content 95% FE2O3≤2PPM GR,99.0% GR,≥99.8% GR,99.8% GR,99.9% Ind Ir 35% in HCl Isotopic purity: 99% M.W. 2000 MW 3000 Da MW 6000 Da PESTANAL, analytical standard Sublimed,>98%(HPLC) TLC专用 analytical standard,0.100mg/ml in methanol analytical standard,100μg/ml in methanol analytical standard,10μg/ml in methanol analytical standard,10μg/ml,u=4% in acetone analytical standard,50ug/ml in methanol:toluene(4:1) average Mn 600 chloride form, 100-200 mesh chloride form, 50-100 mesh diameter 0.05 - 0.1μm ,2.5% w/v meets USP testing specifications pH8.0 powder reagent grade, 98% standard for GC,≥99.8%(GC) tech. 85% tech. grade technical grade, 90 % ~50% in H2O ~90% ≥ 0.50 U/mg ≥180 units/mg protein (10,350 BAEE/3,450 USP/NF units/mg protein) ≥20 units/mg dry weight ≥45 units/mg protein ≥500 units/mg dry weight ≥65% ≥70.0% ≥80.0% ≥85% (HPLC) ≥89% ≥93.0% ≥94%(T) ≥95% (GC) ≥95%,外径:1-2nm,长度:5-30μm,浮动催化 ≥96%(T&LC) ≥97 % sum of enantiomers ≥97%(N) ≥97.0% (HPLC),用于荧光分析 ≥98%,异构体混合物 ≥98.0% (HPLC),用于荧光分析 ≥99% (HPLC) ≥99% sum of enantiomers ≥99.0% (T) ≥99.0% (sum of enantiomers, GC) ≥99.5%(HPLC) ≥99.8% ≥99.95% metals basis 丰度:10atom%;化学纯度:≥98.5% 丰度:99atom%;化学纯度:≥98.5% 光谱级, ≥99% 光谱级, ≥99.5% 光谱纯 冻干粉 分子量1000 分子量~4000 分析对照品,99% 分析对照品,99.5% 分析对照品,≥98% 分析标准品,95% 分析标准品,>99.9%(GC) 分析标准品,≥98% (HPLC) 分析标准品,≥99%(HPLC) 分析标准品,≥99.5% (GC) 分析标准品,用于环境分析,≥99.5%(GC) 基质:SiO2,表面基团:-COOH,粒径:1-2μm,单位:10mg/ml 基质:SiO2,表面基团:-COOH,粒径:2-3μm,单位:10mg/ml 基质:SiO2,表面基团:-COOH,粒径:3-4μm,单位:10mg/ml 基质:SiO2,表面基团:-COOH,粒径:4-5μm,单位:10mg/ml 基质:SiO2,表面基团:-Epoxy,粒径:1-2μm,单位:10mg/ml 基质:SiO2,表面基团:-Epoxy,粒径:2-3μm,单位:10mg/ml 基质:SiO2,表面基团:-Epoxy,粒径:3-4μm,单位:10mg/ml 基质:SiO2,表面基团:-Epoxy,粒径:4-5μm,单位:10mg/ml 基质:SiO2,表面基团:-NH2,粒径:0.1-1μm,单位:5mg/ml 基质:SiO2,表面基团:-NH2,粒径:3-4μm,单位:10mg/ml 基质:SiO2,表面基团:-NH2,粒径:4-5μm,单位:10mg/ml 基质:SiO2,表面基团:-SiOH,粒径:1-2μm,单位:10mg/ml 基质:SiO2,表面基团:-SiOH,粒径:2-3μm,单位:10mg/ml 基质:SiO2,表面基团:-SiOH,粒径:3-4μm,单位:10mg/ml 基质:SiO2,表面基团:-SiOH,粒径:4-5μm,单位:10mg/ml 基质:SiO2,表面基团:-COOH,粒径:1-2μm,单位:10mg/ml 基质:SiO2,表面基团:-COOH,粒径:2-3μm,单位:10mg/ml 基质:SiO2,表面基团:-COOH,粒径:3-4μm,单位:10mg/ml 基质:SiO2,表面基团:-COOH,粒径:4-5μm,单位:10mg/ml 基质:SiO2,表面基团:-Epoxy,粒径:1-2μm,单位:10mg/ml 基质:SiO2,表面基团:-Epoxy,粒径:2-3μm,单位:10mg/ml 基质:SiO2,表面基团:-Epoxy,粒径:3-4μm,单位:10mg/ml 基质:SiO2,表面基团:-Epoxy,粒径:4-5μm,单位:10mg/ml 基质:SiO2,表面基团:-NH2,粒径:1-2μm,单位:10mg/ml 基质:SiO2,表面基团:-NH2,粒径:2-3μm,单位:10mg/ml 基质:SiO2,表面基团:-SiOH,粒径:1-2μm,单位:10mg/ml 基质:SiO2,表面基团:-SiOH,粒径:2-3μm,单位:10mg/ml 基质:SiO2,表面基团:-SiOH,粒径:3-4μm,单位:10mg/ml 基质:SiO2,表面基团:-SiOH,粒径:4-5μm,单位:10mg/ml 无水,粉末,99.9% trace metals basis 无水级, 99.5% 无水级, ≥99% 无水级,98% 显微镜用 显色剂 生物医用级,≥98.0%,<70μm 用于GC衍生化, ≥99.0% (GC) 用于GC衍生化,99% 用于分子生物学,≥99.0% 用于微生物 用于植物细胞培养,≥99.0% 电泳级 稀释成1升使用,稀释后的浓度为0.05M 粒径:30 nm,单位:>0.75 A520 Units/ml,溶剂:柠檬酸钠溶液 粒径:5.0μm,2.5 %(w/v)乙醇悬浮液 细胞培养级,≥98% 色谱级,≥99.5% 荧光发射波长:605 nm,0.05 μmol/L 荧光级 蛋白组学级 试剂级 BR 超纯级,≥99.5% 重蒸馏,99.5% 非离子剂 >97%(HPLC) >98.0% >99% (10-20%)[用于酯化] (99.9%-Yb) ((REO)) (99.99%-Pr)(REO) (D, 99%) (D,99.5%) (D,99.9%) (D (w/w=7/3) 0.0100 Normal (N/100) in Methanol 0.0100 Normal (N/100) 0.01000mol/L(0.01M) 0.02% 0.0200 Normal (N/50) 0.025M 0.1 M 0.1% (v/v) 0.1% in water 0.1%(w/v)in Acetic Acid 0.100 Molar (M/10) 0.100 Normal (N/10) in Denatured Alcohol 0.100 Normal (N/10) in Isopropyl Alcohol 0.100 Normal (N/10) in Methanol 0.1000mol/L(0.1M) 0.1M aqueous solution 0.1M in THF 0.1mol/L,pH9.1 0.1mol/L 0.2% 0.2%(w/v)in Acetic Acid 0.25% (w/w) 0.2M 0.3% 0.3M 0.400 Normal 0.45-0.55μm 0.5 M solution in THF, MkSeal 0.5 μg/mL in acetonitrile 0.5% (v/v) 0.5% (w/v) 0.5% (w/w) 0.500 Molar (M/2) 0.500 Normal (N/2) in Methanol 0.500 Normal (N/2) 0.5M 四氢呋喃溶液 0.5MTHF 0.5M,pH8.0 0.5~1.5mmol/g, 100~200 mesh,1% DVB 0.7 M in diethyl ether/hexanes 0.7-1.3 mmol/g 0.95 1 mg/mL in methyl tert-butyl ether 1 wt. % in ethanol 1% (w/w) 1% in Acetic Acid 1% on polyethylenimine/SiO2 1% 溶液 1-10 μm,98% 1.0 M in H2O 1.0 M solution in Heptane 1.00 Normal in Methanol 1.0M in MeTHF 1.0mg/g KOH 1.0mm 直径, 99.8% metals basis 1.3 M in THF 1.5 M in H2O 10 mM/DMSO 10 ng/ul于环己烷 10% Pd basis 10% in H2O 10%的水溶液 10,000× in DMSO 10,000× in water 10.0 Normal 100%, 99.96 atom % D 100-200 mesh, 1%DVB,Substitution 0.3-0.8mmol/g 1000 usp u/mg 10000x in DMSO 10000x in H2O 10000× 1000mg/L,in water 1000ug/ml in 0.05mol/L NaOH 1000ug/ml in Methanol 1000μg/mL in Acetonitrile, 不确定度2% 1000μg/mL in Acetonitrile , 不确定度2% 1000μg/mL in Acetonitrile,不确定度2% 1000μg/mL in H2O,不确定度:1% 1000μg/mL in Methanol,不确定度 2% 1000μg/mL in Methanol,不确定2% 1000μg/mL in methanol,不确定度:2% 1000μg/mL in methanol,不确定度2% 1000μg/ml in 1% HNO3 1000μg/ml in 10% HCl 1000μg/ml in 10%HCl 1000μg/ml in 1mol/L HNO3 1000μg/ml,溶剂:甲醇 1000μg/ml,溶剂:甲醇 1000分子量 100g/L 100ug/ml in 1%HNO3 100ug/ml in 5%HCl 100μg/mL in Hexane ,不确定度3% 100μg/mL in H2O,不确定度:2% 100μg/mL in Hexane,uncertainty 3% 100μg/mL in Hexane,不确定度3% 100μg/mL in Hexane,不确定度:3% 100μg/mL in Methanol , 不确定度3% 100μg/mL in Methanol,不确定度3% 100μg/ml in 1% HNO3 100μg/ml in Acetonitrile 100μg/ml in methanol 100μg/ml,u=2% 100目 10x 10×,无菌,DEPC处理 110 kDa 12.0-14.5% Fe basis 1250目 14% (w/w) 15% (v/v) 1M in water 1U/μl 1×,无菌 2% (w/w) 2.0 M solution in THF,MkSeal 2.0M 2.50 Normal 2.5U/μl 20 wt. % in ethanol 20% Pd(OH)2 20% in H2O 20% in water 20-25% 乙醇溶液 20-40目 200 μg/mL in hexane 20000× 2000mg/L于二氯甲烷 200mM 20nm-100nm,99.9% metals basis 20× in water 20×TBS,pH7.4 20μm 20目 24% (w/v) 2400分子量 25% (v/v) 25% in H2O 25%水溶液 2M in THF 2mg水/ml,测含水量较低样品 3% (v/v) 3.0 M in diethyl ether 3.0mg/g KOH 30% (w/w) 30% in Water 30% in water 30nm 球形,99.5% 33-35% TiO2 35 μg/mL in Isooctane 35% (w/v) 40 wt. % in H2O (8.8 M) 40% (w/v), with Sodium Iodide and EDTA 40% in water 40% 水溶液 40-60目 GC 40-60目,可用于农药和生化样品分析 40-60目,吸附性较弱,可用于极性及高沸点样品分析 40-60目,用于烃类和弱极性样品分析 40-60目,高沸点化合物,微量水分析 40nm 球形,99.5% 40μm 45% 45.0 - 50.0% 45wt.% aqueous solution 4N,靶材专用 5% (w/w) 5% on activated peat carbon, reduced,50% water wet paste 5% on activated wood carbon, reduced, dry 5% on activated wood carbon, reduced,50% water wet paste 5% on alumina powder, reduced, dry 5% on silica powder, reduced, dry 5%水溶液 5%溶液 5.0% Pd basis 50 kDa 50 wt. % in mineral spirits 50 μg/ml in ethanol,99% 50 μg/ml in ethanol,≥98% 50 μg/ml in ethanol,≥99% 50% (v/v) 50% (w/v) 50% in toluene 50% water-wet paste 50%+ in water 50-55% w/w HBF4 500mg/L Pb in 1%HNO3 500mg/L in water 500mg/L 500ug/ml in Water (20℃) 50nm,99.5% metals basis 50nm,99.9% metals basis 50wt.% in H20 50μg/mL in isooctane, analytical standard 50μm 55% in water 59% 5M 5mg水/ml,测水量较高样品 6% (v/v) 6% (w/v) 6.00 Normal 60% in Heptane,ca. 1.7mol/L 60% in water 60%溶液 60-200目 60-70% 60-80目 GC 60-80目,可用于农药和生化样品分析 60-80目,吸附性较弱,可用于极性及高沸点样品分析 60-80目,用于烃类和弱极性样品分析 60-80目,高沸点化合物,微量水分析 600目 62 wt. % in H2O 65 wt. % in H2O 68.0-72.0% in H2O 7.5% (w/v) 7.5% v/v 70 wt. % 正丙醇溶液 70-75% in heptane 75 wt. % in H2O 75.0%(GC) 8 wt. % in H2O 80-100目 GC 80-100目,可用于农药和生化样品分析 80-100目,吸附性较弱,可用于极性及高沸点样品分析 80-100目,用于烃类和弱极性样品分析 80-100目,高沸点化合物,微量水分析 80μm 83% 85% (LC/MS-ELSD) 86% 8M 9% 9-10wt % 9.5mm 直径,99.999% metals basis 90%,含200ppm MEHQ稳定剂 90%,工业级 90.0% (GC) 90.0% (HPLC) 92%,含有稳定剂MEHQ 92-94 % 92-94% 94%(HPLC) 95% (stabilized with TBC) 95%(NMR) 95%(stabilized with K2CO3) 95%+ 95%, MW 350 Da 95%, MW 40000 Da 95%, MW 550 Da 95%, MW 8000 Da 95%, stabilized 95%,98%ee 95%,MW 40000 Da 95%,MW 750 Da 95%,40-60目 95%,98%ee 95%,GC&T 95%,MW 3400 Da 95%,含稳定剂MEHQ 96% (TLC) 96%,GC 96.0% (TLC) 97% 25-27% solution in ethyl acetate 97% 99%ee 97%(10 wt% in tetrahydrofuran) 97%(10wt% in hexanes) 97%(stab. with hydroquinone) 97%,99% ee 97%,含0.1% TBC稳定剂 97%,含100ppm BHT稳定剂 97%,含碳酸钾稳定剂 97%,含稳定剂HQ 97%,含铜屑稳定剂 97%,含铜稳定剂 97%,异构体混合物 97%,异构体混合物 97%,片状 97.0% (AT) 97.0% (T) 97.0% (TLC) 98 atom % D,95% 98% (GC) 98% Isotopic purity 99% 98% MOF 98% 镍42% 98%(stabilized with MEHQ) 98%(同分异构体) 98%+ 98%,99% de 98%,99.9%-Au 98%,99.99%-Co 98%,异构体混合物 98%(HPLC) 98%(T) 98%,100目 98%,99%ee 98%,Ni32% 98%,cis- and trans- mixture 98%,含稳定剂HQ 98%,含稳定剂TBC 98%,含稳定剂铜屑 98%,异构体的混合物 98%,顺反异构体混合物 98.0% (CHN) 98.0%(T) 99% (GC) 99% (REO) 99%(T) 99%(支链异构体类的混合物总和) 99%,100-300nm 99%,50nm 99%,99.9%-Nd(REO) 99%,99.9%-Os 99%,99.9%-Ru 99%,ee 98% 99%,含铜屑稳定剂 99%-Rb 99%, with molecular sieves, Water≤50 ppm (by K.F.), MkSeal 99%,2-4μm 99%,300目 99%,50nm 99%,MkSeal 99%,Reagent for Ion-Pair Chromatography 99%,Water≤50 ppm (by K.F.),MkSeal 99%,含50-150 ppm TBC 稳定剂 99.0% (AT) 99.0% (GC) 99.0% (T) 99.0% (sum of enantiomers, GC) 99.5% (REO) 99.5% metals basis,300目 99.5% trace metals basis excluding Hf 99.5%,升华纯化 99.7%,无水级 99.8% metals basis,50±10nm 99.8% metals basis,90±10nm 99.8% trace metals basis 99.8%,无水级 99.8%-Rb 99.89% 99.9% metal basis,70nm 99.9% metals basis,100nm 99.9% metals basis,20nm 99.9% metals basis,50nm 99.9% metals basis,无水级 99.9% metals basis,100nm 99.9% metals basis,10μm 99.9% metals basis,1~2μm 99.9% metals basis,200nm 99.9% metals basis,20nm 99.9% metals basis,50-70nm 99.9%,1-3μm 99.9%-Ag 99.9%-Cs 99.9%-Dy(REO) 99.9%-Mo 99.9%-Sc(REO) 99.9%-Sm(REO) 99.9%-Sr 99.9%-Tm(REO) 99.9%,2-5um 99.9%,200目 99.9%,50nm 99.95 % metals basis 99.95% metal basis 99.95% metals basis,≥325目 99.95% trace metal basis 99.99% metals basis 0.5-2mm 99.99% metals basis,≥100目 99.99% metals basis,0.1mm 直径 99.99% metals basis,0.25mm 直径 99.99% metals basis,1-3mm 99.99% metals basis,10μm 99.99% metals basis,1mm 直径 99.99% metals basis,50-70nm 99.99% metals basis,50nm 99.99% metals basis,无水级 99.99% metals basis,粉末 99.99% metals basis,粒状,1-3mm 99.99%-Ba, Sr-0.5% 99.99%-Mg 99.99%metals basis 99.99%metalsbasis 99.996% metals basis 99.9985% (metals basis) 99.999% metals basis,1-3mm 99.999% metals basis,1-6mm 99.999% metals basis,≥100目 99.999% metals basis,≥200目 99.999% metals basis,200目 99.999% metals basis,for Perovskite precursor 99.999% metals basis,粒状,1-3mm 99.999%-Ge 99.999%-Si 99.9995% trace metals basis 99.9998% metals basis 99.9999% metals basis,块状 99.9999% trace metals basis >100U/mg >60%,内径:0.8-1.6nm,外径:1-2nm,长度:5-30μm >60%,内径:1-3nm,外径:2-4nm,长度:~50μm >65.0%(HPLC) >70.0%(T) >80% >85% >85.0%(HPLC)(T) >90%,内径:0.8-1.6nm,外径:1-2nm,长度:1-3μm >90%,内径:0.8-1.6nm,外径:1-2nm,长度:5-30μm >90%,内径:5-15nm,外径:>50nm,长度:10-20μm >90.0%(GC)(T) >90.0%(LC) >92.0% >93.0%(HPLC)(T) >95%,内径:2-5nm,外径:<8nm,长度:0.5-2μm >95%,内径:3-5nm,外径:8-15nm,长度:0.5-2μm >95%,内径:3-5nm,外径:8-15nm,长度:~50μm >95%,内径:5-10nm,外径:10-20nm,长度:0.5-2μm >95%,内径:5-12nm,外径:30-50nm,长度:0.5-2μm >95%,内径:5-12nm,外径:30-50nm,长度:10-20μm >95%,内径:5-15nm,外径:>50nm,长度:0.5-2μm >95%,外径:20-30nm,长度:10-30μm >95.0%(LC) >96%(GC) >96.0%(LC&T) >97% pure by HPLC >97%(GC&T) >97.0%(HPLC) >97.5% >98% (HPLC), Sublimed >98%(T&LC) >98%(HPLC) >98%(T) >98.0%(GC),顺反异构体混合物 >98.0%(HPLC)(W) >98.0%(LC&N) >98.0%(T)(GC) >99% (HPLC), Sublimed >99%, ee >98% >99%, ee >98% >99.5%(LC) >99.8%(GC) >99.9% (GC) >99.9%,内径:5-15nm,外径:>50nm,长度:10-20μm >= 99 % A solution in acetonitrile,≥95% A solution in acetonitrile,≥99% deuterated product A solution in ethanol,>96% A solution in ethanol,≥96% A solution in methyl acetate,≥99% deuterated product ACS reagent, ≥98.0% ACS reagent ACS 光谱级,≥99.5% ACS, ≥85% ACS, ≥95.0% ACS, ≥98.5% ACS,97% ACS,99% ACS,99.0% ACS,≥98% ACS,≥99% ACS,≥99.5%(T) ACS,≥99.0% AR 99.5% AR,25%水溶液 AR,25%甲醇溶液 AR,30 wt. % in H2O AR,50 wt. % in H2O AR,85% AR,95.0% AR,99% metals basis AR,99.00% AR,99.5% metals basis AR,>99%(GC) AR,50 wt. % in H2O AR,95% AR,95.0% AR,96.0% AR,99.0 % AR,99.5% metals basis AR,99.5%(GC) AR,99.9% AR,≥99.0% Analysis of standard solution, 0.1 M Analysis of standard solution, 0.5 M Analysis of standard solution, 1.0 M Analysis standard, ≥99.8%(GC) Analytical Volumetric Solution,0.1M in Methanol Analytical Volumetric Solution,0.25M Analytical Volumetric Solution,1M Analytical Volumetric Solution,4.0M Analytical Volumetric Solution,6.0M Anhydrous Au 48-50% BC BR,300u/mg BR,50u/mg Ba ≥30.0 % BioReagent Biological stain,生化试剂级 C18:80-90% CNTs含量:1-5% CNTs含量:20wt% CP,70% CP,95.0% CP,96.0% CP,>98.0%(GC) CP,96% CP,99% Ca 6.6-7.4% Cleaning Solution, Chromic-Sulfuric Acid Solution for Cleaning Laboratory Glassware Co ≥31% Concentration:1,000ug/ml in high-purity Hexane;US EPA Methods:625,8270C Cu>36% D,99.8% D,99.96% Dye content 50 % Dye content 80 % Dye content 90% Dye-content ≥50% Fe2O3≥85% GC GNP和CNTs含量:1-5wt%,GNP:CNTs 1:1,分散剂含量:0.2-1.0wt% GR,≥99.0% Ir 48.0 - 55.0 % Ir:73% M.W 1000 M.W 2000 M.W :30000-100000 M.W. 100,000 M.W. 5000 MW 12000 Da Mixture of Diastereomers Mn 10,000~100,000 by GPC Mn~3000 Mn≥4.0%水溶液 Mo 56.5% Molecular biology grade, ≥99.5%(T) Mw = 40,000 ~ 80,000 (GPC) Mw,500000 Mw10 N 8% Os 38.7% Os 83% PEH-15 PEH-3 PEH-6 PH值(25°C):6.864 PT,99.8% Pb ≥82% Pd 18.5% Pd ≥20.5% Pd ≥44% Ph Eur Pt 34.0% Pt basis ≥73% Pt ≥57% Pt ≥64.5% Rh 21% Rh 21.3% Rh 27.5% Rh ≥23.3% Ru 1.5% w/v Ru 35.8-36.1% Sn≥42% Sn≥46% Solution in ethanol,>98% Solution in ethanol Standard for GC ,≥99.5%(GC) Standard for GC,>99.5%(GC) Standard for GC,>99.7%(GC) Standard for GC,>99.9%(GC) Standard for GC,≥99.5% Sublimed,>95%(HPLC) T-98% TiCl3:76.0-78.5% USP,Ph Eur U质谱级,0.1% in Water Zn 10-12% Zn≥ 35.5% a solution in methyl acetate analytical standard ,1000ug/ml in 1.0 mol/L HNO3 analytical standard, 1000ug/ml in 1.0mol/L HNO3 analytical standard,0.105mg/ml in methanol analytical standard,0.50mg/ml in water analytical standard,0.92mg/ml in methanol analytical standard,1.00mg/ml in water analytical standard,1000ug/ml in 1.0 mol/L HNO3 analytical standard,1000μg/ml in methanol analytical standard,100ug/ml in Acetone analytical standard,100ug/ml in actone analytical standard,100ug/ml in benzene analytical standard,100ug/ml in water analytical standard,100μg/ml in petroleum ether analytical standard,10ug/ml in actone analytical standard,10ug/ml in toluene anhydrous,98% average Mn 200 average Mn ~1,100 average Mn ~400 average Mn ~683 average Mn~428 average Mn~912 ca. 50% in Water certified reference material, 1000 μg/mL each component in hexane certified reference material, 2000 μg/mL in methanol diameter 0.2 - 0.5μm ,2.5% w/v diameter 0.6 - 1.0μm,2.5% w/v diameter 2.0 - 2.9μm,2.5% w/v diameter 3.0 - 3.9μm,5% w/v diameter 4.0 - 4.9μm,5% w/v diameter 6.0 - 6.9μm,5% w/v diameter 7.0 - 7.9μm,5% w/v diameter 8.0 - 8.9μm,5% w/v diameter >10μm ,2.5% w/v electronic grade epoxy value:0.65~0.70 fluorescence λem 525 nm,8μmol/L in H2O fluorescence λem 575 nm,8μmol/L in H2O fluorescence λem 625 nm,8μmol/L in H2O for GC derivatization, ≥99.0% for cell culture,≥99.0% for liquid chromatography for molecular biology,≥99% for plant cell culture,≥99% for plant cell culture,≥99.0% in Isooctane indicator lyophilized powder mixture of (C2H5)×C6H6η× where x = 0-4) mixture of isomers n≈40 pellets,3-5 mm protease substrate pure, <20nm in acetone at 100mg/Lsurfactant and reactant-free pure, <20nm in water at 100mg/Lsurfactant and reactant-free, stabilized with < 0.01 mmol/l of citrate pure, <20nm in water at 500mg/Lsurfactant and reactant-free, stabilized with < 0.01 mmol/l of citrate reagent grade reagent grade, 99% spectrophotometric grade, 99% standard for GC,>99%(GC) standard for GC,≥98.0%(GC) standard for GC,≥99.7%(GC) tech.90% technical grade, 90% technical,≥90 % ~1.0 M in methanol ~20% in water ~5% in H2O ≥ 3.00 U/mg ≥0.1 units/mg dry weight ≥0.5 units/mg dry weight ≥10 units/mg protein ≥1000 IU/mg ≥1000 units/mg ≥125 units/mg dry weight ≥170 units/mg protein ≥180 units/mg protein ≥2 units/mg dry weight ≥2,000 units/mg dry weight ≥2,500 units/mg dry weight ≥20,000 U/g ≥200 NADP units/mg protein ≥200 units/mg dry weight ≥25 units/mg dry weight ≥3 units/mg protein ≥3,000 units/mg dry weight ≥3,000 units/mg protein ≥30 units/mg dry weight ≥300 units/mg protein ≥360 NAD units/mg protein ≥4 units/mg dry weight ≥40% ZrO2 basis ≥400 u/mg ≥45 units/mg dry weight ≥50 units/mg dry weight ≥50.0% Pt basis ≥55%(HPLC) ≥55% ≥68% ≥80% (HPLC) ≥80%(HPLC) ≥80.0%(GC) ≥80.0%(HPLC) ≥82% ≥85%(HPLC) ≥85%(T) ≥88%(GC) ≥90% (GC) ≥90% (HPLC),用于荧光分析 ≥93%(T) ≥94%(HPLC) ≥95% H4P2O7 basis ≥95%(HPLC)(N) ≥95%(Hg) ≥95%(LC&N) ≥95%(LC) ≥95%(N) ≥95%(T)(HPLC) ≥95%45-55% in water ≥95.0 % ≥95.0% (TLC) ≥95.0%(GC),含稳定剂氢氧化钾 ≥96% (GC) ≥96%(LC) ≥96.0% (GC) ≥97% (GC) ≥97%,≥99% ee ≥97%,含稳定剂铜屑 ≥97.0% (T) ≥97.0% (TLC) ≥97.0%(N)(T) ≥97.5% (HPLC) ≥98% (HPLC), solid ≥98%(10 wt% in hexanes) ≥98%(GC&N) ≥98%(HPLC)(T ≥98%(R,R)-Et-DUPHOS-Rh ≥98%(R,R)-Me-DUPHOS-Rh ≥98%(S,S)-Et-DUPHOS-Rh ≥98%(S,S)-Me-DUPHOS-Rh ≥98%(T)(GC) ≥98%(sum of isomers) ≥98%(GC) ≥98%(T) ≥98.0% (T) ≥98.0%(GC)(N) ≥98.0%(N) ≥98.0%,用于荧光分析 ≥98.0%(HPLC) ≥98.5 % sum of enantiomers ≥99% (titration) ≥99%(75% in ethyl acetate solution) ≥99%,GC ≥99%,HPLC ≥99.5% (T) ≥99.5%(GC) ≥99.8%(GC) ≥99.99 % ≥99.995% metals basis ≥99.999% metals basis,粒径:1-6mm ≥99.999% 丰度:99atom%;化学纯度:≥98% 丰度:99atom%;化学纯度:≥98% 光谱级,≥99% 光谱级 光谱纯,≥99.5% 农残级,96%,SuperTrace 分子量2000 分子量3000 分子量~10000 分子量~1000 分子量~2000 分子量~3000 分子量:15-30万 分析对照品, ≥98%(HPLC) 分析标准品,98.6% 分析标准品,99.0% 分析标准品,99.7% 分析标准品,99.8%(GC) 分析标准品,99.9% 分析标准品,>97% 分析标准品,>99.0%(GC) 分析标准品,>99.5%(HPLC) 分析标准品,>99.5%(GC) 分析标准品,>99.8%(GC) 分析标准品,≥90% 分析标准品,≥95%(HPLC) 分析标准品,≥95% 分析标准品,≥98%(HPLC) 分析标准品,≥98.0%(HPLC) 分析标准品,≥99%(GC) 分析标准品,≥99.0% (GC) 分析标准品,≥99.0%(HPLC) 分析标准品,异构体混合物 分析标准品,95% 分析标准品,>99.5%(HPLC) 分析标准品,HPLC≥98% 分析标准品,≥99.7% (GC) 分析标准品,用于环境分析 助滤剂,通量煅烧(filter aid,flux calcined) 助滤剂 化妆品级 医用级 医药级,Mw,500000 医药级 双键改性度GM-30:30±5% 双键改性度GM-60:60±5% 双键改性度GM-90:90±5% 发光波长:365 nm,粒径:35 nm 发光波长:475 nm,粒径:35 nm 发光波长:545 nm,粒径:25nm 发光波长:545 nm,粒径:35 nm 发光波长:660 nm,粒径:35 nm 发光波长:804 nm,粒径:25nm 发光波长:804 nm,粒径:35 nm 发光聚合物 合成洗涤剂助洗剂用 含量(P2O5)% ≥85% 含铂量:27% 固体粉末 型号:6501(1:1) 基质:SiO2,表面基团:-COOH,粒径:0.1-1μm,单位:5mg/ml 基质:SiO2,表面基团:-COOH,粒径:0.1-1μm,单位:5mg/ml 基质:SiO2,表面基团:-NH2,粒径:0.1-1μm,单位:5mg/ml 基质:SiO2,表面基团:-NH2,粒径:3-4μm,单位:10mg/ml 基质:SiO2,表面基团:-NH2,粒径:4-5μm,单位:10mg/ml 基质:SiO2,表面基团:-SiOH,粒径:0.1-1μm,单位:5mg/ml 工业级, 90% 工业级,90% 工业级纳米石墨烯含量:1-5wt%,分散剂含量:0.2-1.0wt% 平均分子量550 支链异构体混合物 无水,99.5% metals basis 无水,粉末,99.9% metals basis 无水,粉末,99.99% trace metals basis 无水级, 99.8% 无水级, 99.99% metals basis 无水级,≥99.5% 梯度色谱级, ≥99.9% 植物细胞培养级, ≥99.5% 植物细胞培养级 植物细胞培养级,≥99.5% 氮≥19.5 % 氯型 水分≤0.01%,用作反应介质 油状50% 熔体流动速率:1.65g/10min 环氧值eq/100g:0.70 生化试剂级 用于GC衍生化, ≥99.0% 用于GC衍生化,0.1 M in Chloroform 用于GC顶空测试,≥99.9% 用于分子生物学, ≥99% 用于分子生物学,≥99.0%(T) 用于分子生物学,≥99.5%(T) 用于分子生物学,≥99.5% 用于植物细胞培养,≥98%(HPLC) 用于生物学染色 用于电泳,≥99% 用于组氨酸甲基化 用于细胞与昆虫细胞培养,≥99.0%(T) 用于细胞培养,98% 用于细胞培养,≥98% 用于细胞培养,≥99.0% 用于细胞培养,≥99.5%(T) 电子级,99.999995% metals basis 电泳级,≥99% 皂化值mgKOH/g:235~245 直径:0.1-4μm 直径:0.2-10μm 层数:1-10 直径:20-500nm 石墨烯含量:1-1.5%wt,分散剂含量:0.2-0.3%wt 磷含量: 23%-24% 离子对色谱级, ≥99.0% (AT) 离子对色谱级, ≥99.0% 离子对色谱级,>98.0%(T) 离子对色谱级 稀释成1升使用,稀释后的浓度为0.01M 稀释成1升使用,稀释后的浓度为1.0M 稀释成1升使用,稀释后的浓度即为1.0M 粉末,10,000U/g 粉末,99.9% metals basis 粉末,99.99% metals basis 粉煤灰活化剂用 粒度:2-20μm 粒径:10.0μm,2.5 %(w/v)乙醇悬浮液 粒径:1μm,2.5 %(w/v)乙醇悬浮液 粒径:2.0μm,2.5 %(w/v)乙醇悬浮液 粒径:3.0μm,2.5 %(w/v)乙醇悬浮液 粒径:300nm,2.5 %(w/v)乙醇悬浮液 粒径:4.0μm,2.5 %(w/v)乙醇悬浮液 粒径:500nm,2.5 %(w/v)乙醇悬浮液 粒径:700nm,2.5 %(w/v)乙醇悬浮液 粘性液体 红外测油仪专用,≥99.8% 纯度:≥98% 细胞培养专用 细胞培养级, ≥98% 细胞培养级,98-101% 细胞培养级,99% 耐火材料粘结剂用 脱色率≥98% 色谱固定液 色谱级 plus, ≥99.9% 色谱级, ≥99.5%(GC) 色谱级, ≥99.8% 色谱级,99.0% 色谱级,≥99.5%(GC) 色谱级,≥99.7%(GC) 色谱级 蒸馏纯化,≥99.5% 规格:12种混合物浓度各为2,000 μg/ml溶于吹扫捕集甲醇中 超干, 99.999% metals basis 超干,99.999% metals basis 超干级, 99.99%metals basis 超干, 99.99% (REO) 超干, 99.99% metals basis 超干, 99.999% metals basis 超纯级, ≥99.0% (GC) 超纯级,99.5% 超纯级,≥99.5% (AT) 超纯级,≥99.5% (GC) 超纯级,≥99.5% (NT) 超纯级,用于微生物 超纯级,99.0% 超纯级,≥99.5% (HPLC) 通用型 重蒸馏,99.5% 钻井液和完井液助剂用 铜含量1-3% 铱含量:43.0% 锭, 99.9% metals basis 镀膜级,颗粒,99.9% metals basis 顺反混合物,≥98.0%(GC) 食品级 黄腐酸FA ≥90% >70% >80% >98%(GC) >99%metals basis,粒径:15nm,比表面积(BET):300±50m2/g (1mg/mL的甲醇溶液)[用于水分析] (7.68 ± 0.49) μg/g in methanol (99.9%-Dy) (REO) (99.99%-Ce) (REO) (99.99%-Dy) (REO) (99.99%-Er)(REO) (99.99%-Ho) (REO) (99.99%-In) (REO) (99.99%-Sc) (REO) (99.99%-Sc)(REO) (99.99%-Zr) (REO) (Br-,I-,F-,NO3-,PO4-,SO42-,Cl-)多元素混合标准溶液 (C60/C70 mixture) (D, 99.5%) +0.03% V/V TMS (D, 99.5%) 30% IN D2O (D, 99.5%) 40% IN D2O (D, 99.96%) (D,99.0%) (D,99.5%) +0.05% V/V TMS (D,99.5%) 96% IN D2O (D,99.8%) +0.03% V/V TMS (D,99.8%) +1% V/V TMS (D,99.8%)(0.03% v/v TMS) (D,99.8%) (D,99.9%) + 0.03 % (v/v) TMS (D,99.96%)(+0.03% V/V TMS) (D,99.96%) (D2, 98%) (<5% D2O) (D3, 98%) (D3, 99%) (D4, 98%) (D5, 99%) (D7, 98%) (Davisil grade 710), 孔径 50-76 Å, 薄层色谱法 (E)+(Z),98% (Rb,Ba,Sr,K,Ca,Li,Mg,Na) 多元素混合标准溶液(混标) (顺式+ 反式), ≥92%(GC) (顺式+ 反式), ≥92%(GC) +158 to +160℃ +164 to +166℃ +47 to +49℃ +81 to +83℃ ,≥ 0.100 U/mg -100 目, 99.9% (metals basis) -100 目, 99.999% (metals basis) -100mesh particle size -200+325目, 99.95% metals basis -200目 -200目,97% -22 目, 99.995% metals basis -22 目,99.998% metals basis -22 目,99.999% (metals basis) -325 目, 99.5% -325 目, 99.9% metals basis -325 目,99% -325 目 -325目, 99.5% metals basis -325目,99.99% (metals basis去除Ta), Ta <500ppm -40 目, 99.9% (REO) 0.0001g/mL,基体:甲醇 0.00100 Normal (N/1000) 0.001M 0.0050 Normal in Methanol 0.00500 Normal (N/200) 0.01 M HClO4 in water (0.01N) 0.01 Molar (M/100) 0.01 g/mL的硫酸铜水溶液 0.0100 Molar (M/100) 0.0100 Normal (N/100) in Isopropyl Alcohol (no preservative) 0.0100 Normal (N/100) in Isopropyl Alcohol 0.01000mol/L(0.01N) 0.0120 Normal 0.015mm 直径, 99.95% metals basis 0.015mol/L,pH8.5 0.01600mol/L(0.016M) 0.018 N 0.01M in Propanol 0.01M 0.01mol/L,pH5.8 0.01mol/L,pH6.0 0.01mol/L,pH6.2 0.01mol/L,pH6.4 0.01mol/L,pH6.6 0.01mol/L,pH6.8 0.01mol/L,pH7.0 0.01mol/L,pH7.2 0.01mol/L,pH7.4 0.01mol/L,pH7.6 0.01mol/L,pH7.8 0.01mol/L,pH8.0 0.01表观摩尔 0.02% (w/v)in water 0.02%(w/v)in isopropyl alcohol 0.02%(w/v)in water 0.0200 Normal (N/50) in Denatured Alcohol 0.0200 Normal (N/50) in Methanol 0.0200 Normal (N/50), 1 mL = 1 mg CaCO₃ 0.02000mol/L(0.02M) 0.025 M in H2O 0.025 N 0.0250 Normal 0.025N in isopropanol 0.025表观摩尔 0.02表观摩尔 0.03 M 0.04% (W/V) in isopropyl alcohol 0.04% (w/v) in carbinol (methanol) 0.04% 水溶液 0.04%(w/v) in water 0.04%(w/v) in water 0.04%(w/v)in isopropyl alcohol 0.04%(w/v)in water 0.0423611111111111 0.05 M (M/20) 0.05 M in H2O,volumetric standard 0.05 M聚(二甲基硅氧烷),乙烯基封端 0.05 Normal (N/20) in Methanol 0.05 g/mL CuSO4 0.05 mg/mL in isooctane 0.05 mol/L NaOH(0.05摩尔/升 氢氧化钠) 0.05% (v/v) 0.05% (w/v) HPLC 0.05% (w/w) 0.05% in Ethanol 0.05% w/v 0.05%(W/V)in water 0.0500 Molar 0.0500 Normal (N/20) in Denatured Alcohol 0.0500 Normal (N/20) 0.05000mol/L(0.1N) 0.0500mol/L 0.05M,pH6.7,含0.001M EDTA,无菌,DEPC处理 0.05M,pH6.7,含0.001M EDTA 0.05M,pH 7.4 无菌 0.05M,pH 7.4 0.05mm 直径,99.995% metals basis 0.05mol/L,pH9.6 0.0725 Normal 0.078 N 0.083 Normal, pH 12.7 0.085% Phosphoric Acid in Ethanol 0.085% Phosphoric Acid in IPA 0.085% Phosphoric Acid in Methanol 0.085% w/w 0.085M 0.089 Normal in Methanol 0.0891 Normal, 1 mL = 5 mg KOH (5000 ppm KOH) 0.1 M La(NO3)3 0.1 M in IPA 0.1 M in THF, contains samarium chips as stabilizer 0.1 M in poly(dimethylsiloxane), vinyl terminated 0.1 g/mL NaOH 0.1 g/mL的氢氧化钠水溶液 0.1 mg/mL in isooctane,86% 0.1 mg/ml in DMSO 0.1 wt% 0.1% (W/V) in isopropyl alcohol 0.1% (v/v) HPLC 0.1% (w/v) in 5% (v/v) Alcohol 0.1% (w/v) in isopropyl alcohol 0.1% (w/v) in methanol (methanol) 0.1% (w/v) 0.1% in 50% Ethanol 0.1% in 90% Methanol 0.1% in methyl acetate 0.1% in 95% Ethanol 0.1% w/v aqueous solution 0.1% 乙二醇溶液 0.1% 乙醇溶液 0.1%(w/v) in water 0.1%(W/V)in water 0.1%(W/V) 0.1%(w/v)in 50% Methanol 0.10% (w/w) 0.100 Normal (N/10), 0.0500 Molar (M/20) 0.1000mol/L in water 0.1000mol/L 0.100mg/mL in methanol 0.100mg/ml in methanol 0.100mg/ml 0.100ug/g in 0.5mol/L HNO3 with K+ 2.2mg/L,Na+ 23mg/L,Ca2+ 39mg/L,Mg2+ 11mg/L,0.5mol/L HNO3 0.104 M in methylvinylcyclosiloxanes 0.10mg/ml in methanol 0.125 N 0.125N, 0.0208M Solution 0.13% (0.044N) 0.13-0.14μm 0.15mg/L,in water 0.15mol/L 0.17M,无菌 0.1M NaCl 0.1M in Aceticacid 0.1M in H2O(20℃) 0.1M in Propanol 0.1mg/g KOH 0.1mg/mL toluene solution 0.1mm 厚, 99.9% (REO) 0.1mm 厚, 99.9% metals basis 0.1mm 厚, 99.99% metals basis 0.1mm 直径, 99.99% metals basis 0.1mm,99.9% metals basis 0.1mm,99.99% metals basis 0.1mm,99.999% metals basis 0.1mm,99.9% metals basis 0.1mm,99.99% metals basis 0.1mol/L 介质:H2O 0.1mol/L,pH5.8 0.1mol/L,pH6.0 0.1mol/L,pH8.5 0.1mol/L,pH8.7 0.1mol/L,pH8.9 0.1mol/L,pH9.3 0.1mol/L,pH9.5 0.1mol/L,介质甲醇 0.1ng/uL in Isooctane, analytical standard 0.1μg/mL 0.2 N 0.2 mg/mL于异辛烷 0.2 mm,99.9% metals basis 0.2 mm,99.99% metals basis 0.2 wt% 0.2% (w/v) in methanol (methanol) 0.2% (w/v) 0.2% in methanol 0.2% v/v 0.2%溶液 0.2%盐酸副玫瑰苯胺溶液 0.2%(w/v) in water 0.2%(w/v)in water 0.2%(w/w)in Sodium chloride 0.2-0.5mm,元素分析仪专用 0.2-0.5mmol/g 0.200 Normal (N/5) in Denatured Alcohol 0.200 g/L 0.2000mol/L(0.2M) 0.2000mol/L(0.2N) 0.24-0.26μm 0.25 M in diethyl ether 0.25 M solution in THF 0.25 M solution in diethyl ether 0.25 M, HPLC 0.25% in Water,for pH Determination 0.25%(w/v)in water 0.25%,无菌,不含酚红 0.250 Normal (N/4) 0.25M Solution In THF, MkSeal 0.25M in THF 0.25mm 直径, 99.99% (metals basis 去除 Ta) 0.299mg/L,基体:甲醇 0.2M in Acetic acid 0.2M in H2O(20℃) 0.2M in Methanol 0.2M,pH7.2 0.2M,pH7.5 0.2M,pH7.6 0.2mm直径,99.999% metals basis 0.2mol/L in methanol 0.2mol/L,pH7.0 0.3% (v/v) 0.3% (w/v) 0.3%(w/v)in water 0.30-1.70mg/L 0.300 Molar (0.300 Normal) 0.3238 Normal 0.333 Normal (N/3) 0.35% (v/v) 0.374μmol/g,基体:水 0.380 Normal 0.384% (w/v) (7.68 g/ 2000 mL) 0.3M in water(pH3.0±0.2) 0.3mm 厚, 99.9% (REO) 0.4 M from Trace Metal Grade 0.4 Molar 0.4% (w/v) (4 g/L) 0.4%溶液,用于组织培养 0.4%(W/V)in water 0.4%(w/v)in water 0.40% 0.421-3.32mg/L in water 0.4M in ethylene glycol 0.4M solution in toluene 0.5 M in 2-methyltetrahydrofuran 0.5 M in H2O 0.5 M in benzene: cyclohexane 0.5 M in hexanes 0.5 M in toluene 0.5 M solution in THF, MkSeal 0.5 M 0.5 mg/mL in sterile water 0.5 mg/ml in ethanol,>98% 0.5 to 1M aqueous solution,≥98% 0.5 wt. % in ethanol 0.5 wt. % in methyl acetate 0.5% (w/v) in 80% (v/v) Acetic Acid 0.5% in 50% Ethanol 0.5% in ethanol 0.5% on alumina, reduced 0.5% on alumina 0.5% on titanium silicate, 50% water-wet paste 0.5% stabilized aqueous solution 0.5% w/w 0.5%水溶液 0.5%溶液 0.5%(w/v)in water 银量滴定法中的吸附指示剂 0.5%(w/v)in water,含0.5% KI 0.5-1.0mm,元素分析仪专用 0.5-1mm,元素分析仪专用 0.500 Normal (N/2) in 90% (v/v) Denatured Alcohol 0.500 Normal (N/2) in Denatured Alcohol 0.500 Normal (N/2) in Isopropyl Alcohol 0.5000mol/L(0.5N) 0.5088 mol/L 0.50M in THF 0.518umol/g in water 0.550 Normal in Denatured Alcohol 0.56 M in hexanes 0.560 Normal in Denatured Alcohol 0.5M EDTA溶液 (pH8.0) 0.5M in MTBE 0.5M in ether 0.5M solution in THF 0.5M solution in THF, MKSeal 0.5M (11 wt.%)toluene solution 0.5M,pH2.5 0.5M,pH3.0 0.5M,pH3.5 0.5M,pH4.0 0.5M,pH4.5 0.5M,pH5.0 0.5M,pH5.5 0.5M,pH6.0 0.5M,pH7.0 0.5MsolutioninTHF,MKSeal 0.5M水溶液 0.5M,pH 6.8 灭菌 0.5M,pH 6.8 0.5M,pH10 0.5M,pH7.2 0.5M,pH7.5 0.5M,pH7.9 0.5N in 10% ethanol 0.5mg/g KOH 0.5mm 厚, 99.998% metals basis 0.5mm 厚,99.9975% metals basis 0.5mm 直径, 99.998% metals basis 0.5mol/L in Water 0.5mol/L in water, for Ion-pair chromatography 0.5mol/L,pH8.0 0.5ppb(±0.02ppb) 0.5~1.1mmol/g, 100~200 mesh, 1% DVB 0.6% (w/v) in 80% (v/v) Acetic Acid 0.6% on activated carbon, 50% water-wet paste 0.6%(w/v)in water 0.60-0.70μm 0.600 Molar (0.600 Normal) 0.600 Molar 0.601mg/L,in water(稀释后) 0.625 mg/mL,生物技术级 0.62mm 厚, 99.9% (REO) 0.681% (w/w), Preserved 0.6MinTHF 0.6M 0.6mg/L,基体:甲醇 0.6~2.0mmol/g, 100~200 mesh,1% DVB 0.7 M solution in THF,water≤1000ppm, MkSeal 0.7 M solution in heptane 0.7 N 0.7-1.2mm,元素分析仪专用 0.70% (w/w), Preserved 0.706umol/g,in water 0.75% w/v 0.75-0.90μm 0.75M in THF 0.7M solution in toluene 0.7mol/L in diethyl ether,Energyseal 0.7±0.03mg/L 0.8 ppb(±0.35 ppb) 0.8% (w/v) in Glacial Acetic Acid 0.8-1.5mmol/g, 70~200 mesh, 1% DVB 0.8-12mm (0.03-0.47in), 99.98% (metals basis) 0.8-1wt%,直径1-3nm,长度1-2um 0.8-2mm,元素分析仪专用 0.800mg/ml in H20 0.80mg/L,in H2O 0.85-1.7mm,元素分析仪专用 0.88 0.8mg/mL solution (pH 10) 0.9% (w/w) 0.900 Normal 0.985mg/ml,基体:甲醇 01:01.5 1 M Solution 1 M in Hexane 1 M in THF(约22%含量) 1 M in Tetrahydrofuran 1 M in pentane 1 gram per 1 mL Water, Filtered 1 mM in Tris Buffer 1 mg/mL in DMSO 1 mg/mL in acetonitrile, certified reference material, ampule of 1 mL 1ml 1 mg/mL in ethanol 1 mg/mL in methanol,99 atom % D 1 mg/ml in MES-buffered saline 1 mg/ml in isopropanol: NH4OH (7:3),≥98% 1 mol/L 1 unit = 1 μl of a 10 mM solution.,>95% 1 wt % loading, activated synthetic carbon pellet 1 wt % loading, activated synthetic carbon powder 1 μg/mL in Methanol 1 μg/ml in methanol 1 μm,98.5% 1 μm,98.5% 1% (v/v), Trace Metals Grade 1% (w/v) (10 g/L) 1% (w/v) Alcoholic Solution 1% (w/v) Aqueous Solution 1% (w/w) NaOCl 1% in Ethanol 1% in methyl acetate solution 1% on Titania(anatase)(surfactant and reactant-free),≤100nm 1% on Titaniaanatase/rutilesurfactant and reactant-free 1% on carbon blacksurfactant and reactant-free 1% solution in ethanol,>98% 1% solution in methyl acetate 1% w/v 1%溶液 1%(w/v)in methanol (甲醇) 1%(w/v)in water 吸附指示剂 1%(w/w)in Sodium chloride 1,700,000 USP units /g 1-2 M in water 1-2 mg水/ml,测含水量微小样品 1-3mm (0.04-0.1in),99.9997% (metals basis) 1-3mm,99.999% metals basis 1-3μm,元素分析仪专用 1-3μm, ≥99% metals basis 1.0 M Solution In Hexanes, MKSeal 1.0 M in 2-MeTHF 1.0 M in 2-methyltetrahydrofuran 1.0 M in H2O(cosolvent:~10% methanol) 1.0 M in Hexane 1.0 M in MeTHF 1.0 M in Methanol 1.0 M in THF,含5mmol硼氢化钠稳定剂 1.0 M in THF/hexanes, MKSeal 1.0 M in THF/toluene 1.0 M in THF(21%) 1.0 M in Tetrahydrofuran 1.0 M in heptane 1.0 M in hexanes,≥95% 1.0 M in n-hexane 1.0 M in tert-Butanol 1.0 M in water 1.0 M solution in H2O 1.0 M solution in Hexane 1.0 M solution in Methylene chloride 1.0 M solution in THF ,MkSeal 1.0 M solution in THF 1.0 M solution in methylene chloride 1.0 M solution in p-Xylene 1.0 M 1.0 N 1.0 g/L Be in nitric acid 1.0 mg/mL in Acetonitrile 1.0 mg/mL in ethanol, certified reference material 1.0 mg/mL in methanol 1.0 mol/L in H2O 1.0 wt. % in methyl acetate 1.0%HCl in 70%乙醇 1.0%HCl in 95%乙醇 1.0-2.2 1.00 Normal in 9% (v/v) Ammonium Hydroxide 1.00 Normal in Denatured Alcohol 1.00 Normal in Isopropyl Alcohol 1.000% ± 0.005 (v/v) 1.000mol/L(1N) 1.000×10-2 1.00mg / ml in methanol 1.00mg/mL u=2% 基质:正己烷 1.00mg/mL,溶剂:甲醇 1.00ng/uL Urel=3% k=2 1.00×10-6g/mL,in Perchloric acid aqueous solution 1.00×10-7g/mL,基体:甲醇 1.00×10-9g/mL,in Perchloric acid aqueous solution 1.00μg/g,in :K+ 2.2mg/L,Na+ 23mg/L,Ca2+ 39mg/L,Mg2+11mg/L,0.5mol/L HNO3 1.00~1.00×103μg/ml 1.0M in Hexane,MkSeal 1.0M in THF, in Sure/Seal™ bottle 1.0M in Tetrahydrofuran 1.0M in cyclohexane 1.0M in diethyl ether 1.0M in ethanol 1.0M in hexanes 1.0M in n-Hexane 1.0M in toluene 1.0M solution in THF 1.0M solution in toluene 1.0M 四氢呋喃溶液 1.0M 1.0M(18wt% ±2wt% )in toluene/tetrahydrofuran 1.0mg/mL in methanol, ampule of 1mL, certified reference material, Cerilliant 1.0mg/ml in methanol 1.0mm 厚, 99.99% metals basis 1.0mm 直径, 退火,99.995% metals basis 1.0mm 直径,99.999% metals basis 1.0mm直径, 99.9% metals basis 1.0mol/L in THF 1.0mol/L in Toluene 1.0mol/l in Toluene 1.0~1.24mmol/g ,100~200 mesh,1% DVB 1.137ppm(±0.357ppm) 1.14mg/ml in methanol 1.17μg/mL 1.2-2.0mm,元素分析仪专用 1.2-2.5mm,元素分析仪专用 1.25% (w/v) 1.25% (w/w) 1.2M 1.3 M 1.3%-1.5% in isopropanol 1.30 Normal 1.32mg/L in H2O,analytical standard,for water analysis 1.35-4.29mg/L,in water 1.36mmol/g, 100~200 mesh, 1% DVB 1.3M in Pentane 1.3M in n-hexane 1.4 M solution in THF 1.45% (v/v) 1.5 M in THF 1.5 M in diethyl ether 1.5 M in toluene 1.5 solution 20 wt. % in methanol 1.5% (v/v) 1.5% in water 1.5-2.0 units/mg 1.5-2.5mm,元素分析仪专用 1.50 Molar (3.00 Normal) 1.50mg/L,in water 1.51-14.8(mg/L),分析标准品 1.5M 己烷溶液 1.5M,pH 8.8 1.5M,pH 8.8 无菌 1.5mg/g KOH 1.5mm 直径, 退火,99.995% metals basis 1.6 M in THF 1.6 M in diethyl ether 1.6% 1.6M in dichloromethane 1.6M in diethyl ether 1.6M in hexane(15% solution) 1.6M in n-hexane 1.72mg/L in Water 1.72mg/L in water 1.76% (w/v) in 5% (v/v) Acetone, for Silica Determination (Molybdate Blue Method) 1.76% w/v 1.7M in THF 1.8 M in THF 1.80 Molar (1.80 Normal) 1.80 Molar 1.80-2.10μm 1.90% (v/v) 1.95% (w/w) 1.9cP 1.9±0.1ppm 1/24mol/L(0.25N) 1/2Na2CO3:0.1000mol/L 1/60mol/L(0.1N) 1/60mol/L(0.1N) 1/6mol/L(1N) 10 % 溶液 10 atom % 18O 10 g/L in Methanol 10 kDa CSP 10 kDa HS 10 kDa LS 10 mM amino acid in 0.1 M HCl, analytical standard 10 mM in Water,>95% 10 mM in water,≥95% 10 mM in water 10 mg phospholipid per ml CHCl3 10 mg/mL in Heptane 10 mg/mL neomycin in 0.9% NaCl 10 mg/ml in ethanol,≥98% 10 mg/ml in ethanol 10 mg/ml 10 ug/mL in acetonitrile, analytical standard 10 ug/ml,u=6~2%, in acetone 10 wt. % in methanol 10 wt. % in toluene 10 wt. % 异丙醇,<100 nm,99.9% metals basis 10 wt.% in propylene glycol 10 wt.% solution in hexanes 10 μg/mL in Isooctane 10 μg/mL in Toluene 10 μg/mL in acetonitrile: water 10 μg/mL in cyclohexane 10 μg/mL in isooctane, analytical standar 10% (v/v) in Methanol 10% (v/v), Trace Metals grade 10% (w/v) (100 g/L) 10% (w/v) Aqueous 10% (w/v) in benzene 10% (w/w) Aqueous 10% Ethyl Acetate 10% Pd(OH)2 10% Pd 10% in isopropanol,≥97% 10% in methanol 10% in propanediol 10% on Titaniaanatase/rutilesurfactant and reactant-free 10% on Titaniaanatasesurfactant and reactant-free 10% on activated carbon, Pearlman(50-70% wetted powder ) 10% on activated carbon, reduced, dry powder 10% on activated carbon 10% on activated wood carbon, reduced,50% water wet 10% on activated wood carbon, unreduced,50% water wet 10% on carbon blacksurfactant and reactant-free 10% solution in H2O 10% solution 10% w/v in ethanol 10% w/v in isopropanol/toluene, 98% trace metals basis 10%(W/V) 10%Pd,contains 40-60% H2O 10%w/w in propylene glycol 10%溶液 10%的水溶液,约2.4mol L 10-15%Nd 10-30 nm, 25% in H2O 10-50 nm, 20% in H2O 10-80% 10.0ng/ uL in isooctane 10.0ng/g,基体: 0.4mol/L HCL,K+2.2mg/L,Na+23mg/L, Ca2+39mg/L,Mg2+11mg/L 10.0ug/L(20℃) in 0.5mol/L HNO3 10.0μS/cm(25℃)in H2O,不确定度:1% 10.1-120mg/L in H2O 100 U/mg 100 g/L CO₂ 100 kDa HS 100 kDa LS 100 kDa 100 mM in water,≥95% 100 mM solution in water 100 mPa.s, neat(25 °C) 100 mesh, 99.9% metals basis 100 mesh,99.9% 100 mg/L 100 ml/pouch 100 ng/uL in acetonitrile, analytical standard 100 ng/ul acetonitrile 100 ng/ul于环己烷,10ML 100 ng/μL in acetonitrile,analytical standard 100 ng/μL in acetonitrile,≥95% 100 ng/μL in methanol 100 ug/ml in Toluene 100 ug/ml in Water 100 ug/ml 100 μg/mL in n-hexane 100 μg/mL in Acetonitrile 100 μg/mL in Methanol 100 μg/mL in isooctane 100 μg/mL in methanol 100 μg/mL于乙腈 100 μg/mL溶于乙腈 100 μg/ml in ethanol,>97% 100 μg/ml 100% (w/v) (1000 g/L) 100%(W/V) 100%,浊点>100℃ 100-120目 125-150um 100-160目 97-150um 100-180目 88-150um 100-200 mesh, 1% DVB 100-200 mesh 100-200目 75-150um 100-200目 ≥75% 100-200目,已活化 100-200目≥75%,已活化 100-200目≥75% 100-300 nm, 25% in H2O 100-300 units/mg protein 100.0μg/ml in 1.5mol/L HCl 1000 kDa 1000 mPa.s, neat(25 °C) 1000 mg/L Cr(III) in nitric acid 1000 µg/ml 1000 μg/mL in DMSO 1000 μg/mL in methanol 1000 μg/ml in 5%HCL 1000 μg/ml,in Purge and Trap Methanol 1000.0 mg/L in water 10000 x in DMSO 100000mPa.s 100000μS/cm(25℃)in H2O,不确定度:0.25% 10000μS/cm(25℃)(10 mS/cm)in H2O,不确定度:0.25% 1000mg/L Zn in 1%HCl 1000mg/L in 1%HNO3 1000mg/L in H2O 1000mg/L in water 1000mg/L,基体:水 1000mg/L,溶剂:二氯甲烷 1000mg/L 1000mg/L于二氯甲烷 1000mg/L于叔丁基甲醚 1000ppm in acetone 1000ppm in water 1000ppm,粒径:10-15nm 1000ppm,粒径:2nm 1000ug/mL Ir in 2.0mol/L HCL 1000ug/mL in water 1000ug/mL in: 1%HNO3 1000ug/mL in:1%HNO3 1000ug/mL,in 3%HNO3 1000ug/mL,in 5%HCl 1000ug/ml Pb in 1.0 mol/L nitric acid 1000ug/ml Tm in 10%HCl 1000ug/ml Zn in 1% HNO3 1000ug/ml in Toluene 1000ug/ml in 0.02mol/L NaOH 1000ug/ml in 1%HCl 1000ug/ml in 1%acetic acid 1000ug/ml in 1.0mol/L HNO3 and tr.HF 1000ug/ml in 1.0mol/L nitric acid 1000ug/ml in 1.5mol/L HCl 1000ug/ml in 10%HNO3 1000ug/ml in 2.0 mol/L HNO3 1000ug/ml in 2.0 mol/L hydrochloric acid 1000ug/ml in 3.0 mol/l HCl with trace HNO3 1000ug/ml in 5% HCl 1000ug/ml in 5%HCl 1000ug/ml in Acetonitrile 1000ug/ml in Ethyl Acetate 1000ug/ml in Water (20℃) 1000ug/ml in high purity Hexane 1000ug/ml in methanol 1000ug/ml in water 1000ug/ml in1.0mol/L HNO3 1000ug/ml ±1% (20℃) 1000ug/ml,,in 1.0 mol/L HNO3 1000ug/ml,in 1.0mol/L Nitric acid 1000μS/cm(25℃)in H2O,不确定度:0.25% 1000μg/mL in Methanol,不确定度:2% 1000μg/mL in 10%HCL 1000μg/mL in Acetonitrile,不确定2% 1000μg/mL in Acetonitrile,不确定度2% 1000μg/mL in Carbon disulfide 1000μg/mL in Ethanol,uncertainty 2% 1000μg/mL in Ethanol,不确定度2% 1000μg/mL in Hexane,uncertainty 2% 1000μg/mL in Hexane,不确定度 2% 1000μg/mL in Hexane 1000μg/mL in Hexane,不确定度2% 1000μg/mL in Methanol , 不确定度2% 1000μg/mL in Methanol,uncertainty 2% 1000μg/mL in Methanol,不确定度3% 1000μg/mL in Metha,不确定度2% 1000μg/mL in n-hexane 1000μg/mL,基体: 1%HNO3 1000μg/mL,溶剂:水 1000μg/ml in H2O(不确定度1%) 1000μg/ml in 1%HF+5%HNO3 1000μg/ml in 2-5%HNO3 1000μg/ml in H2O 1000μg/ml in HCl 1000μg/ml in acetone 1000μg/ml 邻苯二甲酸氢钾 in H2O 1000μg/ml, in 1.0mol/L HNO3 and trace HF 1000μg/ml,1.0mol/L in HNO3 1000μg/ml,in 1.0 mol/L HNO3 1000μg/ml,in 1.0 mol/L hydrofluoric acid 1000μg/ml,基体:1.0 mol/L 硝酸 1000μg/ml,基体:乙酸乙酯 1000μg/ml,溶于吹扫-捕集甲醇溶液中 1000μg/ml,溶剂:1.0 mol/L HNO3 and tr. HF 1000μg/ml,in Methanol 1000μg/ml,基体:甲叔丁醚 1000μg/ml,基体:甲醇 1000μg/ml,总硬度 1000~1500mpa.s,25℃ 100X DNA STAIN 100mM aqueous solution 100mM in ethanol 100mM 溶液, pH 7.0 100mg/L (20℃) in 1%HCl 100mg/L in 0.05mol/L H2SO4 100mg/L in acetone 100mg/L in methanol 100mg/L(as N ) in H2O 100mg/L,溶于吹扫-捕集甲醇溶液中 100mg/L,溶剂:甲醇 100mg/L 100mg/L于P/T甲醇 100mg/L于甲苯:己烷 1:1 100mg/L于甲醇 100mg/L,in 0.05NH2SO4 100mg/L,基体:异辛烷 100mg/ml,无菌 100ng/ul in Methanol 100ng/ul,溶于甲醇 100ng/μl in Cyclohexane 100nm,99.5% metals basis 100ppm 100ug/mL in 10%HCl 100ug/mL in 5%HCl 100ug/mL in Isooctane 100ug/ml Pb in 1%HNO3 100ug/ml Zn in 1%HNO3 100ug/ml in 0.05% NaOH 100ug/ml in 2%sulfuric acid(including 7.5g/Lammonium sulfate) 100ug/ml in 3%HNO3 100ug/ml in 5% HNO3 100ug/ml in HCl 100ug/ml in Petroleum ether 100ug/ml in Water (20℃) 100ug/ml in acetone,u=4% 100ug/ml in acetone,u=6~4% 100ug/ml in methanol 100ug/ml,u=2%,in acetone 100ug/ml,基体:甲醇 100ug/ml,溶剂:正己烷 100×,不含EDTA 100×,无动物源性 100×,无菌 100μS/cm(25℃)in H2O,不确定度:0.25% 100μg/mL in Acetonitrile,不确定度3% 100μg/mL in Methanol,不确定度:3% 100μg/mL in Acetonitrile , 不确定度3% 100μg/mL in Acetonitrile, 不确定度3% 100μg/mL in Acetonitrile,不确定度3% 100μg/mL in Acetonitrile,不确定3% 100μg/mL in Ethanol,uncertainty 3% 100μg/mL in Ethanol,不确定度3% 100μg/mL in Hexane , 不确定度3% 100μg/mL in Hexane, 不确定度3% 100μg/mL in Hexane 100μg/mL in Hexane,不确定度3% 100μg/mL in Methanol, 不确定度3% 100μg/mL in Methanol,uncertainty 3% 100μg/mL in Methanol,不确定度 3% 100μg/mL in methanol,不确定度:3% 100μg/mL in methanol 100μg/mL in methanol,不确定度3% 100μg/mL u=2% 基质:丙酮 100μg/mL,U(%)=2,介质:甲苯 100μg/ml in 5% HNO3 100μg/ml in H2O 100μg/ml in H2O(不确定度 2%) 100μg/ml 溶剂:5%硝酸,traceHCl 100μg/ml, in hydrochloric acid, nitric acid 100μg/ml,in 1% HCl 100μg/ml,in 2.5mol/L HCL 100μg/ml,in 8% HNO3, 1% HF,Na+ 100μg/ml,in Methanol 100μg/ml,in water 100μg/ml,u=2%,in ethyl acetate 100μg/ml,基体:丙酮 100μg/ml,介质 10%硝酸 100μg/ml,基体:5%HCL 100μg/ml,基体:甲叔丁醚 100μg/ml,基体:甲醇 100~200mpa.s,25℃ 101.0 mOsmol·Kg-1 1011mg/L,U=26mg/L 101µS/cm 1020.7±81.2ppb 103.4 ppb(±7.6 ppb) 103.9mg/kg 1048mg/kg 105.5±12.6ppb 109℃ 10:1 提纯 10:1提纯 水提 10M 10mg/g KOH 10mg/mL 10mg/ml in H2O 10ng/ul in cyclohexane 10ng/ul in methyl tert-butyl ether 10ng/μl in Cyclohexane 10nm ,98% metals basis,γ型 10nm,1 OD,在0.1mM稳定悬浮柠檬酸盐缓冲液中提供, 515-520nm abs. max. 10ug/g, in Octane/Toluene:99/1 10ug/ml,u=2% ,in acetone 10ug/ml,u=5%,in benzene 10ug/ml 10wt% 10× pH 7.0 10× pH 7.4 10× pH 7.5 10× pH 7.6 10× pH 8.0 10× pH 8.5 10×,pH7.2-7.4,,粉剂,不含Ca2+/Mg2+ 10×,pH7.2-7.4,无菌,不含Ca2+/Mg2+ 10×,pH7.5 10×,pH7.8 10×,pH8.0 10×TBS,pH7.4 10×TBS,pH7.5 10×,PH:8.2-8.4(1×) 10×,PH:8.45-8.55(1×) 10×,pH7.2-7.4,无菌,含Ca2+/Mg2+ 10μmol=~4.6mg,≥98% 11.1% (v/v) 11.3 ppb(±1.4 ppb) 11.5% (w/v) 11.7-13.0% B 11.7mg/kg 11.8% of S minimum as sulfide 110000μS/cm(25℃)in H2O,不确定度:0.25% 111.3mS/cm(25℃)in H2O,不确定度:0.25% 116.8℃ 119ug/ml in methanol 12% (v/v) 12% (w/w) 12%Co 12-16目 12.0 Normal 12.1±1.1μg/L 12.5 Normal 12.5% (w/v) 12.7mg/L 12.88mS/cm(25℃)in H2O,不确定度:0.25% 12.88mS 12.8mg/L,in NaOH 12.8μg/L,分析标准品 120-200μm ,60Å,Bet:500m2/g 120000μS/cm(25℃)in H2O,不确定度:0.25% 1200μg/mL in Carbon disulfide 125-500um 125μS/cm(25℃) in H2O,不确定度:0.25% 13%于四氢呋喃中, 约0.8mol/L 13-14% active oxygen 130000μS/cm(25℃)in H2O,不确定度:0.25% 13个组份,100ng/μl丙酮溶液 14 wt.% in methanol 14% (v/v) 14% w/w 14% wt. in methanol 14000μS/cm(25℃)in H2O,不确定度:0.25% 1400μS/cm(25℃)in H2O,不确定度:0.25% 1408μS/cm(25℃)in H2O,不确定度:0.25% 140µS/cm 1410μs/cm(25℃) 1413μS/cm(25℃)in H2O,不确定度:0.25% 146.3μS/cm(25℃)in H2O,不确定度:0.25% 147.4μs/cm(25°C) 147μS/cm(25℃)in H2O,不确定度:0.25% 149.2℃ 15% Mo 15% w/w 15%(w/v) 15%-20%in sulfuric acid 15%Mo 15%(v/v)in iso-Propyl alcohol(异丙醇) 15-20 wt. % in water,≥99% 15-30nm,5mg/ml in H2O 15.0 Normal 15.0-18.0 s,丁醛基70-75% 15.00mS 15.3% Pt 150000μS/cm(25℃)in H2O,不确定度:0.25% 1500mPa.s 1500μS/cm(25℃)in H2O,不确定度:0.25% 1500~2500mpa.s,25℃ 150μS/cm(25℃)in H2O,不确定度:0.25% 150μm 156ug/ml in methanol 15cm或更小, 99.999+% metals basis 15mPa.s 15mg/g KOH 15nm, 1 OD, 在0.1mM稳定悬浮柠檬酸盐缓冲液中提供, 520nm abs. max. 15μS/cm(25℃)in H2O,不确定度:1% 16% (v/v) 16-50 目 16.5% (w/v), Stabilized 160-200目 75-98um 160.0 - 195.0μg/mL,溶剂:甲醇 160000μS/cm(25℃)in H2O,不确定度:0.25% 160μS/cm(25℃) in H2O,不确定度:0.25% 164.9±20.5ppb 165.0μg/mL,溶剂:甲醇 165.8℃ 1650 U/mg 169.7℃ 16个品种100ng/μl环己烷溶液 16个品种丙酮/甲醇溶液 16种,溶剂:甲苯 16种混合物浓度各为500 μg/ml溶于高纯度甲苯 16种混合物组合;基质:丙酮;US EPA方法: 505 17% (v/v) 17-23%钒 170 kDa 17个品种1000ng/μl正己烷溶液 18 mM in acetone,≥98% 18 wt% in dimethylbenzene 18 wt%二甲苯溶液 18 wt. % in H2O,含5-8% 甲醇稳定剂 18% (w/v) 18% v/v 18-22mPa.s,5%甲苯/异丙醇80:20 18.0 Normal 180-220mPa.s,5%甲苯/异丙醇80:20 18000μS/cm(25℃)in H2O,不确定度:0.25% 1800μS/cm(25℃)in H2O,不确定度:0.25% 180μS/cm(25℃)in H2O,不确定度:0.25% 185 USP units/mg 185μS/cm(25℃)in H2O,不确定度:0.25% 188ppb (±78ppb) 19%-21%水溶液 19-23% Ce basis 19.9 ppb(±2.7 ppb) 19000μS/cm(25℃)in H2O,不确定度:0.25% 199.9 mOsmol·Kg-1 19mm 或更小, 99% metals basis 1:1比例 1:250,组织培养级 1M LiCl 1M THF 1M in Dichloromethane 1M in H2O 1M in MeTHF 1M in Tetrahydrofuran 1M in Water 1M in dichloromethane 1M in pentane 1M or 10%KNO3 1M,pH 6.8 1M,pH 7.4 1M,pH 8.0 1M,pH6.8 无菌,DEPC处理 1M,pH6.8 1M,pH8.0 1M,pH 6.8 灭菌 1M,pH 7.0 1M,pH 7.4 灭菌 1M,pH 7.5 灭菌 1M,pH 7.5 1M,pH 7.6 灭菌 1M,pH 7.6 1M,pH 8.0 灭菌 1M,pH 8.5 灭菌 1M,pH 8.5 1M,pH 8.8 灭菌 1M,pH 8.8 1M,pH 9.0 灭菌 1M,pH 9.0 1M,pH 9.5 1M,pH7.6 1M,pH8.0 1mL可灭活120 1mg/ml (1,000ppm),基体:水 1mg/ml ,用于水质分析 1mg/ml in 0.4%NaOH 1mg/ml in 1% HN03 1mg/ml in 1.0mol/L HNO3 1mg/ml in H20 1mg/ml in Methanol,for Water Analysis 1mg/ml 片径3-6nm 1mg/ml 片径:15nm 1mg水/ml,测含水量较低样品,A液 1mg水/ml,测含水量较低样品,B液 1mg水/ml,测含水量微小样品 1mg水/ml,测水量微小样品 1mm 直径, 99.998+% metals basis 1mm-1.6mm,干燥剂用 1mol/L in Tetrahydrofuran 1mol/L(2N) 1mol/L, 介质: H2O 1mol/L,pH8.0 1mol/L,无菌 1×,pH7.2-7.4,,无菌,不含Ca2+/Mg2+ 1×,pH7.2-7.4,,粉剂,不含Ca2+/Mg2+ 1×,pH7.2 1×,pH7.5 1×,pH7.8 1×,pH8.0 1×,无菌,基础型 1×,无菌,高存活率型 1×TBS,pH7.4 1×TBS,pH7.5 1×TBS,pH8.0 1×,pH7.2-7.4,无菌,含Ca2+/Mg2+ 1μg: 2 μg/ml in methanol 0.5μg: in 0.5 mL methanol 1μm 1:15000 1:3000 2 % cross-linked with divinylbenzene 2 : 1 = trans : cis 2 M in H2O 2 M in THF 2 wt% in water 2 wt. % in H2O 2 wt% 2 μg/mL in acetonitrile 2% (v/v) in denatured(变性) Ethanol(乙醇) 2% (v/v), with Gentian Violet 2% (w/v) Alcoholic 2% (w/v) with Mixed Indicator for Ammonia and Kjeldahl Nitrogen Analysis 2%水溶液 2%粘度:6mPa.s,甲氧基:28-30%;羟丙基:7.0-12% 2%(w/v)in water,含5% KI 2%(w/v)in water 2,3-二氯甲苯 分析标准品,用于环境分析 2,4-二氯酚:50.1μg/mL,2,4,6-三氯酚:21.2μg/mL,五氯酚:11.2μg/mL 2-3mm,球形 2-4mm 空心球, 元素分析仪专用 2-5mm (0.08-0.20in) 直径, 99.9999% (metals basis) 2-5um/99.5% 2.0 M in H2O(cosolvent:~18% methanol) 2.0 M in THF(40%) 2.0 M in heptane/THF/ethylbenzene 2.0 M in hexanes 2.0 M in methylene chloride 2.0 M in n-hexane 2.0 M in tetrahydrofuran 2.0 M in toluene 2.0 M solution in Diethyl ether 2.0 M solution in Methanol,MkSeal 2.00 Molar 2.08 Normal 2.0M solution in THF 2.0N / IPA 2.0mg/g KOH 2.0mm 厚,99.9985% metals basis 2.0mm直径, 99.999% metals basis 2.1 ppm(±0.2ppm) 2.20 M in methanol 2.2M in hexane(20% solution) 2.3 % (w/w) Aqueous 2.3 Molar 2.4-3.4 mmol/g loading, 1% cross-linked 2.40% (v/v) 2.5 M in THF 2.5 M in hexanes(23% solution) 2.5% (v/v) 2.5% v/v 2.5% w/v in isopropanol,≥99% 2.50% 2.5M (30 wt%) in THF 2.5M in hexane 2.5mg/g KOH 2.5mg/ml 2.5mol/L,无菌 2.61-5.91(mg/L) in H2O(稀释后) 2.75 Normal 2.7M in hexane(25% solution) 2.7±0.2ppm 2.9M in 2-methyltetrahydrofuran 20 % (w/w) in H2O 20 kDa HS 20 kDa LS 20 wt. % in 4% sulfuric acid 20 wt. % in water 20 wt. % suspension in THF 20 wt. % 水溶液,600-900 cP (25 °C) 20 wt.% in H2O 20% (v/v) in Methanol 20% (w/w) 20% emulsion 20% in C6H5Cl 20% in ethanol 20% in methanol (NT) 20% in methanol 20% in tetrahydrofuran 20% on activated carbon (Pearlman's catalyst), unreduced, 50% water wet paste 20% on carbon blacksurfactant and reactant-free 20% w/v in aqueous solution 20% w/v 20% w/w in H2O 20% w/w in ethanol 20%-26% in H2O 20%w/w solution in diethylene glycol diethyl ether 20%水溶液,约2mol/L 20%水溶液 20%甲醇溶液,~20% in methanol (T) 20%,COD≥17万mg/L 20%,pH7.2 20-25% in toluene 20-30目,元素分析仪专用 20-40nm,5mg/ml in 0.5% Acetic Acid 20-40目 GC 20-40目,分散在水中 20-500 ug/L, in 1% HNO3 20-60 mesh 20-60目 250-830um 20.0g/L U=1%; k=2 20.0×103ug/L(20℃) in 0.5mol/L HNO3 20.22μg/mL 200 mPa.s, neat(25 °C) 200 mesh, 99% 200-300 目 200-300目 54-75um 200-300目 ≥70% 200-300目≥70% ,已活化 200-300目≥70% 200-600μm 2000 U/mL 2000 kDa HS 2000 units/mg 2000 μg/mL in methanol, analytical standard 2000 μg/mL in methanol 200000μS/cm(25℃)in H2O,不确定度:0.25% 20000μS/cm(25℃)in H2O,不确定度:0.25% 2000U/g 2000mg/L于P/T甲醇 2000mg/L,溶剂:二氯甲烷 2000ug/ml each component in Benzene : methylene chloride ( 1:1 ) 2000ug/ml in Methanol 2000ug/ml in carbon disulfide,analytical standard 2000μS/cm(25℃)in H2O,不确定度:0.25% 2000μg/mL in methanol 2000μg/ml,溶于甲醇中 200g/L 200nm,99.5% metals basis 200nm,99% 200ug/ml each component in Acetonitrile, analytical standard 200ug/ml in Purge and Trap Methanol 200ug/ml in hexane 200ug/ml in high purity Hexane 200unit/mg solid 200μS/cm(25℃)in H2O,不确定度:0.25% 200μg/mL ,U=2.0%,k=2 200μg/ml,in Purge and Trap Methanol 20X 20mg/L 20mm或更小, 99.9% (REO) 20nm 球形,99.5%,γ型 20nm, 1 OD, supplied in 0.1mM stabilized suspension citrate buffer, 524nm abs. max. 20nm-50nm 球形,99.5% 20nm-50nm,99.5% metals basis 20wt% 20× (PH7.0) 20× DMSO 溶液, PCR 20× in DMSO 20× pH 7.4 20× pH 7.6 20× pH 8.0 20×,pH7.4 20×TBS,pH7.5 20×TBS,pH8.0 20× 20×,pH:7.0 20μS/cm(25℃)in H2O,不确定度:1% 20℃:/;25℃:79000;37.78℃:28000;40℃:23000;50℃:11000 20℃:0.47;25℃:0.45;37.78℃:0.41;40℃:0.40;50℃ 20℃:0.74;25℃:0.70;37.78℃:0.61;40℃:0.60;50℃ 20℃:1.3;25℃:1.2;37.78℃:1.0;40℃:0.97;50℃:0.87 20℃:1000000;25℃:64000;37.78℃:/;40℃:18000;50℃:8500 20℃:10;25℃:8.7;37.78℃:6.0;40℃:5.7;50℃:4.4 20℃:110;25℃:87;37.78℃:48;40℃:44;50℃:30 20℃:1400;25℃:1000;37.78℃:470;40℃:410;50℃:250 20℃:14;25℃:12;37.78℃:8.0;40℃:7.5;50℃:5.8 20℃:160;25℃:120;37.78℃:60;40℃:54;50℃:35 20℃:1800;25℃:1300;37.78℃:590;40℃:520;50℃:310 20℃:19000;25℃:12000;37.78℃:4000;40℃:3400;50℃:1700 20℃:2.9;25℃:2.6;37.78℃:2.1;40℃:2.0;50℃:1.7 20℃:20;25℃:16;37.78℃:11;40℃:10;50℃:7.5 20℃:210;25℃:160;37.78℃:83;40℃:75;50℃:50 20℃:2600;25℃:1800;37.78℃:850;40℃:750;50℃:450 20℃:28000;25℃:17000;37.78℃:6000;40℃:5100;50℃:2500 20℃:30;25℃:24;37.78℃:15;40℃:14;50℃:10 20℃:320;25℃:230;37.78℃:110;40℃:98;50℃:61 20℃:3300;25℃:2300;37.78℃:1100;40℃:940;50℃:560 20℃:4.4;25℃:3.9;37.78℃:3.0;40℃:2.9;50℃:2.4 20℃:400;25℃:300;37.78℃:160;40℃:140;50℃:90 20℃:41000;25℃:25000;37.78℃:8000;40℃:6700;50℃:3200 20℃:43;25℃:34;37.78℃:20;40℃:18;50℃:13 20℃:4900;25℃:3500;37.78℃:1600;40℃:1400;50℃:830 20℃:550;25℃:400;37.78℃:200;40℃:180;50℃:110 20℃:58000;25℃:36000;37.78℃:/;40℃:10000;50℃:4900 20℃:59;25℃:47;37.78℃:27;40℃:25;50℃:18 20℃:6.7;25℃:5.8;37.78℃:4.2;40℃:4.0;50℃:3.2 20℃:77000;25℃:47000;37.78℃:/;40?C:13000;50℃:6100 20℃:7900;25℃:5800;37.78℃:2800;40℃:2500;50℃:1500 20℃:790;25℃:580;37.78℃:280;40℃:250;50℃:160 20℃:8400;25℃:5300;37.78℃:1900;40℃:1600;50℃:810 20℃:88;25℃66;37.78℃:35;40℃:32;50℃:21 20℃:980;25℃:710;37.78℃:340;40℃:310;50℃:190 21.5% (w/w) 21.7 ppb(±2.1 ppb) 215-300 μm (50-70 U.S. sieve) 2163mg/kg 22.5% in water 22.5%水溶液 221.2℃ 22mm (0.9in) 直径, 99+% (metals basis), Sr ≤0.8% 230-400目 38-54um 230.0μg/mL,溶剂:甲醇 235.49 g/Mol 237mg/L in water 238.0μg/mL,溶剂:甲醇 23K 2400:400(6:1) 25 grams + 100 mL Water for Direct Count for Bacteria, Yeast, and Mold 25 wt. % in H2O 25 wt. % in hexanes 25 wt. % in n-Hexane 25 wt. % in toluene 25 μM in TE 25 μg/mL in acetonitrile: water 25 μg/mL in acetonitrile 25% (w/v) (250 g/L) 25% (w/v) in isopropanol 25% (w/w), Analytical Reagent Grade 25% in methanol 25% in water 25% v/v, trace metals 25% v/v 25% w/v in hexane 25% w/v 25% w/w in 1-甲氧基-2-丙醇 25%,来源蓝莓花青素 25%-29% 25% 25-28%, 蒸发残渣≤0.002% 25-28%, 蒸发残渣≤0.004% 25-29% Ba 25-30 wt. % in H2O 250000μS/cm(25℃)in H2O,不确定度:0.25% 25000μS/cm(25℃)in H2O,不确定度:0.25% 2500μS/cm(25℃)in H2O,不确定度:0.25% 250g 250μS/cm(25℃)in H2O,不确定度:0.25% 250μg/ml in methanol 250~450mpa.s,25℃ 25L 桶装 25cSt,40℃ 25mM each 25mg/5mL in PBS,非磁性,1um 25mg/ml,无菌 25wt% 25wt.% in H2O 25µmol/L 25μM 25μS/cm(25℃)in H2O,不确定度:1% 25μmol/L 25℃下的校正液pH值为1.07±0.05-无色 25℃下的校正液pH值为4.00±0.05-淡红色 25℃下的校正液pH值为7.01±0.05-黄色 2600~3300mpa.s,25℃ 27 USP units/mg 27% in C4H8O2 27.5% 270-330mPa.s,5%甲苯/异丙醇80:20 2765μS/cm(25℃) in H2O,不确定度:0.25% 28% (w/v) 28% K2O,粉末 28% in H2O,≥99.999% metals basis 28% in water solution 28% in water 28%-33% in water 28%NH3 in H2O,≥99.99%trace metals basis 2800μS/cm(25℃)in H2O,不确定度:0.25% 29% (w/w) 29.8μg/L 299.5 mOsmol·Kg-1 2M NH4Cl 2M:2M in H2O 2M 2U/μl 2mM 2mg水/ml,测含水量较低样品,A液 2mg水/ml,测含水量较低样品,B液 2mol/L,pH4.0 2mol/L,pH4.8 2um 2μm,医用级 2~5mm 3 Molar 3 N in D2O, 99.5 atom % D 3 wt.% in propylene glycol 3% NH3 in H2O 3% on activated carbon, reduced,50% water wet paste 3% on activated carbon, sulfided50-70% wetted powder 3% on activated wood carbon, reduced70% water wet paste 3% on polyethylenimine/SiO2 3-20目,99.998% metals basis 3-4 % in Heptane 3-5mg水/ml,测含水量较高样品 3-5mg水/ml,测水量较高样品 3-5mm,球形 3-5mmol/g 3-5mm,吸附剂,催化剂及载体 3-5mm,干燥剂用 3-7mPa.s,5%甲苯/异丙醇80:20 3.0 M in THF 3.0 M in methylene chloride 3.0 M solution in 2-Methyl-THF 3.0 M solution in Diethyl ether 3.0-5.0mm,元素分析仪专用 3.00 Molar (3.00 Normal) 3.1 M in diethoxymethane 3.10 Normal 3.175mm 直径 x 3.175mm 长, 99.9999% (metals basis) 3.175mm 直径 x 3.175mm 长,99.9999% metals basis 3.175mm 直径 x 6.35mm 长, 99.95% (metals basis去除Ta) 3.3mol/L(3.3N) 3.4um 3.4μm 3.5-8.0%Mg 3.5mg水/ml,测水量较小样品 3.7% 3.95% (w/w) 3.97 ug/mL U=2.7%(k=2) 30 nm 粒径, 20 wt. % 异丙醇溶液 30 nm 粒径, 20 wt. % 异丙醇溶液 30 units/mg 30 wt% in methanol(ca. 5mol/L in Methanol) 30 wt. % in H2O 30 wt. % in water 30% (v/v) in Methanol 30% (w/w), Analytical Reagent Grade 30% in H2O 30% on carbon blacksurfactant and reactant-free 30% solution in methanol 30% w/v 30% w/w 30% 水溶液,average Mw3000-5000 30%(Brij-35) in H2O 30%乙二醇溶液 30%水溶液(含磷酸稳定剂) 30%水溶液 30%,COD≥25万mg/L 30-33 wt. % in methanol 30-35 wt. % in ethanol 30-40% in heavy naphtha(2-2.5% Cr) 30-40% solution in toluene 30-90纳米 30.5μg/ml in Carbon tetrachloride 30.6-39.0%Cu 300,000 U/g 300-100目:95% 300-100目:98% 300-400目 37-54um 300-500nm,97% trace metals basis 30000μS/cm(25℃)in H2O,不确定度:0.25% 3000μS/cm(25℃)in H2O,不确定度:0.25% 3000目(5um),煅烧 300μS/cm(25℃)in H2O,不确定度:0.25% 300目,99% 30K 30mg/g KOH 30nm 球形 纯度>99.5% 30nm 球形,99.5%,α型 30nm 粒径, 20 wt. % 水溶液 30nm, 1 OD, supplied in 0.1mM stabilized suspension citrate buffer, 526nm abs. max. 30nm,30 wt. % 1,2-丙二醇单甲醚乙酸酯溶液 30nm,99.5% metals basis,α型 30nm,30 wt. % 1,2-丙二醇单甲醚乙酸酯溶液 30nm,98%,α型 30nm,99.5% 30±2% in H2O 30μS/cm(25℃)in H2O,不确定度:1% 30μg/mL~60μg/mL,分析标准品 30纳米 30%(m/V),29:1 30%(m/m),29:1 31% in H2O 32% (w/v) 32% (w/w) 32%溶液 32-36% 325目, 99.5% metals basis 33 wt. % in acetic acid 33 wt.% solution in Acetic acid, MkSeal 33% (w/v) 33% in Water 33.0-40.0% 33.3% (w/w) 3400~5000mpa.s,25℃ 34~38% 35 U/mg 35 wt. % in D2O, ≥99 atom % D 35 wt. % in H2O 35 μg/mL 异辛烷 35 μg/mL 异辛烷溶液 35 μg/mL于异辛烷 35% (v/v) 35% (w/w) 35% Aqueous Solution,35% 35% Aqueous solution 35% in H2O 35% in naphthenic acid, 2.8-3.2% V 35% in naphthenic acid,2.8-3.2% V 35%水溶液 35-39% 35.0-42.0% Ru basis 35000μS/cm(25℃)in H2O,不确定度:0.25% 35wt.% in H20 35wt.% in H2O 36%,固体 36.0-40.0% Ru basis 37 wt. % in H2O,含10-15% 甲醇稳定剂 38% v/v 38-42% aqueous solution 39-44% B2O3 basis, 31-37% CaO basis, powder 39-44% B2O3 basis, 31-37% CaO basis, powder 39.5mg/L,in NaOH 399.6 mOsmol·Kg-1 3M,pH5.2,无菌,DEPC处理 3M,pH5.2,无菌 3M 3M,pH4.5 3M,pH5.2 3U/μl 3mg水/1ml,测定常规样品,A液 3mg水/1ml,测定常规样品,B液 3mg水/ml,测含水量较低样品,A液 3mg水/ml,测含水量较低样品,B液 3mol/L(3N) 3mol/L,pH4.8 3mol/L,pH5.0 3mol/L,pH5.2 3mol/L,pH5.4 3mol/L,pH5.5 3mol/L,pH5.6 3mol/L,pH6.0 3mol/L,pH7.0 3万U/g 4% (v/v) in 70% Ethanol 4% (v/v) in Methanol 4% (v/v) 4% (w/v) (40 g/L) 4% (w/v), with Bromocresol Green-Methyl Red Indicator for Kjeldahl Nitrogen Analysis 4% (w/v) 4% Ca 4% in PBS 4% in water 4-6mm,99.999% metals basis 4-8 mmol/g 4-苯乙烯磺酸:马来酸(摩尔比率1:1) 4.0-6.0% (Al) 4.00 Normal 4.00% (w/w) 4.15mm厚, 99.99% metals basis 4.22μg/mL in methanol 4.38ug/ml in methanol 4.5 M in acetonitrile 4.5 N 4.5 kDa 4.5 ppb(±0.5 ppb) 4.5--5.5 wt % 4.5-6.5% (Al) 4.5mg/g KOH 4.725 Molar 4.76% (v/v) 4.76% 40 kDa LS 40 wt. % in H2O,≥99% 40 wt. % in H2O, 含0.01%的乙酸铵阻聚剂 40 wt. % in methanol,contains (3-chloropropyl)trimethoxysilane 40 wt. % solution in water,≥99% 40 wt.% in H2O 40% (v/v) 40% (w/v), Nitrogen Free - Suitable for Kjeldahl Nitrogen Analysis 40% (w/v) 40% (w/w), Analytical Reagent Grade 40% Solution in H2O 40% in 2-ethylhexanoic acid(3-8% Ca) 40% in H2O 40% solution in mineral spirits (6% Mn) 40% w/w in methanol 40% w/w in water 40% wt in Sulfuric Acid 40% 水溶液,即 2.6mol/L 40%+ in water 40%,熔点54.0-57.0℃ 40%溶液,电子级 40%溶液 40%溶液,电子级 40%甲醇,10%冰醋酸 40%(W/W) 40-160μm 40-47%MgO 40-60%,工业级 40-60%,工业级 40-60目,C1-C2烃,CO,CO2,C2H2,C2H4,C3H6分离 40-60目,C1-C4烃类分析 40-60目,乙烃,HCL分析 40-60目,气体,半水煤气等分析 40-60目,气体中微量水分析 40-60目,气体烃,甲醇中水等分析 40-60目,氯化氢,氨,甲醛中水和水中氨等分析 40-60目,氯化氢,氨,甲醛中水等分析 40-60目,永久性气体,气体中微量水分析 40-60目,用于极性,高沸点样品分析 40-60目,用于极性、高沸点、生化样品分析 40-60目,稀有气体、永久性气体、C1-C3烃类气体分离 40-60目,较高沸点样品分析 40-60目,醇类,芳烃等分析 40-63μm ,60Å,C含量15-19% 40-75μm ,70Å,Bet:480m2/g 40-80目 180-450um 40.0 - 50.0 % in methanol 40.5%-42.5% Pb 40.5%-42.5%Pb 400 NTU in water 400-1200 units/mg solid 400-800目 15-31um 400-800目 15-38um 40000mPa.s 40000μS/cm(25℃)in H2O,不确定度:0.25% 4000μS/cm(25℃)in H2O,不确定度:0.25% 4000μg/ml in Purge and Trap Methanol 400K,MA化程度20%-30% 400mPa.s 400μS/cm(25℃)in H2O,不确定度:0.25% 40mg/L 40mg/g KOH 40mpa.s 40nm, 1 OD, supplied in 0.1mM stabilized suspension citrate buffer, 530nm abs. max. 40nm,99.5% metals basis 40nm,99.5% 40μS/cm(25℃)in H2O,不确定度:1% 40%(m/m),39:1 41.2µS/cm 425-600 μm (30-40 U.S. sieve) 43% (w/w) 43% NaPO3 43.2μg/ml,溶剂:异辛烷 43.6%(wt) in dichloromethane 44 wt. % in H2O 44-48% CuO 44-50% 44.9ug/L in H2O 4400u/mg 45 wt. % in H2O 45 wt. % in water 45% (v/v) 45% (w/w), with 5 ppm Iron 45% FeCl3 basis 45% 水溶液,Mw≈ 4500 45-50% 45-55 % (w/w) in H2O 45-55 % (w/w) in water,≥98% 45-55 mg/mL in H2O 45-55%溶液 45-55mPa.s,5%甲苯/异丙醇80:20 45.0 - 55.0 % 去离子水作溶剂 45.0-50.0%,含≤1.5 % H3PO2 45.0mmol/l(以CaCO3计),in 0.1mol/L HCl 45.2ug/ml in methanol 4500μS/cm(25℃)in H2O,不确定度:0.25% 45um,-325 目, 99.9% metals basis 45μS/cm(25℃) in H2O,不确定度:1% 46% 460μg/ml in methanol 46 47% 48 wt. % in H2O, 99.99% metals basis 48-50% Ni basis,150μm 48-50% Ni basis,20-40目 48-50% Ni basis,50μm 48-50% in THF contains >0.5% sulfur dioxide as peroxide formation suppressor 48-50%溶液 48~50% Au basis 49 wt. % in 2-ethylhexanoic acid 49 wt. % in 200#Paint solvent 49-53 wt. % in H2O 4M KCL(不含Ag/AgCl) 4M KCL(含Ag/AgCl) 4M LiCl 4M 4mol/L 4×,pH 6.8 4×PE,pH8.0 5 % (w/v) in ethanol 5 % 溶液 5 M in THF 5 kDa HS 5 kDa LS 5 kDa 5 mg/ml in ethanol 5 mg/ml in methyl acetate,>97% 5 wt % loading, activated synthetic carbon powder 5 μg/ml in methanol,≥95% 5% (v/v) in denatured Alcohol 5% (v/v) in denatured(变性) Ethanol(乙醇) 5% (w/v) (50 g/L) 5% Pd basis 5% Pt,99.95% metals basis 5% carboxyl basis 5% in Tetrahydrofuran/Toluene 5% in propanediol 5% on activated carbon (50-70% wetted powder) 5% on activated carbon, reduced, 50% water wet paste 5% on activated carbon, reduced, dry powder 5% on activated carbon, unreduced,50% water wet paste 5% on activated carbon50-70% wetted powder Evonik Noblyst® P1093 5% on activated carbon 5% on activated wood carbon, reduced, 50% water wet paste 5% on activated wood carbon, unreduced,50% water wet paste 5% on alumina 5% on alu≥a powder, reduced, dry 5% on alu≥a, reduced, dry powder 5% on barium carbonate, reduced 5% on barium sulfate, reduced 5% on barium sulfate, unreduced 5% on calcium carbonate, lead-poisoned 5% on calcium carbonate, unpoisoned, reduced 5% on calcium carbonate, unpoisoned, unreduced 5% on calcium carbonate, unreduced, dryEscat™ 2371 5% on calcium carbonate, unreduced, dry 5% on carbon blacksurfactant and reactant-free 5% w/v in denatured Alcohol 5% w/v in ethanol 5%(w/v) 5%Pd,contains 40-60% H2O 5%Pd 5,000 units/mg protein 5-10 nm 粒径, 20 wt. % 水溶液 5-10 nm 粒径, 20 wt. % 水溶液 5-10% 5-10nm,20mg/ml 水溶液 5-10nm,自分散 5-9μm,元素分析仪专用 5.0 M in 1 M NaOH 5.0 M in diethyl ether 5.00 Normal, 5.00 Molar 5.00μg/mL,U=5.0%,k=2 5.0mg/ml solution 5.0mg/ml 5.20-5.90μm 5.4mg/L,1-5层 5.6% 50 U/μ 50 mg in 0.5 mL THF 50 mg solution in 0.5 mL tetrahydrofuran 50 mg/ml in ethanol,>98% 50 mg/ml in ethanol 50 ug/mL isooctane,≥96% 50 wt%己烷溶液 50 wt. % in H2O, 99% trace metals basis 50 wt. % in H2O,99.9% metals basis 50 wt. % in H2O, 99% trace metals basis 50 wt. % in dichloromethane, contains ~280 ppm 4-tert-Butylcatechol as inhibitor 50 wt. % in pentane 50 wt. % in toluene 50 wt. % 水溶液 50 wt. %水溶液 50 wt.% in H2O 50 wt.% solution in MeOH 50 wt.% solution in THF 50 μg/mL in Toluene 50 μg/ml in ethanol,98% 50 μg/ml in hexane containing 2% triethylamine 50 μg/ml in methanol/ammonium acetate buffer 70:30 50% (w/v), Suitable for Orsat Gas Analysis 50% (w/w) (760 g/L), Analytical Reagent Grade 50% (w/w) 50% DCM,95% 50% aqueous solution,99.9%-Eu(REO) 50% aqueous solution,99.9%-Lu(REO) 50% aqueous solution,99.9%-Nd(REO) 50% aqueous solution,99.9%-Pr(REO) 50% aqueous solution,99.9%-Sm(REO) 50% aqueous solution,99.9%-Tb(REO) 50% aqueous solution,99.9%-Y(REO) 50% aqueous solution,99.9%-Yb(REO) 50% aqueous solution,≥99%-Rb 50% aqueous solution,99.9%-Dy(REO) 50% aqueous solution,99.9%-Er(REO) 50% in 2-ethylhexanoic acid 50% in Diethyl Phthalate 50% in Methanol 50% in dibutyl phthalate 50% in diethyl phthalate solution 50% in ethanol(copolymer,3:7) 50% in ethanol(copolymer,7:3) 50% in methylene chloride, has free sulfonic acid 50% solution in H2O 50% w/v 50% w/w in hexanes 50% w/w in water 50% w/w 水溶液, 试剂级 50% w/w 50% water-wet pasteNanoselect Pt-200 50%,强度250% 50%aqueoussolution(99.9%-Eu)(REO) 50%乙酸锂溶液 50%水溶液,含0.25%甲酸甲酯稳定剂 50%溶液 50%甲苯溶液 50%甲醇溶液 50%邻苯二甲酸二辛酯溶液 50-100 mesh 50-100 μg/ml in ethanol 50-150 ppm MEHQ稳定剂 50-150 nm, 20% in H2O 50-300nm,99.9% metals basis 50-300nm,97% trace metals basis 50-54% Re,99.99%-Re 50-60% ZnO2 50-70% wetted powder 50-70% 50.0%(GC,异构体混合物) 50.00%水溶液 50.0ug/mL in Toluene:Methanol(volume ratio 1:4) 50.0μS/cm(25℃)in H2O,不确定度:1% 50.3% (w/w), with 5 ppm Iron 50.54μg/mL 50.7µg/ml 50.8 ppb(±4.4 ppb) 500 kDa HS 500 kDa LS 500 mg/L,溶剂:水和微量氨水 500 mg/ml in ethanol 500 μg/ml in ethanol 500.5 mOsmol·Kg-1 50000μS/cm(25℃)in H2O,不确定度:0.25% 5000μS/cm(25℃)in H2O,不确定度:0.25% 5000μg/ml in Water (20℃) 5000~6400mpa.s,25℃ 500U/ml 500g,AR(沪试),≥99.5% 500mg/L Pb in 5%HNO3 500mg/L Zn in 1%HCl 500mg/L in H2O 500mg/L,in 1%HNO3 500mg/L,in:3% HNO3 500ug/ml in Methanol 500°,in1%HCl 500μS/cm(25℃)in H2O,不确定度:0.25% 500μg/mL,基体:甲叔丁醚 500μg/ml,基体:甲醇 508.1mg/kg 50:50的混合物 50K 50U/mg 50mg/ml in H2O 50mg/ml,无菌 50nm 近球形,99.5% 50nm,30 wt. % 1,2-丙二醇单甲醚乙酸酯溶液 50nm,99% 50nm,99.99% metals basis 50nm,20-30% in Water 50nm,30 wt. % 1,2-丙二醇单甲醚乙酸酯溶液 50nm,40 wt. % in H2O 50nm,40 wt. % 异丙醇 50nm,50 wt. % in H2O 50nm,99% 50nm,球形, 99.9% metals basis 50ug/ml in H2O 50umol/L in hexanes,525-625nm peak emissions 50umol/L in hexanes,525nm peak emission 50umol/L in hexanes,575nm peak emission 50umol/L in hexanes,600nm peak emission 50umol/L in hexanes,625nm peak emission 50wt% in water 50wt%水溶液 50×,无菌,DEPC处理 50× 50μg size: 50 μg/ml in ethanol 1mg size: 1mg/ml in ethanol 50μm,分散在水中 50μmol/L in hexanes,550nm peak emission 50片/EA 50纳米 51% in toluene 52000μS/cm(25℃) in H2O,不确定度:0.25% 53 components each 200μg/mL in methanol solution 53000μS/cm(25℃) in H2O,不确定度:0.25% 54% 55 wt. % in H2O 55 wt. % in isobutanol 55% (w/w), with 5 ppm Iron 55%,含1000ppm TBC稳定剂 55.0 - 58.0 % 55.0 - 58.0%,含≤1.5 % H3PO2 稳定剂 56% (w/w) 56% 8微米 56% Pt basis 57 wt. %, distilled, 99.999% trace metals basis 58640μS/cm(25℃) in H2O,不确定度:0.25% 58700μS/cm(25℃)in H2O,不确定度:0.25% 59% Pt 59.00% 5mM in DMSO 5mg/ml in H2O 5mg/ml in hexanes,560nm peak emission 5mg/ml in hexanes,560nm,590nm,620nm peak emissions 5mg/ml in hexanes,590nm peak emission 5mg/ml in hexanes,620nm peak emission 5mg/ml 5mg水/ml,测含水量较高样品,A液 5mg水/ml,测含水量较高样品,B液 5mm (0.2in) 直径,99.995% (metals basis) 5mm 或更小, 99.9999% metals basis 5mm 直径,99.995% metals basis 5mm 直径,99.999% metals basis 5mm 直径,99.9999% metals basis 5mm×5mm 厚2mm 正方形 Ge≥99.999% 5mol/L,pH4.8 5mol/L 5nm, 1 OD, supplied in 0.1mM stabilized suspension citrate buffer, 515-520nm abs. max. 5um/99.5% 5×,pH 8.5 5μS/cm(25℃)in H2O,不确定度:1% 5μg/mL 6 wt. % (on silica gel) 6% Mn 6% Zr in mineral spirits 6% 6-9mPa.s,5%甲苯/异丙醇80:20 6.00 Molar 6.0mg/g KOH 6.25% (w/v) 6.35mm 厚, 99.9% metals basis 6.4% (w/v) (64 g/L) 6.50 Normal 6.8% (w/v) (68 g/L ) 60 wt %分散液 60 wt. % in methanol,contains (3-chloropropyl)trimethoxysilane 60 wt. % 水溶液 60 wt. %水溶液 60% (w/v) (600 g/L) 60% (w/v) 60% as Menthol 60% by mol cis-3-Hexenaol-D2 and 40% by mol Triacetin 60% dispersion in mineral oil 60% in Hexane, ca. 1.7mol/L 60% in propanol 60% in toluene6-8% Ni 60% in water,300-500ppm MEHQ 60% w/v 60% w/w in H2O 60% w/w in water 60% w/w 60% 水溶液 60%-70% 60%(含钠盐) 60%,GC 60+, high-cross linking (PhosphonicS SPM36) 60+, low-cross linking(PhosphonicS SPM32) 60-100 目 60-100目 150-250um 60-100目 60-100目≥75% 60-200μm ,60Å,Bet:500m2/g 60-70%水溶液 60-80目 180-250um 60-80目,C1-C2烃,CO,CO2,C2H2,C2H4,C3H6分离 60-80目,C1-C4烃类分析 60-80目,乙烃,HCL分析 60-80目,气体,半水煤气等分析 60-80目,气体中微量水分析 60-80目,气体烃,甲醇中水等分析 60-80目,氯化氢,氨,甲醛中水和水中氨等分析 60-80目,氯化氢,氨,甲醛中水等分析 60-80目,永久性气体,气体中微量水分析 60-80目,用于极性,高沸点样品分析 60-80目,用于极性、高沸点、生化样品分析 60-80目,稀有气体、永久性气体、C1-C3烃类气体分离 60-80目,较高沸点样品分析 60-80目,醇类,芳烃等分析 60/40 wt.% 600-800目 600.9 mOsmol·Kg-1 60000μS/cm(25℃)in H2O,不确定度:0.25% 600μS/cm(25℃)in H2O,不确定度:0.25% 60mesh 60mg/L 60nm 球形 纯度>99.5% 60nm 球形,98.0% 60nm,99.9% metals basis 60nm,99.9% metals basis 60um 60μm 61%min in mineral spirits ,Pb 24% 61%min in mineral spirits 61.8-148mg/L in water(稀释后) 615u/mg 62% 10微米 62-66%的水溶液 63% Solids in water,平均分子量M.W ~2,000 63% in Isopropyl Alcohol 64-66%的水溶液 65 % water 65 wt. % in mineral spirits 65% (w/w) 65% aqueous solution 65% in EtOH 65% in H2O 65% in THF 65%-70%水溶液 65%水溶液 65%,混合物 65-70% P2O5 basis 65-70% 65-72% in Water 65-72% in methanol 65wt% in H2O 65% 6670μS/cm(25℃) in H2O,不确定度:0.25% 68% in H2O 68-70% 69- 80 %(cu%),工业级 69.5%-70.5%水溶液 6mm 直径, 99.99999% metals basis 6mm 直径,99.9% metals basis 6个品种2000ng/μl甲苯溶液 6种混合物组合苯系物浓度各为2,000 μg/ml溶于吹扫捕集甲醇中 6种混合物组合苯系物浓度各为2,00μg/ml溶于吹扫捕集甲醇中 7% (v/v) Aqueous 7% (w/v) Aqueous 7-8 wt. % in methanol 7-8wt % 7-9% in water 7.00 Normal 7.3 ppb(±0.9 ppb) 7.4% 7.50 Molar 7.50-8.50μm 70 wt% in toluene 70% NaHS ;Na2S < 3.5% 70% (w/v) 70% (w/w) 70% HF 70% in ETOH 70% in water 70%, technical grade 70%, ≥99.999% metals basis 70%,99.999% metals basis 70%,用于生物染色实验 70%,用于电泳 70%in water 70%甲醇溶液 70%的水溶液 70%, technical grade 70%,含异构体和邻苯二甲酸 70%,甲醇10-20% 70-77 g/L (Activator 42 content, titration) 70.8℃ 700.2 mOsmol·Kg-1 70000μS/cm(25℃)in H2O,不确定度:0.25% 7000U/g 7000μS/cm(25℃)in H2O,不确定度:0.25% 700μS/cm(25℃)in H2O,不确定度:0.25% 70mg/g KOH 70nm,0.03mg/ml,溶剂:二甲苯 70ug/L in water(稀释后) 718μS/cm(25℃)in H2O,不确定度:0.25% 72-82%,粒径≤40mm 720 I.U./mg 73% in water 73-79% 74% 74%,光球状,3-5mm 74%,片状 74-76% in Water 74-76% in Water,含稳定剂MEHQ 75 wt. % in H2O,含 600 ppm MEHQ 阻聚剂 75 wt. % in isopropanol 75% (contains ca. 23% isomer) 75% (v/v) 75% in H2O 75% w/w 75% 水溶液 75%, remainder water 75%,消毒用 75%,消毒用,喷雾瓶装 75%水溶液 75%,含60-100 ppm Hydroquinone稳定剂 75%,含稳定剂MEHQ 75%,消毒用 75-200μm ,70Å,Bet:480m2/g 75.3×10-6 in methanol 7500 750μS/cm(25℃)in H2O,不确定度:0.25% 770~820μg/mg 78% in 2-ethylhexanoic acid10-15% Ni 7个品种各100ug/ml于甲醇 7种混合物浓度各为2,00μg/ml溶于吹扫捕集甲醇中 8% (v/v) 8% (w/v) (80 g/L) 8% (w/v) Aqueous 8% Cu 8% v/v in Methanol 8-10%Sm 8.00 Molar 8.00 Normal 8.13ug/ml in methanol 80 % water 80 g/L Aqueous 80 wt%甲苯溶液,含0.3 % MgO 稳定剂 80 wt%甲苯溶液,含0.3 % MgO 稳定剂 80 wt. % in H2O 80 wt. % in H2O, contains 600 ppm monomethyl ether hydroquinone as inhibitor 80 wt. % 80 wt. %正丁醇溶液 80 wt.%,含Benzoic Acid ,Isophtalic Acid 稳定剂 80# 80% (HPLC) 80% (contains 5% Phenol at maximum) 80% (w/v) 80% ethanol solution 80% in ETOH 80% in H2O 80% in ethanol 80% in water 80% 水溶液 80% 水溶胶 80%(HPLC) 80%,750 μg/mg 80%,含200 - 250 ppm(MEHQ)稳定剂 80%,天然 80%,用于显微镜 80%,用于生物染色 80%,GC 80%,天然 80%,异构体混合物,含1000ppm TBC稳定剂 80-100目 150-180um 80-100目,C1-C2烃,CO,CO2,C2H2,C2H4,C3H6分离 80-100目,C1-C4烃类分析 80-100目,乙烃,HCL分析 80-100目,气体,半水煤气等分析 80-100目,气体中微量水分析 80-100目,气体烃,甲醇中水等分析 80-100目,氯化氢,氨,甲醛中水和水中氨等分析 80-100目,氯化氢,氨,甲醛中水等分析 80-100目,永久性气体,气体中微量水分析 80-100目,用于极性,高沸点样品分析 80-100目,用于极性、高沸点、生化样品分析 80-100目,稀有气体、永久性气体、C1-C3烃类气体分离 80-100目,较高沸点样品分析 80-100目,醇类,芳烃等分析 80-120目 120-180um 80.00% 800 usp u/mg 80000μS/cm(25℃)in H2O,不确定度:0.25% 8000μS/cm(25℃)in H2O,不确定度:0.25% 800KDa~1.0MDa 80mg/L 80wt.% in isopropanol 80~100目,C1-C2烃,CO,CO2,C2H2,C2H4,C3H6分离 80μg/ml,in methanol 81.0-86.0% alcohol 812u/mg 83%,GC 84% 84.0μS/cm(25℃)in H2O,不确定度:0.25% 84000μS/cm(25℃)in H2O,不确定度:0.25% 84μS/cm @ 25℃ 84μS 85% (GC) 85% (H-NMR) 85% (LC/MS-UV) 85% (T) 85% (coupling to amines) 85% (w/v) 85% sum of isomers 85%,其余物为2-氯代萘 85%,含600ppm MEHQ稳定剂 85%,工业级 85%,环状和长链异构体混合物 85%,用于细胞培养 85%, cont. ca 10% 2-cyclohexylidenecyclohexanone 85%,GC 85%,Stabilized with TBC 85%,cis + trans 85%,含100ppm MEHQ稳定剂 85-90%,工业级 85.5% 87%,顺反异构体混和物 88% (m- and p- mixture)(stabilized with TBC + ONP + o-Nitrocresol) 88%, contains 1000 ppm hydroquinone as stabilizer 88.5% (HPLC) 89.80% 8U/μl 9% (v/v) 9% (w/w) 9% Fe 9-11mPa.s,5%甲苯/异丙醇80:20 9-13 μm particle size 9.00 Normal 9.5-11.5 wt. % in NMP 9.5-12.5 wt %,直径:40-60nm ,长度≤ 10um 9.5mm 直径,99.97% metals basis 90 wt. % in denatured ethanol 90% (GC) 90% (HPLC),用于荧光分析 90% (HPLC),用于荧光分析 90% (Purity measured on dry basis) 90% (v/v) 90% (w/v) 90% ,含5-10 ppm tert-butylcatechol 稳定剂 90% [cataCXium® PCy] 90% stabilized with 60-100 ppm MEHQ 90%(GC) 90%(HNMR) 90%(HPLC) 90%(T) 90%(stabilized with TBC) 90%(total of isomer) ,stabilized with MEHQ 90%(v/v)乙醇内含0.05%(w/v) 90%(~4% Fe, ~6% Ba+Al) 90%,250ppm MEHQ 稳定剂 90%,5-和6-异构体混合物 90%,for fluorescence 90%,含0.05% 四溴双酚A 稳定剂 90%,含100ppm MEHQ稳定剂 90%,含100ppm 氢醌稳定剂 90%,含500ppm碳酸钠稳定剂 90%,异构体混合物 90%,用于生物染色 90%(HPLC) 90%(mixture of isomers),来源于鲨鱼 90%(~9%DMF) 90%, γ型 90%, 来源于鲨鱼 90%,GC 90%,LC 90%,mixture of 1,3- and 1,2-isomers 90%,stabilized with TBC+2-Nitro-p-cresol 90%,含稳定剂 α-生育酚 90%,异构体的混合物 90%,水溶液 90%,溶于水 90%,顺反异构体混和物 90%,顺反混合物 90%~94% 90-100 %,≥93% 90-110mPa.s,5%甲苯/异丙醇80:20 90-95% 90nm,30 wt. % 1,2-丙二醇单甲醚乙酸酯溶液 90~95% 90纳米 91%,10% dichloromethane 92%(GC) 92%(T) 92%,含6%的异构体 93 wt%甲苯溶液,含0.3 % MgO 稳定剂 93%,含200 ppm TBC 阻聚剂 93%,约含2% CaCO3稳定剂 93%固含量 93%,GC 93%,T 93%,含200 ppm TBC 阻聚剂 93%,含稳定剂吩噻嗪 93%,外消旋和内消旋混合物 93%,黄相 94% (GC) 94%(异构体混合物),含稳定剂BHT 94%,contains 0.5% BHT as stabilizer 94%,含0.2% topanol 稳定剂 94%,含300 ppm BHT稳定剂 94%,含MEHQ稳定剂 94%,用于植物细胞培养 94%,刺球状,1-3mm 94%,含0.2% topanol 稳定剂 94.0% (GC) 94.0% (TLC) 94.0-106.0% (NT) 94.00% 95% ~325 mesh 95% (CP) 95% (LC/MS-UV) 95% (calc. on dry substance, AT) 95% (stabilized with 1%BHT) 95% (stabilized with Copper chip) 95% Isotopic Purity 98% 95% Isotopic Purity >98% 95% [Me4 t-ButylXPhos Palladacycle Gen. 3] 95% [TrixiePhos Palladacycle Gen. 3] 95% anhydrous basis 95% metals basis 95% mix TBC as stabilizer 95% stabilized with TBC 95% ,stabilized with MEHQ 95%(10wt% in hexanes) 95%(As,N) 95%(C16+C18) 95%(GC),熔点68-71°C 95%(P2O5:63%±2%,Al2O3:17%±1%) 95%(mixture of cis and trans) 95%(mixture of isomers) 95%(stabilized with 1-5% Hexane) 95%(stabilized with BHT) 95%(stabilized with Copper chip + NaHCO3) 95%(stabilized with Copper chip) 95%(含碳酸钾稳定剂) 95%(含稳定剂对苯二酚) 95%(含约40%的十八烷基醚硫酸钠) 95%(顺反异构体混合物) 95%, >99% ee 95%, MW 30000 Da 95%, MW 6000 Da 95%, average Mw ~15000 95%, contains ≤200 ppm BHT as inhibitor 95%, 含250 ppm BHT抑制剂 95%,5-和6-异构体混合物 95%,98% ee 95%,DMBPY 95%,as a mixture of isomers 95%,mixture 95%,predominantly trans 95%,含0.01 % 柠檬酸稳定剂 95%,含0.03 % 生育酚 稳定剂 95%,含0.1% TBC 稳定剂 95%,含0.1%对叔丁基邻苯二酚(TBC)稳定剂 95%,含0.2% 碳酸钠稳定剂 95%,含100-500 ppm TBC稳定剂 95%,含100ppmMEHQ稳定剂 95%,含150ppm MEHQ稳定剂 95%,含200 ppm monomethyl ether hydroquinone稳定剂 95%,含200ppm MEHQ稳定剂 95%,含250ppm BHT 稳定剂 95%,含25ppm MEHQ 稳定剂 95%,含HQ稳定剂 95%,含~2% 2,6-二叔丁基对甲酚稳定剂 95%,含碳酸钠稳定剂 95%,含稳定剂铜屑 95%,对映体混合物, 主要是(S)-型 95%,异构体的混和物 95%,超干,含分子筛,水≤50ppm 95%,超干,水≤50ppm 95%[dichloride chloride dihydrate FixCat] 95%(HPLC), 70% in water 95%(stabilized with DCM) 95%(含0.1% BHT稳定剂) 95%(基于干物质) 95%(天然提取) 95%, ≤1.0% water 95%, mixture of isomers 95%, 含K2CO3稳定剂 95%, 含有稳定剂MEHQ 95%,(双酯≥75%,单酯≥20%) 95%,100目 95%,200-300目 95%,3000ppm对苯二酚作为稳定剂 95%,LC&T 95%,LC 95%,MW 1000 Da 95%,MW 550 Da 95%,MW 8000 Da 95%,T 95%,ee99% 95%,mixture of isomers 95%,stabilized with 5% K2CO3 95%,stabilized with 60-100 ppm MEHQ 95%,stabilized 95%,trans-isomer >92% 95%,含0.01 % 柠檬酸稳定剂 95%,含0.2% sodium carbonate 稳定剂 95%,含100-500 ppm TBC稳定剂 95%,含100ppm MEHQ稳定剂 95%,含250ppm BHT 稳定剂 95%,含60-100 ppm MEHQ稳定剂 95%,含K2CO3稳定剂 95%,含≤3%二氯甲烷 95%,含低聚物 95%,含稳定剂TBC 95%,含稳定剂铜屑 95%,异构体混合物 95%,异构体的混合物 95%,蓝相 95%,顺反异构体混和物 95%,颗粒状 95.0 % GC 95.0% (AT) 95.0% (T) 95.0% (qNMR) 95.0%(GC) 95.0%(total of isomers) 95.0% 95.0-105.0% (AT) 95.5% (HPLC) 95.7% 955,MW 40000 Da 96 atom % D, 98% (CP) 96% ,含80- 120 ppm hydroquinone 稳定剂 96% dry weight,5-10% 甲醇做稳定剂 96% dry weight,5-10% 甲醇做稳定剂 96% ,含80- 120 ppm hydroquinone 稳定剂 96%(T) 96%(contains 15%H2O) 96%(stabilized with TBC) 96%(sum of C-16,C-18,C-20) 96%(sum of isomers) 96%(total of isomers) 96%(酯含量) 96%, ee 99+% 96%,250ppm MEHQ 稳定剂 96%,Endo + Exo,含0.03% BHT稳定剂 96%,上层覆保护剂 96%,含200 ppm MEHQ 稳定剂 96%,含200-600ppmMEHQ稳定剂 96%,含250ppmMEHQ稳定剂 96%,含30 - 70 ppm MEHQ 稳定剂 96%,含4-10%冰醋酸稳定剂 96%,含500ppmMEHQ稳定剂 96%,含稳定剂TBC 96%,含约 0.1% 碳酸钠稳定剂 96%(GC) 96%(HPLC) 96%, MkSeal 96%, 含有200 ppm MEHQ阻聚剂 96%,SUM OF BRANCHED ISOMER,0.01% MEHQ 96%,T 96%,上层覆保护剂 96%,升华纯化,低金属离子 96%,含250ppmMEHQ稳定剂 96%,含30 - 70 ppm MEHQ 稳定剂 96%,含50-100ppm BHT稳定剂 96%,含稳定剂BHT 96%,含稳定剂铜屑 96%,指示剂(pH 11.5-14.0) 96%,溶于油 96%,片状 96.0% (sum of enantiomers, HPLC) 96.5% (HPLC) 96.8-97.6 mol% hydrolysis 96%(T) 96% 97 atom % 18O 97% (99% ee) (2R,2'R,3R,3'R)-DI-Et-BABIBOP 97% (99% ee) (2S,2'S,3S,3'S)-DI-Et-BABIBOP 97% (NMR) 97% (R,R,R)-(+)-Ph-SKP 97% (S,S,S)-(-)-Ph-SKP 97% (S,S,S)-(-)-Tol-SKP 97% (S,S,S)-(-)-Xyl-SKP 97% (metals basis) 97% (stabilized with TBC) 97% 10mg/ml 正己烷溶液 97% BSTFA + 1% TMCS,用于GC衍生化 97% [cataCXium® C] 97%(>99% ee)[(R)-DTB-SpiroSAP-Bn] 97%(>99% ee)[(R)-Ph-SpiroSAP-Ph] 97%(>99% ee)[(R)-Xyl-SpiroSAP-Ph] 97%(>99% ee)[(S)-DTB-SpiroSAP] 97%(>99%ee)[(R)-DTB-SpiroSAP-Ph] 97%(NMR) 97%(cis- and trans- mixture) 97%(mix) 97%(mixture of polymers) 97%(stabilized with MEHQ) 97%(total of isomers) 97%(含200-300ppmMEHQ稳定剂) 97%(含稳定剂铜屑) 97%(异构体混合物),含稳定剂BHT 97%(>99% ee)[(R)-DTB-SpiroSAP] 97%+ 97%, ee 97% 97%, mixture of isomers 97%, predominantly trans 97%, 粉末 97%, 约含150ppm 4-甲氧基苯酚稳定剂 97%, 铜做稳定剂 97%, 顺反异构体混和物 97%,99.999%-Au 97%,ee98% 97%,ee:97% 97%,ee值>98% 97%,stab. with <1% magnesium oxide 97%,≤50 ppm 4-Hydroxy-TEMPO as stabilizer 97%,以反式异构体为主 97%,内型和外型混合物 97%,可能以晶形二聚体存在 97%,含 250 ppm BHT 稳定剂 97%,含 900 ppm MEHQ 稳定剂 97%,含0.02% 4-methoxyphenol 稳定剂 97%,含0.1 % 对苯二酚 稳定剂 97%,含0.1% BHT稳定剂 97%,含0.1% hydroquinone稳定剂 97%,含0.1%对叔丁基邻苯二酚(TBC)稳定剂 97%,含0.4% 4-叔-丁基邻苯二酚稳定剂 97%,含10 ppm MEHQ稳定剂 97%,含100-200ppm BHT稳定剂 97%,含100ppmMEHQ稳定剂 97%,含15wt.% water稳定剂 97%,含1~2%乙酰丙酮稳定剂 97%,含50ppm BHT稳定剂 97%,含60-100ppm BHT稳定剂 97%,含90 - 110 ppm MEHQ 稳定剂 97%,含稳定剂MEHQ 97%,含稳定剂氢醌 97%,含醋酸0-15% 97%,含铜作稳定剂 97%,含铜粉稳定剂 97%,用于GC衍生化,含1% TBDMSCl 97%,用于GC衍生化 97%,用于生物学染色 97%,用于细胞培养 97%,顺反异构体 97%,顺反异构体混和物 97%,顺式 + 反式 97%,顺式和反式混合物 97%,香料级 97%2-5 nanometers 97%HPLC 97%dichloride GreenCat 97%非消旋体 97%( 含 0.1% α-生育酚作稳定剂 ) 97%(GC) 97%(HPLC) 97%(T) 97%(T),工业级 97%(含有不等量的3-(4-甲基-3-戊烯基)环己-3-烯-1-甲醛) 97%(基于干物质)in 25% H2O 97%(异构体混合物) 97%, (E)+(Z) 97%, 5 mM DMSO Solution 97%, Sum of C16 C18 C20 97%, mixture of 2- and 4-isomers 97%, mixture of isomers 97%, water ca 10% 97%, 含0.1% KOH稳定剂 97%, 含有稳定剂MEHQ 97%, 含稳定剂TBC 97%, 含铜稳定剂 97%, 约含150ppm 4-甲氧基苯酚稳定剂 97%,0.01% 氢醌稳定剂 97%,0.1% 对叔丁基邻苯二酚作稳定剂 97%,10%H2O 97%,100 ug/mL in ethanol 97%,10mg/mL solution in water 97%,1:2(乙酸) 97%,1μm 97%,300目 97%,40-100KDa 97%,50% in Dichloromethane 97%,99%ee 97%,BET surface Area 8~16 m2/g 97%,GC&T 97%,LC&T 97%,Pd 10% 97%,T 97%,ee97% 97%,ee值≥98% 97%,may also contain SrCO3 97%,mixture of isomers 97%,moistened with ≥ 30% water 97%,stab. with <1% magnesium oxide 97%,含0.02% 4-methoxyphenol 稳定剂 97%,含0.05% BHT 稳定剂 97%,含0.1 % 对苯二酚 稳定剂 97%,含0.1% TBC稳定剂 97%,含0.1%对叔丁基邻苯二酚(TBC)稳定剂 97%,含100-200ppm BHT稳定剂 97%,含100ppm BHT稳定剂 97%,含100ppmMEHQ稳定剂 97%,含60-100ppm BHT稳定剂 97%,含TBC稳定剂 97%,含含稳定剂氢醌 97%,含有不等量酸酐 97%,含有数量不等的酸酐 97%,含稳定剂MEHQ 97%,含稳定剂MgO 97%,含稳定剂TBC 97%,含稳定剂水滑石 97%,含稳定剂铜屑 97%,混合物 97%,顺反异构体混和物 97%,顺反混合物 97%,顺式 + 反式 97+%(10 wt% in hexanes) 97-102% USP, 高纯级 97.0 % GC 97.0% (NT) 97.0% (sum of enantiomers, HPLC) 97.0% (sum of isomers, GC) 97.0% (sum of isomers, GC) 97.0%(GC) 97.0%(T) 97.00%盐酸盐 97.0%(GC) 97.5%(HPLC) 97.50% 98 atom % 15N 98 atom % D, 98% 98 atom % D,stab. with 4-tert-butylcatechol 98 atom % D,95% 98 atom %13C, 95% (CP) 98 atom%D 98% (99.9%-Tm) ((REO)) 98% (99.9%-Y) , 39-1500, contained in 50 ml Swagelok® cylinder (96-1070) for CVD/ALD 98% (GC/HPLC) 98% (as SnCl4) 98% (metals basis) 98% (mix) 98% (t-Bu)PhCPhos 98% (total of isomer) 98% ,含二氧化硅稳定剂 98% 99%ee 98% Cphos 98% D, 98% (CP) 98% DTBPF 98% DiPPF 98% EtCPhos 98% HPLC 98% Ir 53% 98% Isotopic Purity 97.8% 98% Isotopic Purity 98% Isotopic purity 98% 98% Mixture of Isomers 98% PhCPhos 98% RockPhos 98% TFA盐 98% [BINAP Palladacycle Gen. 3] 98% [CPhos Palladacycle Gen. 3] 98% [DPPF Palladacycle Gen. 3] 98% [DTBPF Palladacycle Gen. 3] 98% [EtCPhos Palladacycle Gen. 3] 98% [MeCgPPh Palladacycle Gen. 3] 98% [Mor-Dalphos Palladacycle Gen. 3] 98% [NiXantphos Palladacycle Gen. 3] 98% [P(t-Bu)3 Palladacycle Gen. 3] 98% [t-BuDavePhos Palladacycle Gen. 3] 98% [~1:1 mixture with regioisomer, 2-Di-t-butylphosphino-5-methoxy-3,4,6-trimethyl-2',4',6'-tri-i-propylbiphenyl] 98% atom D 98% dry weight 98% metals basis,≤100nm,金红,亲水 98% metals basis,≤30nm 98% trace metals basis excluding Zr 98% trace metals basis 98% ,含5-10 ppm tert-butylcatechol 稳定剂 98%(>99% ee )(R)-DTB-SpiroPAP-3-Me 98%(>99% ee )(R)-DTB-SpiroPAP-6-Me 98%(>99% ee )(S)-DTB-SpiroPAP 98%(>99% ee ) 98%(>99% ee)(S)-DTB-SpiroPAP-3-Me 98%(>99%ee )(R)-DTB-SpiroPAP 98%(GC&T) 98%(Mixture of cis-trans isomers) 98%(Mixture of isomeric branched chain Hexanes) 98%(contains isomer) 98%(contains of Anhydride) 98%(m- and p- mixture)(stabilized with TBC) 98%(mixture of endo and exo isomers)(10 wt% in hexanes) 98%(mixture of isomers) 98%(stabilized with BHT) 98%(stabilized with Copper chip) 98%(stabilized with Methylhydroquinone) 98%(sum of Cis-trans) 98%(sum of enantiomers) 98%(sum of isomers),~2500 U/mg,stabilized with BHT 98%(total ester assay),含250ppm MEHQ稳定剂 98%(~25%water) 98%(含异构体) 98%, (干重), 可能最多含5%水分 98%, 50-1150, contained in 50 ml Swagelok® cylinder(96-1070) for CVD/ALD 98%, ee 98% 98%, stab. with 1-5% hexane 98%, trans-isomer >95% 98%, 含0.1%TBC稳定剂 98%, 含铜屑稳定剂 98%, 异构体混合物 98%, 氯化铪≤2% 98%,,含50 ppm MEHQ和300 ppm Triethanolamine稳定剂 98%,0.01% 氢醌稳定剂 98%,4 ~ 8μm 98%,400目 98%,99.7%-Hf 98%,99.9%-Bi 98%,99.9%-Gd(REO) 98%,99.9%-Ir 98%,99.9%-La 98%,99.9%-Pt 98%,99.99%-Al 98%,99.99%-Ru 98%,99.999%-Co 98%,contains 500 ppm tert-Butylcatechol as stabilizer 98%,contains~1% K2CO3 as stabilizer 98%,ee 97% 98%,ee 98% 98%,ee 99+% 98%,mixture of α and β isomers 98%,β-phase basis 98%,≥200目 98%,≥99%-Zr 98%,亮氨酸氨肽酶底物 98%,分析标准品 98%,含 0.1% 3,5-di-tert- butylcatechol 稳定剂 98%,含0.01% KOH稳定剂 98%,含0.01% 铜片 稳定剂 98%,含0.1% BHT稳定剂 98%,含0.1% 对苯二酚稳定剂 98%,含0.1%碳酸钙稳定剂 98%,含0.1%碳酸钾稳定剂 98%,含0.10% alpha-tocopherol 抗氧化剂 98%,含0.3 % MgO稳定剂 98%,含100ppm MEHQ稳定剂 98%,含100ppmMEHQ稳定剂 98%,含2% CaCO3稳定剂 98%,含250ppm MEHQ稳定剂 98%,含50 - 100 ppm BHT 稳定剂 98%,含50-150 ppm BHT稳定剂 98%,含500 ppm BHT稳定剂 98%,含500ppmMEHQ稳定剂 98%,含60-100ppmMEHQ稳定剂 98%,含70-100ppm对苯二酚稳定剂 98%,含90 - 110 ppm MEHQ 稳定剂 98%,含二氧化硅稳定剂 98%,含稳定剂0.1%KOH 98%,含稳定剂MEHQ 98%,含稳定剂TBC 98%,含约20%的水 98%,含铜屑稳定剂 98%,对映体混合物 98%,无水物 98%,无水级,含5%w/v分子筛,水≤50ppm 98%,无水级,水≤50ppm 98%,用于植物细胞培养 98%,用于蛋白分析 98%,用于过氧化物酶试验 98%,用于酯化 98%,试剂级 98%,适用于荧光 98%,顺反异构体混合物 98%,顺反混合物 98%DavePhos 98%D 98%JackiePhos 98%MePhos 98%PhDavePhos 98%[P(t-Bu)3 Palladacycle Gen.4] 98%[PCy3 Palladacycle Gen.4] 98%[Xantphos Palladacycle Gen.4] 98%purity,99%e.e. 98%t-BuBrettPhos 98%(99.9%-Y)((REO)) 98%(E:Z isomers=50:50) 98%(GC) 98%(GC) 98%(mixture of 2-Ethyl-5-methylpyrazine and 2-ethyl-6-methylpyrazine) 98%(mixture of cis and trans ) 98%(mixture of isomers) 98%(sum of C9-C11) 98%(合成) 98%(含500±50ppmMHQ稳定剂) 98%, Mixture of Isomers 98%, contains ca. 10% Na2CO3 98%, mixture of isomers 98%, stabilized with Copper chip 98%, stabilized with MEHQ 98%, stabilized with TBC 98%, 含K2CO3稳定剂 98%, 异构体混合物 98%, 粉末 98%,(stabilized with MEHQ) 98%,-200目 98%,10-20目 98%,1250目 98%,200目 98%,25mg/ml in ethanol 98%,300目 98%,4 ~ 8μm 98%,40-60目 98%,400目 98%,99.9%-Al 98%,Co:45-47% 98%,GC&N 98%,HPLC 98%,LC 98%,NI≥45% 98%,N 98%,Pd>13.3% 98%,Pd>36.2% 98%,Pd~35% 98%,Pt:55.0 ± 1.3% 98%,Rh>42% 98%,TFA盐 98%,beta anomer ca 15% 98%,ee 99% 98%,ee92% 98%,mixture of cis and trans 98%,pd 15% 98%,stabilized with HQ 98%,stabilized with TBC 98%,光学纯 70% 98%,含 o-型 98%,含0.01% KOH稳定剂 98%,含0.1% 对苯二酚稳定剂 98%,含0.10% alpha-tocopherol 抗氧化剂 98%,含0.3 % MgO稳定剂 98%,含100ppmMEHQ稳定剂 98%,含225ppm的MEHQ稳定剂 98%,含50 - 100 ppm BHT 稳定剂 98%,含50ppmMEHQ稳定剂 98%,含600 ppm 环氧丙烷稳定剂 98%,含90 - 110 ppm MEHQ 稳定剂 98%,含K2CO3稳定剂 98%,含有数量不等的1,3-二异丙基咪唑鎓-2-羧酸盐 98%,含水约20% ,单位重量以干重计 98%,含稳定剂0.1%KOH 98%,含稳定剂BHT 98%,含稳定剂MEHQ 98%,含稳定剂吩噻嗪 98%,支链异构体类的混和物 98%,无水 98%,来源于牛大脑 98%,棕色结晶粉末 98%,深蓝紫色结晶粉末 98%,用于细胞培养 98%,用于过氧化物酶试验 98%,甲硫氨酸亚砜还原酶底物 98%,自然提取 98%,蓝相 98%,非对映异构体混合物 98%,黄相 98-101% 98.0% (sum of enantiomers, GC) 98.0% (sum of isomers, HPLC) 98.0% metals basis,≤100nm 98.0%,含稳定剂铜屑 98.0-102.0% (EDTA titration) 98.00%-gC&T 98.00%LC 98.5% (T) 98.5% metals basis(去除Mg), Mg <1% 98.5%(HPLC) 98.5%,生化级 98.5%,用于纸层析 98.5%, mixture of isomers 98%(T) 98%(TFA盐) 99 atom % 11B 99 atom % 13C, 99% chemical purity 99 atom % 13C, 98% (CP) 99 atom % D,≥98% 99 atom% D 99% (99.9%-Tb) ((REO)) 99% (99.9%-Yb) ((REO) 99% (99.9+%-Pd) 99% (99.99%-Ti 99% (99.999%-Si) 99% (HPLC), 98% 99% (TLC) 99% (dry wt.), water <2% 99% (less than 1% free nucleotides, TLC) 99% (less than 1% free nucleotides, TLC),with buffer salts 99% (metals basis excluding Ba) 99% (purity excludes ~1% Zr) 99% (sum of enantiomers) 99% ,粒径≤1μm 99% 10-50微米 99% 13C 99% Au Assay:39.91 ± 0.8% 99% TEMAZ, 40-1710, contained in 50 ml Swagelok® cylinder96-1070 for CVD/ALD 99% metals basis 300-500nm 99% metals basis,1-4μm 99% metals basis,400目 99% metals basis,2-10 μm 99% metals basis,≤100nm 99% metals basis,≤3μm 99% metals basis,≤5μm 99%(10 wt% in hexanes) 99%(99.9%-Sc)((REO) ) 99%(99.99%-Sb) 99%(HPLC) 99%(REO) 99%(Stabilized With TBC), MkSeal 99%(metals basis 去除铪) 99%(mixture of isomers) 99%(mixture of syn and anti-isomers) 99%(二甲苯异构体+乙基苯) 99%(含200-300ppmMEHQ稳定剂) 99%(天然) 99%, (98% ee) 99%, 22-1050, contained in 50 ml Swagelok® cylinder(96-1070) for CVD/ALD 99%, 99.999%-Si 99%, ee 99% 99%,0.5~0.7um 99%,1-5μm 99%,15% Se, dissolved in TOP 99%,1~2μm 99%,1μm 99%,2-4μm 99%,2μm 99%,30-50nm 99%,300-500nm 99%,5-15nm 99%,50-200nm 99%,50目 99%,6-10μm 99%,60-100nm 99%,7% S, dissolved in TBP 99%,99.9%-Er(REO) 99%,99.9%-In 99%,99.9%-La(REO) 99%,99.9%-Pr(REO) 99%,99.9%-Rh 99%,99.9+%-Au 99%,99.9+%-Lu(REO) 99%,99.99%-Hf, <0.15% Zr TEMAH, , 72-7720, contained in 50 ml Swagelok® cylinder96-1070 for CVD/ALD 99%,99.99%-Hf, <0.15% Zr TEMAH 99%,99.99%-Hf, <0.2% 99%,99.995+%-Re 99%,ACS 99%,Pt≥59.5% 99%,mixture of isomers 99%,≥200目 99%,≥325 目,粉末 99%,光谱纯 99%,含0.01 % BHT 稳定剂 99%,含0.01% copper 稳定剂 99%,含0.1 % KOH 稳定剂 99%,含1% K2CO3 稳定剂 99%,含1-3%乙醇稳定剂 99%,含10 - 20 ppm MEHQ 稳定剂 99%,含10 ppm MEHQ稳定剂 99%,含10-15ppm 4-叔-丁基邻苯二酚稳定剂 99%,含10-50ppm 4-methoxyphenol 稳定剂 99%,含10-60ppmMEHQ稳定剂 99%,含1000 ppm MEHQ稳定剂 99%,含15 - 20 ppm MEHQ稳定剂 99%,含15 ppm 4-叔丁基邻苯二酚稳定剂 99%,含150-400 ppm BHT 稳定剂 99%,含20ppm MEHQ稳定剂 99%,含5-20 ppm hydroquinone稳定剂 99%,含50ppm BHT 稳定剂 99%,含90 - 110 ppm MEHQ 稳定剂 99%,含水20% 99%,含阻聚剂MEHQ 99%,异构体混合物 99%,无水级,不含分子筛,水≤50ppm 99%,无水级,含分子筛,含稳定剂200ppm MEHQ,水≤50ppm 99%,无水级,含稳定剂200ppm MEHQ,水≤0.1% 99%,无水级,水≤50ppm 99%,无水级 99%,无色 99%,水分≤1.0% 99%,水分≤5% 99%,用于HPLC标记 99%,用于HPLC衍生标记 99%,用于分子生物学 99%,用于生化分析 99%,用于生化研究 99%,用于细胞和昆虫细胞培养 99%,用于细胞培养和昆虫细胞培养 99%,用于荧光分析 99%,离子对色谱级 99%,粉末 99%,粒状 99%,细胞培养专用 99%,蛋白测序级 99%,酯酶底物 99%,闪烁级 99%,顺反异构体混合物 99%,顺反混合物 99%,颗粒 99%,<10nm 99%,<1um 99%-Cr 99%-Se 99%HPLC 99%JohnPhos 99%contains about 10% o-chlorotoluene NiCl(o-tolyl(TMEDA 99%t-BuMePhos 99%(99.9%-Ag) 99%(GC) 99%(HPLC) 99%(T) 99%(含~0.25%SiO2) 99%, 0.1-1mm 99%, 1-3mm 99%, 2-4mm 99%, 200目 99%, 4-7mm 99%, 40目 99%, Water≤50 ppm (By K.F.), MkSeal 99%, With Molecular Sieves, Water≤50 ppm (By K.F.), MkSeal 99%, With Molecular Sieves,Water≤50 ppm (by K.F.), MkSeal 99%, mixture 99%, β型 99%, ≥99.99% trace metals basis 99%, 含0.01%的乙酸铵阻聚剂 99%,-20目 99%,-325目 99%,0.1%单杂 99%,0.2-0.5μm 99%,0.5-1μm 99%,0.5~0.7um 99%,100目 99%,15nm,疏水性 99%,200目 99%,325 目,粉末 99%,500目 99%,50目 99%,6μm 99%,99.99%-Hf, <0.2% 99%,Anhydride Group Content≥41.0% 99%,BP 99%,HPLC 99%,P≥27% 99%,Ru:46% 99%,T 99%,Water≤50 ppm (by K.F.), MkSeal 99%,ee 98% 99%,mixture of isomers 99%,≤100nm 99%,十二水合物 99%,单杂<0.1% 99%,含0.01 % BHT 稳定剂 99%,含0.1 % KOH 稳定剂 99%,含10 - 20 ppm MEHQ 稳定剂 99%,含10-100ppm 4-methoxyphenol 稳定剂 99%,含10-15ppm 4-叔-丁基邻苯二酚稳定剂 99%,含10-20 ppm MEHQ 作为稳定剂 99%,含100ppm NaOH 稳定剂 99%,含15 - 20 ppm MEHQ稳定剂 99%,含150-400 ppm BHT 稳定剂 99%,含20 ppm MEHQ 作为稳定剂 99%,含20ppm MEHQ稳定剂 99%,含50ppm BHT 稳定剂 99%,含~75 ppm BHT稳定剂 99%,含水20% 99%,含稳定剂铜屑 99%,总杂<0.1% 99%,无水级 99%,水分≤1.0% 99%,浊点30℃ 99%,浊点55℃ 99%,浊点73℃ 99%,浊点88℃ 99%,用于生物学 99%,粒径:≤150um 99%,粒径<1.2um 99%,粒状 99%,重结晶 99%,金红石,2-3um 99%,锐钛,100nm 99%,锐钛,2-3um 99%,闪烁级 99%,非动物源 99%,高纯级 99%,黄色到棕色粉末 99%,黄色结晶针状固体 99+%-Al(1/4'' and down pieces) 99+%-Ti 99.0% ((TLC)) 99.0% (metals basis excluding Zr), Zr <2% 99.0% metals basis,20nm 球形 99.0%(sumofenantiomers) 99.0%,含50ppm BHT 抑制剂 99.0%, MkSeal 99.0-100.3% (w/w) (T) 99.0-100.5% (in dried substance), meets analytical specification of E 282 99.2% (metals basis) 99.3% 99.4% U=0.4% (k=2) 99.4% 99.5 atom % D+0.03%TMS,用于 NMR 99.5 atom % D 99.5% (HPLC) 99.5% (metals basis excluding Sr), Sr <500ppm 99.5% (metals basis 去除Ni) 99.5% (metals basis 去除Ni), Ni <0.2% 99.5% (metals basis 去除铪) ,100-325目 99.5% (metals basis 去除铪) ,325目 99.5% (metals basis 去除铪),1-3μm 99.5% (metals basis 去除铪).10μm 99.5% (metals basis,锆除外), Zr <1% 99.5% (metals basis,锆除外), Zr <1% 99.5% metal basis,<200nm 99.5% metals basis (铪除外),≥200 目 99.5% metals basis, <50 nm 99.5% metals basis,1-2μm 99.5% metals basis,1-3 μm 99.5% metals basis,100目 99.5% metals basis,10μm 99.5% metals basis,150-250nm 99.5% metals basis,150nm,锐钛,亲水 99.5% metals basis,15nm 99.5% metals basis,2-10 μm 99.5% metals basis,2.0μm 99.5% metals basis,200-400目 99.5% metals basis,200目 99.5% metals basis,20nm 99.5% metals basis,30nm 99.5% metals basis,50-100nm 99.5% metals basis,60目 99.5% metals basis,<100 nm 99.5% metals basis,<2 μm 99.5% metals basis,≤10μm 99.5% metals basis,≤5 μm 99.5% metals basis,≥100目 99.5% metals basis,≥200目 99.5% metals basis,≥325 mesh 99.5% metals basis,≥325目 99.5% metals basis,<15μm 99.5% metals basis,<20 μm 99.5% metals basis,<50μm 99.5% metals basis,10μm 99.5% metals basis,2.0μm 99.5% metals basis,25μm 99.5% metals basis,2μm 99.5% metals basis,5 μm 99.5% metals basis,60-120nm,含松香分散剂 99.5% metals basis,<100 nm 99.5% metals basis,≤45um 99.5% metals basis,≤6um 99.5% metals basis,粉末, 2 μm 99.5% metals basis,粉末 99.5% metals basis,粉末, 2 μm 99.5% metals basis,粉末,<3 μm 99.5% metals basis,锭 99.5% ,粒径:1-2um 99.5%(GC) 99.5%(T) 99.5%, acid <200 ppm, H2O <100 ppm 99.5%,100-325目 99.5%,30nm 99.5%,60目 99.5%,for protein sequence analysis 99.5%,trace metals basis 99.5%,≤3 μm 99.5%,≤30μm 99.5%,分子生物学级 99.5%,升华纯化 99.5%,含0.1 % KOH 稳定剂 99.5%,无水级,含分子筛,水≤50ppm 99.5%,无水级 99.5%,无色 99.5%,用于电泳 99.5%,用于糠醛衍生物的比色分析及氰化物测定 99.5%,用于缓冲溶液 99.5%,用于荧光分析 99.5%,粉末 99.5%,重蒸馏 99.5%-Ba 99.5%-Mo 99.5%-Sr 99.5%-Te 99.5%-Zn 99.5%-Zr 99.5%metals basis,<30nm 99.5%metals basis 99.5%, hafnium chloride<50ppm 99.5%, 含0.01%的乙酸铵阻聚剂 99.5%,100-200nm 99.5%,100-200nm,球形 99.5%,100nm 99.5%,10um 99.5%,150-200目 99.5%,15±5nm 99.5%,2-3μm 99.5%,200nm 99.5%,200目 99.5%,20nm 99.5%,20±5nm 99.5%,300目 99.5%,30±5nm 99.5%,500nm 99.5%,50nm 99.5%,50±5nm 99.5%,60-120nm 99.5%,Water< 0.005% (by K.F.), MkSeal 99.5%,metals basis 99.5%,trace metals basis 99.5%,≤3 μm 99.5%,单杂<0.1% 99.5%,含0.1 % KOH 稳定剂 99.5%,含~75 ppm BHT稳定剂 99.5%,异构体混合物 99.5%,生物技术级 99.5%,粉末 99.5%,粒径≤5μm 99.5%,重蒸馏 99.5+% metals basis,薄片 99.5-100.5%, meets analytical specification of Ph. Eur., BP, USP, puriss 99.53% 99.5% metals basis,60nm,金红 99.6% U=0.4% (k=2) 99.6% U=0.4%(k=2) 99.6% metals basis 99.6%,1-3μm 99.6%,25μm 99.7% metal basis 99.7% metals basis (Hf除外),Hf ≤1% 99.7% metals basis 99.7% trace metals basis 99.7%,含100ppmMEHQ稳定剂 99.7%-Ba 99.7%-V 99.7%,≥200目 99.7%,含100ppmMEHQ稳定剂 99.8% U=0.3%(k=2) 99.8% (metals basis excluding Ni), Ni <0.15% 99.8% metals basis,100-300nm,金红,亲水 99.8% metals basis,100nm,金红,亲水 99.8% metals basis,100nm,金红,亲油 99.8% metals basis,100nm,金红,亲油(包覆前) 99.8% metals basis,100nm,锐钛,亲水 99.8% metals basis,10nm-25nm,锐钛,亲水 99.8% metals basis,20μm 99.8% metals basis,25nm,金红,亲水 99.8% metals basis,30nm,锐钛,亲水 99.8% metals basis,40nm,金红,亲水 99.8% metals basis,40nm,锐钛,亲水 99.8% metals basis,5-10nm,锐钛,亲水亲油型 99.8% metals basis,5-10nm,锐钛,亲水型 99.8% metals basis,60nm,锐钛,亲水 99.8% metals basis,60nm,锐钛,亲油(硬脂酸处理) 99.8% metals basis,60nm 99.8% metals basis,<100 nm (BET) 99.8% metals basis,<150nm 99.8% metals basis,Rh ≥80.6% 99.8% metals basis,≥200目 99.8% metals basis,粒径:7-40nm , 比表面积(BET):100m2/g 99.8% metals basis,粒径:7-40nm ,比表面积(BET):120m2/g 99.8% metals basis,粒径:7-40nm ,比表面积(BET):170m2/g 99.8% metals basis,粒径:7-40nm ,比表面积(BET):260m2/g 99.8% metals basis,粒径:7-40nm ,比表面积(BET):300m2/g 99.8% metals basis,粒径:7-40nm,比表面积(BET):200m2/g 99.8% metals basis, 100目 99.8% metals basis,100nm,金红,亲水 99.8% metals basis,100nm,金红,亲油 99.8% metals basis,100nm,锐钛,亲水 99.8% metals basis,100nm,锐钛,亲油 99.8% metals basis,25nm,金红,亲水 99.8% metals basis,25nm,锐钛,亲水 99.8% metals basis,300目 99.8% metals basis,40nm,金红,亲水 99.8% metals basis,40nm,锐钛,亲水 99.8% metals basis,5-10nm,锐钛,亲水亲油型 99.8% metals basis,5-10nm,锐钛,亲水型 99.8% metals basis,60nm 99.8% metals basis,60nm,金红,亲水 99.8% metals basis,60nm,锐钛,亲水 99.8% metals basis,Rh 81% 99.8% metals basis,粒径0.5-5mm 99.8% metals basis,<5nm,锐钛,亲水亲油型 99.8% trace metals basis,13nm(TEM) 99.8%, Ta-0.1-1% 99.8%,10μm,,高白度 99.8%,25μm 99.8%,D50 0.5-1.5μm 99.8%,H2O: ≤0.005% 99.8%,Standard for GC 99.8%,≥325目 99.8%,升华纯化 99.8%,比表面积(BET):115m2/g;粒径:7-40nm 99.8%,比表面积(BET):150m2/g;粒径:7-40nm 99.8%,比表面积(BET):380m2/g;粒径:7-40nm 99.8%-Th 99.8%,10μm 99.8%,1μm,,高白度 99.8%,200目 99.8%,6.35mm (0.25in) dia x 6.35mm (0.25in) length 99.8%,PB:0.0005% 99.8%,PB:0.001% 99.8%,Water≤50 ppm (by K.F.),MkSeal 99.8%,升华纯化 99.8%,比表面积(BET):100m2/g;粒径:7-40nm 99.8%,比表面积(BET):115m2/g;粒径:7-40nm 99.8%,比表面积(BET):120m2/g;粒径:7-40nm 99.8%,比表面积(BET):150m2/g;粒径:7-40nm 99.8%,比表面积(BET):170m2/g;粒径:7-40nm 99.8%,比表面积(BET):200m2/g;氯化物:0.0125 99.8%,比表面积(BET):200m2/g;粒径:7-40nm 99.8%,比表面积(BET):230m2/g;粒径:7-40nm 99.8%,比表面积(BET):300m2/g;粒径:7-40nm 99.8%,比表面积(BET):380m2/g;粒径:7-40nm 99.85% (metals basis) 99.85% 99.9 %-Bi, ~60% in neodecanoic acid15-20% Bi 99.9 atom % D 99.9% U=0.2% (k=2) 99.9% metals basis, ≤1μm 99.9% (metals basis excluding Zr), Zr <1% 99.9% (metals basis 去除 Zr), Zr <0.5% 99.9% (metals basis), Pt 44.9% min 99.9% Trace Metals Analysis 99.9% metal basis,200nm(WNi/WTi =1:1) 99.9% metal basis,D50 ≤10μm 99.9% metals basis ,无水 99.9% metals basis ,无水 99.9% metals basis(~1% 锆除外) 99.9% metals basis,,液体石蜡保存 99.9% metals basis,0.5-5.0μm 99.9% metals basis,100-200 mesh 99.9% metals basis,100-200nm 99.9% metals basis,100-300nm 99.9% metals basis,100nm-200nm 99.9% metals basis,10μm 99.9% metals basis,2 μm 99.9% metals basis,2-4μm 99.9% metals basis,20-60nm 99.9% metals basis,200-400目 99.9% metals basis,200nm 99.9% metals basis,200目 99.9% metals basis,25μm 99.9% metals basis,2~10μm 99.9% metals basis,300-500nm 99.9% metals basis,30±10nm 99.9% metals basis,400nm 99.9% metals basis,40nm 99.9% metals basis,5-10μm 99.9% metals basis,5μm 99.9% metals basis,60-100nm 99.9% metals basis,60-80nm 99.9% metals basis,600-800nm 99.9% metals basis,<100 nm particle size (SEM) 99.9% metals basis,<100 nm(SEM) 99.9% metals basis,<100 nm 99.9% metals basis,<150 μm 99.9% metals basis,<50 nm 99.9% metals basis,Ir ≥84.5% 99.9% metals basis,Pd 29% 99.9% metals basis,γ相,10nm 99.9% metals basis,γ相,<50nm 99.9% metals basis,≤0.5μm,含约1%聚丙烯酸铵分散剂 99.9% metals basis,≤1.0μm 99.9% metals basis,≤10μm 99.9% metals basis,≤150nm 99.9% metals basis,≤1μm 99.9% metals basis,≤500nm 99.9% metals basis,≥325目 99.9% metals basis,≥625目 99.9% metals basis,不规则片状 99.9% metals basis,无水 99.9% metals basis,棒 99.9% metals basis,正交晶系 99.9% metals basis,用于格氏反应 99.9% metals basis,粉末,≥200目 99.9% metals basis,粉末 99.9% metals basis,粒径≤1μm 99.9% metals basis,颗粒:1-5mm 99.9% metals basis,黄色 99.9% metals basis,<100nm 99.9% metals basis, 1000目 99.9% metals basis, 500目 99.9% metals basis, 600目 99.9% metals basis, 800目 99.9% metals basis, 900目 99.9% metals basis, ≤0.8μm 99.9% metals basis,0.5μm 99.9% metals basis,1-10mm 99.9% metals basis,1-2μm 99.9% metals basis,1-5μm 99.9% metals basis,10-30nm 99.9% metals basis,100-200 mesh 99.9% metals basis,100目 99.9% metals basis,1μm 99.9% metals basis,2 μm 99.9% metals basis,2-3μm 99.9% metals basis,200目,粉末 99.9% metals basis,30±10nm 99.9% metals basis,40nm 99.9% metals basis,4mm,颗粒 99.9% metals basis,500nm 99.9% metals basis,5~10μm 99.9% metals basis,60-100nm 99.9% metals basis,60-100nm,黑色粉末 99.9% metals basis,D50(0.2~1μm) 99.9% metals basis,Ir ≥84.5% 99.9% metals basis,Pd 29% 99.9% metals basis,α相,30nm,亲水型 99.9% metals basis,α相,30nm,亲油型 99.9% metals basis,≤0.2μm 99.9% metals basis,≤100nm 99.9% metals basis,≤10um 99.9% metals basis,≥200目 99.9% metals basis,≥200目,粉末 99.9% metals basis,不规则片状 99.9% metals basis,宽:13 mm, 厚:0.3 mm 99.9% metals basis,无水 99.9% metals basis,片状 99.9% metals basis,粉末,≥100 mesh 99.9% metals basis,粉末,100-200 mesh 99.9% metals basis,粉末,≥200目 99.9% metals basis,粒径<5mm 99.9% metals basis,粒径≤1μm 99.9% metals basis,粒径(D50)10-20μm 99.9% metals basis,粒径(D50)≤20μm 99.9% metals basis,颗粒 99.9% metals basis,黄色 99.9% metals basis,<200nm 99.9% rare earth metals basis,200目 99.9% trace metals basis, 200-300nm 99.9%((REO) 99.9%,10-20nm 99.9%,20-40nm 99.9%,40-60nm 99.9%,70nm 99.9%,80-100nm 99.9%,<100nm 99.9%,<10nm 99.9%-As 99.9%-Au 99.9%-Co 99.9%-Eu 99.9%-Hf, Zr<1.5% 99.9%-Ho(REO) 99.9%-In 99.9%-Mn 99.9%-Nb 99.9%-Nd 99.9%-Ni 99.9%-Pd 99.9%-Pt 99.9%-Rb 99.9%-Si 99.9%-Sn 99.9%-Ta 99.9%-Tb(REO) 99.9%-Tb((REO)) 99.9%-Th 99.9%-Tm((REO)) 99.9%-W 99.9%-Yb ((REO)) 99.9%metal basis,D50=50μm 99.9%trace metals basis 99.9%, 200目, 四方相 99.9%, 不含甲醇 99.9%, 无甲醇、无甲醛、无酯、无杂醇油 99.9%, 深蓝色, 用作透明隔热薄膜 99.9%, 球型, D50=0.6-1um 99.9%, 球型, D50=0.6-1um, 四方晶体-铁电体 99.9%, 白色 99.9%,1-2um 99.9%,1-3um 99.9%,100nm 99.9%,105-250um 99.9%,1250目 99.9%,12~16um 99.9%,15-45um 99.9%,15-53um 99.9%,17um 99.9%,1~5mm 99.9%,23um 99.9%,27um 99.9%,300目 99.9%,30nm 99.9%,325目 99.9%,3~4um 99.9%,40nm 99.9%,500目 99.9%,53-105um 99.9%,53-120um 99.9%,53-150um 99.9%,800目 99.9%,8~10um 99.9%,D50(0.2~0.55μm) 99.9%,Total metallic impuriyies≤1000 PPM 99.9%,metals basis 99.9%,比表面积≥120m2/g;粒径:30nm 99.9%,生物技术级 99.9%,粒径≤30μm 99.9%,颗粒,锆≤0.15% 99.9+%-As 99.9+%-Au 99.9+%-Mg 99.9+%-W,WO2.9 Blue Sub-oxide 99.9+%-W 99.95% (metals basis 去除 Zr), Zr <1% 99.95% (metals basis), Au ≥67.6% 99.95% (metals basis), Pt 51.5% min 99.95% except for Ta 99.95% mentals basis 99.95% metals basis ,白色 99.95% metals basis ,白色 99.95% metals basis,1-6mm 99.95% metals basis,25 μm 99.95% metals basis,<50 nm (SEM) 99.95% metals basis,≤10 μm 99.95% metals basis,≥100目 99.95% metals basis,含有少量氧化铅 99.95% metals basis,无水 99.95% metals basis,无水级,粉末 99.95% metals basis,粉末 99.95% metals basis, Os 26.1%最低 99.95% metals basis, Os 37%最低 99.95% metals basis, Rh 13.5% 最低 99.95% metals basis, 钌 10.2% 最低 99.95% metals basis,1-5mm 99.95% metals basis,1200目 99.95% metals basis,2000目 99.95% metals basis,3000目 99.95% metals basis,4000目 99.95% metals basis,5000目 99.95% metals basis,750-850目 99.95% metals basis,≤10 μm,含松香分散剂 99.95% metals basis,粒径1-10mm 99.95% metals basis,<10 μm 99.95%(trace metal basis) 99.95%,Φ0.5mm电容器用 99.95%-Ti 99.95%,1um 99.95%,Water≤100 ppm (by K.F.), MkSeal 99.95+%-Os 99.95+% 99.97% metals basis,正交晶系 99.98% metals basis,1-5μm 99.98% metals basis,<100 ppm Rb, <50 ppm Cs 99.98% metals basis,粒径:≤150um 99.98%,35.3 %焦硼酸锂64.7 %偏硼酸锂 99.98%,67%焦硼酸锂33%偏硼酸锂 99.98%-Os 99.99 % metals basis 99.99 %-Ca 99.99 +%-Ge 99.99% (metals basis 去除 Zr), Zr <0.3% 99.99% (metals basis), Au 84.2% 最低 99.99% Si 99.99% metal basis, 无气味的粉末 99.99% metals basis ,50nm 99.99% metals basis ,5~6μm,粉末 99.99% metals basis ,50nm 99.99% metals basis(去除Hf or HfO2),≤100nm 99.99% metals basis(去除Hf or HfO2),0.2~0.4μm 99.99% metals basis(去除Hf or HfO2) 99.99% metals basis,100目 99.99% metals basis,12μm 99.99% metals basis,25μm 99.99% metals basis,2~10μm 99.99% metals basis,3.3-4.3μm,粉末 99.99% metals basis,40-200目 99.99% metals basis,600目 99.99% metals basis,<100 nm(TEM) 99.99% metals basis,<50 nm(TEM) 99.99% metals basis,Ir≥63.9% 99.99% metals basis,granular 99.99% metals basis,powder 99.99% metals basis,γ相,20nm 99.99% metals basis,≤45um 99.99% metals basis,≥300目 99.99% metals basis,无水 99.99% metals basis,无水级 99.99% metals basis,晶型α,0.20μm 99.99% metals basis,晶型α,0.40μm 99.99% metals basis,晶型γ,≤20nm 99.99% metals basis,粉末 99.99% metals basis,粒径:10μm 99.99% metals basis,粒径:2μm 99.99% metals basis,粒径:5μm 99.99% metals basis,粒径<5mm 99.99% metals basis,薄片 99.99% metals basis, 40目 99.99% metals basis, 800目 99.99% metals basis, Au>=39.3%最低 99.99% metals basis, Rh 11.4%最低 99.99% metals basis, Rh 46.2% 最低 99.99% metals basis, γ相, 40nm 99.99% metals basis,0.5um 99.99% metals basis,1-3mm,powder 99.99% metals basis,100nm 99.99% metals basis,1um 99.99% metals basis,200nm 99.99% metals basis,2μm 99.99% metals basis,2~10μm 99.99% metals basis,300目 99.99% metals basis,40-200目 99.99% metals basis,4mm颗粒 99.99% metals basis,5μm 99.99% metals basis,80%α相,30nm-50nm 99.99% metals basis,<5 μm 99.99% metals basis,α晶型约90%,晶型γ约10%,50nm 99.99% metals basis,α晶型约90%,晶型γ约10%,60nm 99.99% metals basis,α晶型约95%,晶型γ约5%,80nm 99.99% metals basis,α相,30nm 99.99% metals basis,α相,30nm,亲水型 99.99% metals basis,γ相,10nm 99.99% metals basis,≤0.1μm 99.99% metals basis,≤0.2μ m,含松香分散剂 99.99% metals basis,≥200目 99.99% metals basis,不规则块状 99.99% metals basis,主体晶相,30nm-50nm 99.99% metals basis,晶体颗粒 99.99% metals basis,晶型α,0.20μm 99.99% metals basis,晶型γ,20nm 99.99% metals basis,晶粒 99.99% metals basis,用于光学玻璃 99.99% metals basis,用于光学玻璃或单晶 99.99% metals basis,用于镀膜 99.99% metals basis,粒径:10μm 99.99% metals basis,粒径:2μm 99.99% metals basis,粒径:5μm 99.99% metals basis,粒径<5mm 99.99% metals basis,粒径<200nm 99.99% metals basis,<50nm 99.99% trace metals basis (purity excludes zirconium) 99.99% trace metals basis,超干 99.99% trace metals 99.99%(metals basis) 99.99%(metalsbasis去除Ni),Ni<0.2% 99.99%,直径2mm,高度10mm,圆柱体状 99.99%,镀膜 99.99%-Ce(REO) 99.99%-Cr 99.99%-Ga 99.99%-Hg 99.99%-La(REO) 99.99%-Na 99.99%-Pb 99.99%-Sb 99.99%-Sc(REO) 99.99%-Sn 99.99%-Sr 99.99%-Ta P, resublimed 99.99%-Ti 99.99%-Y(REO) 99.99%-Yb(REO) 99.99%-Zr (REO) 99.99%-Zr 99.99%trace metals basis 99.99%, 1μm 99.99%, 2um 99.99%,1-3mm 99.99%,1~5mm 99.99%,3-5 um 99.99%,4N 99.99%,metals basis 99.99%,water:0.5-0.8% 99.99%,白色粉末,锆≤0.15% 99.99+%-Ge,contains 1-5% germanium metal 99.995% trace metals basis,powder 99.995%-Mn 99.995%-Si 99.995% 99.995+%-Cd 99.995% metals basis,3-6mm 99.9965% metals basis 99.998% (metals basis 去除 W), W 300ppm 最高 99.998% metals basis ,块状 99.998% metals basis,100目 99.998%-Ta 99.9985% (metals basis), (去除最高25ppm的碱土金属) 99.9985% metals basis 99.999% (REO) 99.999% metals basis ,无水 99.999% metals basis,1-10mm 99.999% metals basis,2-3cm 99.999% metals basis,2-7mm 99.999% metals basis,200目 99.999% metals basis,60目 99.999% metals basis,>200目 99.999% metals basis,beads,1-6 mm 99.999% metals basis,正交晶系 99.999% metals basis, 60目 99.999% metals basis, Si 10ppm 最高 99.999% metals basis,1-5mm 99.999% metals basis,1-6 mm,beads 99.999% metals basis,1-6mm 99.999% metals basis,1-6mm,颗粒 99.999% metals basis,300目 99.999% metals basis,beads,1-6 mm 99.999% metals basis,powder 99.999% trace metals basis,powder 99.999%(metals basis) 99.999%(metalsbasis去除Ni),Ni<0.2% 99.999%-K 99.999%-La 99.999%-Mg 99.999%-Nb 99.999%-Ni 99.999%-Pt 99.999%metals basis 99.999%,5N 99.999+% 99.9998% metas basis 99.9999% metals basis,1-5mm 99.9999% metals basis,≥100目 99.9999% metals basis,1-5mm 99.9999% metals basis,单晶棒状 99.99999% metals basis,块状 99.99999% metals basis,棒状或块状 995-1005 ug/ml V(3+) 的 2% HNO3溶液(20°C) 99atom%13C 9:1 mixture of gentisic Acid and 2-hydroxy-5-methoxybenzoic acid 9个品种2000ng/μl异丙醇溶液 <1% diethylene glycol monobutyl ether <100 nm 粒径(DLS), 30 wt. % 异丙醇溶液 <100nm,99.9% metals basis <160 nm particle size(BET),98% <200 nm,99.9% metals basis <30nm,纯度≥99.5% <45μm > 550 units/mg > 75%(NMR) > 95% > 98% by HPLC >100 IU/mg >10U/mg >15U/mg >170U/mg >200 I.U. per mg >200 U/mg >25u/mg >30 % absorption capacity (water)(at 80% rel. humidity, 25°C) >300万单位/1ml >30U/mg >50%,直径:<5nm,长度:<50μm >52%(GC) >55%,直径:<2nm,长度:5-30μm >55.0%(GC) >55.0%(HPLC) >60 U/mg >60.0%(HPLC) >60.0%(NMR) >61 wt. % F >62.0%(GC) >70%,外径:200-600nm,长度:5-50μm >70%,外径:30-60nm,长度:1-10μm >70% >70.0%(N) >70.0% >74.0%(GC) >75%(GC) >75% >75.0%(GC)(含稳定剂氧化镁) >75.0%(T) >75.0% >78.0%(GC) >78.0%(T) >80.0%(GC),含200-650ppm MEHQ稳定剂 >80.0%(GC),含250ppm MEHQ稳定剂 >80.0%(GC),含约20%反-异构体 >80.0%(GC)(total of isomer) >80.0%(GC),含200-650ppm MEHQ稳定剂 >80.0%(GC,sum of isomers) >80.0%(GC,异构体混合物) >80.0%(LC) >800U/mg >85%, stabilized with Hydroquinone >85.0%(E) >85.0%(GC)(T) >85.0%(N) >85.0%(NMR) >87.0%(GC) >88.0%(GC),~1% MEHQ as inhibitor >88.0%(HPLC) >89% >90% (HPLC) >90%(GC),含100 ppm 对叔丁基邻苯二酚稳定剂 >90%(GC),含1000ppmMEHQ稳定剂 >90%(GC),单脂 >90%(GC),含100 ppm 对叔丁基邻苯二酚稳定剂 >90%(HPLC)(混旋) >90%(LC) >90%(T) >90%,内径:5-15nm,外径:30-80nm,长度:<10μm >90%,内径:5-15nm,外径:>50nm,长度:1-5μm >90%,外径:1-2nm,长度:5-30μm >90%,外径:10-20nm,长度:20-100μm >90%,外径:10-20nm,长度:5-20μm >90%,外径:8-15nm,长度:30-50μm >90%,工业级 >90.0%(E) >90.0%(GC),含250ppm MEHQ稳定剂 >90.0%(GC),含稳定剂BHT >90.0%(HPLC)(T) >90.0%(NMR) >90.0%(N) >90.0%(GC,As fatty acid amide ) >91% >93%(GC) >93%(HPLC) >93%(T) >93% >93.0%(E) >93.0%(GC)(T) >93.0%(LC),顺反混合物 >94.0%(GC)(T) >94.0%(HPLC) >94.0%(N),来源于卡那霉素链霉菌 >94.0% >95% by HPLC >95%, 外径:8-15nm, 长度:~50μm, SSA:>140m2/g >95%,内径:2-5nm,外径:20-30nm,长度:0.5-2μm >95%,内径:3-5nm,外径:8-15nm,长度: ~50μm >95%,内径:3-5nm,外径:8-15nm,长度:0.5-2um >95%,内径:5-10nm,外径:20-30nm,长度:0.5-2μm >95%,内径:5-12nm,外径:30-50nm,长度:10-30μm >95%,内径:5-15nm,外径:30-80nm,长度:<10μm >95%,内径:5-15nm,外径:>50nm,长度:10-20μm >95%,内径:5-15nm,外径:>50nm,长度:<10μm >95%,外径:10-20nm,长度:10-30μm >95%,外径:30-80nm,长度:<10um >95%,外径:5-15nm,长度:10-30μm >95%,外径:8-15nm,长度: ~50μm >95%,外径:8-15nm,长度:~50μm >95%,外径:10-20nm,长度:10-30μm >95%,外径:8-15nm,长度:~50μm >95.0% (GC) >95.0%(E) >95.0%(GC&T) >95.0%(GC) ,含0.2 % CaCO3/MgO (1:1)稳定剂 >95.0%(GC) ,含0.2 % CaCO3/MgO (1:1)稳定剂 >95.0%(GC)(N) >95.0%(GC),ca 0.5%碳酸钾 稳定剂 >95.0%(GC),含3-5%水作稳定剂 >95.0%(GC),含铜屑稳定剂 >95.0%(GC),含稳定剂BHT >95.0%(GC,sum of isomers) >95.0%(LC&T) >95.0%(N)(T) >95.0%(NMR) >95.0%(T),mixture >95.0%(T),硬型,混合物 >95.0%(sum of isomers) >95.0%,含稳定剂铜屑 >95.5%(HPLC) >95% >96%(GC&T) >96%(NMR) >96%(GC) >96.0%(GC),含0.1% TBC稳定剂 >96.0%(GC,mixture of cis and trans isomers) >96.5% >97%(LC&N) >97%(T&LC) >97%(T) >97.0%(GC&T) >97.0%(GC) ,含500ppm TBC稳定剂 >97.0%(GC)(N) >97.0%(GC)(T), 约含0.5% MEHQ 稳定剂 >97.0%(GC)(total of isomers) >97.0%(GC),含50ppm TBC稳定剂 >97.0%(GC),含稳定剂MEHQ >97.0%(GC),含稳定剂铜 >97.0%(GC) >97.0%(LC) >97.0%(N),[铜和镁用超高灵敏分光光度试剂][用于以高效液相色谱金属同时测定] >97.0%,total of isomer >97.0%(HPLC) >97.0%(tatal of isomers) >97.0%,total of isomer >98 % (HPLC) >98% (GC) >98% Isotopic Purity 99% >98% USP >98%(GC&N) >98%(HLPC) >98%,外径:30-50nm,长度:<10μm >98%,外径:30-80nm,长度:<10μm >98%,管径:5-10nm,管长:0.5-2μm,比表面积>380m2/g,灰份含量:<1.5% >98.0% (GC)(含100ppm BHT稳定剂) >98.0%(GC&T) >98.0%(GC) ,含铜作稳定剂 >98.0%(GC)(含稳定剂HQ) >98.0%(GC),(含稳定剂BHT) >98.0%(GC),含0.5%碳酸钾稳定剂 >98.0%(GC),含<1%正丁硫醇稳定剂 >98.0%(GC),含稳定剂HO-TEMPO >98.0%(GC),含稳定剂MEHQ >98.0%(GC),含稳定剂环氧丙烷 >98.0%(GC),含100ppmTBC稳定剂 >98.0%(GC,顺反异构体混和物) >98.0%(LC),含≤5%己烷 >98.0%(T&LC) >98.0%(T)(N) >98.0%(T)(约40%水润湿品) (单位重量以干重计) >98.0%(T),升华提纯 >98.0%(W)(T) >98.0%(顺反异构体混合物,主要为反式) >98.0%(GC) >98.0%(HPLC) >98.0 >98.5% >99 % (HPLC) >99%(GC),包含180-200 ppm MEHQ 稳定剂 >99%(GC) >99%(HPLC) >99.0% (GC),含100ppm BHT稳定剂 >99.0% (GC), 无色液体 >99.0% (HPLC), Sublimed >99.0%(GC) ,含200ppm 4-叔丁基邻苯二酚稳定剂 >99.0%(GC) ,含100ppm 4-叔丁基邻苯二酚稳定剂 >99.0%(GC),含 0.25% 环氧丙烷稳定剂 >99.0%(GC),含10-1100ppmMEHQ稳定剂 >99.0%(GC),含250ppm MEHQ稳定剂 >99.0%(GC),含50-150 ppm BHT稳定剂 >99.0%(GC),含≤100 ppm MEHQ 稳定剂 >99.0%(GC),250ppm MEHQ做稳定剂 >99.0%(GC),含MEHQ稳定剂 >99.0%(GC),含稳定剂HQ >99.0%(GC),用于HPLC荧光标记 >99.0%(GC),用于生化研究 >99.0%(HPLC) ,升华提纯 >99.0%(HPLC),用于荧光标记 >99.00% >99.5%(GC),含30ppmDMBP稳定剂 >99.5%(GC),含40ppm二异丙胺 稳定剂 >99.5%(HPLC) >99.5%,粒径<5.0um >99.6%(HPLC) >99.8%(HPLC) >99.9%(GC) >99.9%,外径:20-30nm,长度:5-30μm >99.9%,外径:30-50nm,长度:≤10μm >99.9%,外径:10-20nm, 长度:5-30μm >99.9%(GC) >99.9%,外径:10-20nm,长度:5-30μm >99.9%,外径:30-50nm,长度:<10μm >99.9%,外径:30-80nm,长度:<10μm >99.998% >= 98 % HPLC, solid >=97 % A Grade, -200 mesh A Grade, 100-200 mesh A Grade, 16-30 mesh A Grade, 30-60 mesh A Grade, 60-100 mesh A solution in Ethanol:Water (95:5) A solution in acetone,>95% A solution in acetone A solution in acetonitrile,>95% A solution in acetonitrile,>98% A solution in acetonitrile,≥99% A solution in benzene,≥65% A solution in chloroform,≥95% A solution in chloroform A solution in ethanol,>90% A solution in ethanol,Mixture of oligomers A solution in ethanol,≥97% A solution in ethanol:chloroform (1:1),>98% A solution in ethyl acetate A solution in methyl acetate,98% A solution in methyl acetate,>95% A solution in methyl acetate,>96% A solution in methyl acetate,≥95% A solution in methyl acetate,≥97% A solution in methyl acetate,≥99% deuterated forms (d1-d4) A solution in methyl acetate,≥99% deuterated forms (d1-d5) A solution in methyl acetate,≥99% A solution in methyl acetate. A solution in methylene chloride,98% A solution of Methyl Acetate A soultion in methyl acetate AAS ACRYL/BIS 29:1, 30% 溶液 ACS reagent, 99% ACS reagent, ≥99.0% ACS reagent, ≥99.5% ACS reagent,85 % ACS reagent,90 % ACS reagent,95 % ACS reagent,98% ACS reagent,99% ACS reagent,≥93.0% ACS reagent,≥99.5% ACS reagent, chips, 33.5-36.5% ACS reagent,99% ACS spectrophotometric grade, ≥99.9% ACS 光谱级,≥99.9% ACS 级,用于痕量分析 ACS ,≥99.5% ACS, 28.0-30.0% NH3 basis ACS, 70% ACS, 79.5-81.0% ACS, 81-83% as MoO3 ACS, 98.0% ACS, 98.0-101.0% ACS, 98.0-102.0% ACS, 99-102.0% ACS, 99.0-102.0% ACS, 99.3% ACS, 99.7-100.5% (dry basis) ACS, 99.8% ACS, 99.95-100.05% ACS, K ≤0.02%, ≥98.0% (T), 片状 ACS, Pt 37.5% min ACS, SO2≥6% ACS, ≥85 wt. % in H2O ACS, ≥90% ACS, ≥93.0% ACS, ≥96% ACS, ≥97% ACS, ≥98.0% (RT) ACS, ≥98.0% (UV) ACS, ≥99.0% (GC) ACS, ≥99.0% (T) ACS, ≥99.4% ACS, ≥99.5%,水分≤0.2% ACS, ≥99.9% ACS,37 wt. % in H2O,含10-15%甲醇稳定剂 ACS,48% ACS,70% ACS,88% ACS,95 % ACS,98.0-103.0% ACS,98.5%(isomers plus ethylbenzene) ACS,98.5% ACS,98.5-102.0% ACS,99.0%,正交晶系 ACS,99.0-100.5% ACS,99.0-101% ACS,99.0-101.0% ACS,99.0-102.0% ACS,99.5-101.0% ACS,99.8-100.3% ACS,99.95-100.05% ACS,99.9995% metals basis ACS,>98% ACS,>99%(GC) ACS,>99.0% ACS,Dye content 95 % ACS,≥80.0% ACS,≥90% ACS,≥90.0% ACS,≥96.0% ACS,≥97.0% ACS,≥98.0%(RT) ACS,≥98.0% ACS,≥98.5% ACS,≥99.0%(GC),contains 250 ppm BHT as inhibitor ACS,≥99.0%(GC) ACS,≥99.0%(NT) ACS,≥99.0%(RT) ACS,≥99.5%(GC) ACS,≥99.5%,含50-150ppm异戊烯稳定剂 ACS,≥99.7% ACS,≥99.9% ACS,含 ~200 ppm 乙酰苯胺稳定剂, 30 wt. % in H2O ACS,干燥级,用于水分吸收 ACS光谱级,≥99.5%(GC) ACS光谱级,≥99.8%(GC) ACS光谱级,≥99.8% ACS级,≥99.5% ACS, 99% ACS, Pt 37.5% min ACS, ≥85% ACS, ≥98.0% (RT) ACS, ≥99% ACS, ≥99.0% (GC) ACS, ≥99.4% ACS, ≥99.5% ACS,48% ACS,97%,片状 ACS,98% ACS,98.0-102.0% ACS,98.0-103.0% ACS,99.0% ACS,99.0-101% ACS,99.5-101.0% ACS,>98% ACS,≥97.0% ACS,≥99.5%(GC) ACS,≥99.7% AL2O3≥30% APS≈2微米, 99.9% metals basis AR 98% AR 85% AR 99.0% AR ≥100目,from wood AR, SO2≥6% AR, ≥40% AR, ≥85 wt. % in H2O AR, ≥96.0% AR, ≥98% AR, ≥99% AR, ≥99.5% (T) AR,100目 AR,15.0~20.0% TiCl3 basis in 30%HCl AR,25-28% AR,3-10目,2-7mm AR,30% NH3 basis(T) AR,30.0-32.0% AR,300-400目 AR,40 wt. % in H2O AR,40% AR,40-45% MgO basis AR,50% in H2O AR,50%溶液 AR,54-57% Cu basis AR,55.3% SnO2 AR,6-14% 活性氯(过滤处理) AR,6-14% 活性氯 AR,60%水溶液 AR,65-68% AR,70.0-72.0% AR,8-16目或1-2mm AR,80% AR,80%溶液 AR,85-90% AR,85.0% AR,88% AR,91% AR,92.5-100.5% AR,95 % AR,96%,颗粒状 AR,97.0 % AR,97.5% AR,98%(GC) AR,98%,含1-3%乙醇稳定剂 AR,98.0 % AR,98.5%,含0.05% MEHQ 稳定剂 AR,99%(二甲苯异构体+乙基苯) AR,99%,含20-30ppm BHT稳定剂 AR,99%,含30ppmDMBP稳定剂 AR,99.0%,含40ppm二异丙胺 稳定剂 AR,99.0%,正交晶系 AR,99.0-102.0% (T) AR,99.5%(GC) AR,99.5%,含50-150ppm异戊烯稳定剂 AR,99.50% AR,99.7% AR,99.9% AR,>40.0% AR,>95.0%(HPLC) AR,>97.0%(GC) AR,>98.0%(GC) AR,>98.0%(HPLC) AR,>99%(GC),包含180-200 ppm MEHQ 稳定剂 AR,>99.0% AR,Co 13.5~14.5% AR,Dye content ≥80 % AR,Dye content ≥85 % AR,Fe 21-23 % AR,Fe:20.5-22.5% AR,Mg 4.0-5.0% AR,Mn >47% AR,Mo≥61.1 % AR,Pd 46.0 - 48.0 % AR,Pt ≥37.5% AR,bp 30-60 °C AR,bp 60-90 °C AR,bp 90-120 °C AR,mixture AR,≥200目,袋装 AR,≥85.0% MoO3 basis AR,≥90.0% AR,≥92 % AR,≥97.0% (GC) AR,≥97.0%(GC) AR,≥98%(GC) AR,≥98.0% (GC) AR,≥98.0% (HPLC) AR,≥98.0%((HPLC)) AR,≥98.0% AR,≥98.5 %(GC) AR,≥98.5% AR,≥99 % AR,≥99% (titration) AR,≥99%(HPLC) AR,≥99.0% (HPLC) AR,≥99.0% (KT) AR,≥99.5 %,粒径;2-4 mm AR,≥99.5% (NT) AR,≥99.5%(GC) AR,≥99.5%(T) AR,≥99.7% AR,≥99.8% AR,含10-15%甲醇稳定剂 AR,含4-10%冰醋酸稳定剂 AR,含54-60% NaPO3稳定剂 AR,显色剂 AR,模数:2.00-2.20 AR,模数:2.30-2.50 AR,模数:2.80-3.00 AR,模数:3.10-3.40 AR,环保试剂,96% AR,甲/乙试液各500ml AR,碱溶 AR,粉末,99.0% AR,醇溶 AR,钠型 AR.98.0% AR, 325目, 白色 AR, 98% AR, 99.0%,白色晶体 AR, >95% AR, SO2≥6% AR, ≥75 wt. % in H2O AR, ≥85 wt. % in H2O AR, ≥98.0% (RT) AR, 含~75 ppm BHT稳定剂 AR,10-15ppm TBC as Stabilizer AR,100nm AR,2000目 AR,30-33 wt. % 乙醇溶液 AR,40% AR,40-45% MgO basis AR,40.0% AR,54-57% Cu basis AR,55.3% SnO2 AR,57.5% AR,75% AR,81-83% as MoO3 AR,85% AR,85-90% AR,85.0% AR,90.0% AR,92% AR,95 % AR,96.5% AR,97.0 % AR,98.5 % AR,99% metals basis AR,99%,含10ppm BHT稳定剂 AR,99.00% AR,99.5%,粉末 AR,99.7% AR,99.999% metals basis AR,>97.0%(GC) AR,>98.0%(GC) AR,>98.0%(T) AR,>98.5%(GC) AR,>99.0%(T) AR,Co 13.5~14.5% AR,Co 43.0 - 47.0 % AR,Fe 21-23 % AR,Mg 4.0-5.0% AR,Mn >47% AR,Pd 46.0 - 48.0 % AR,Pt ≥37.5% AR,Ratio(MgO/Al2O3)=1~3,失水率:≤8.5% (100℃,1h) AR,≥47.0%,含≤1.5 % H3PO2 稳定剂 AR,≥60% AR,≥80%,GC AR,≥85.0% MoO3 basis AR,≥98.0% (HPLC) AR,≥98.0% AR,≥98.5 %(GC) AR,≥99 % AR,≥99% (titration) AR,≥99.0%(RT) AR,≥99.5%(GC) AR,≥99.5%,200目 AR,含0.025% BHT 稳定剂 AR,块状 AR,干燥级 AR,无水级 AR,模数:2.00-2.20 AR,模数:2.30-2.50 AR,模数:2.80-3.00 AR,模数:3.10-3.40 AR,水分≤0.3% AR,白色粉末 AR,硅改性 AR,硝酸法 AR,硫酸铝法 AR,碳化法 AR,磷改性 AR,镧改性 ASTM 颜色标准液样本A1;颜色:1;APHA、ACS和ASTM方法:D6045,D1500 ASTM 颜色标准液样本A3;颜色:3;APHA、ACS和ASTM方法:D6045,D1500 ASTM 颜色标准液样本A5;颜色:5;APHA、ACS和ASTM方法:D6045,D1500 ASTM 颜色标准液样本A7;颜色:7;APHA、ACS和ASTM方法:D6045,D1500 Acetic Acid R (300 g/L) Acetic acid, sodium salt, 99%, for HPLC, anhydrous Acetone solution Acid Blank, 5% (v/v) Nitric Acid Al2O3≥28% AlPhos Alkylating Agent, 90% Ammonium Hydroxide Solution, 10% (w/v) NH₃ Ammonium Hydroxide Solution, 18% (w/w) NH₄OH Ammonium) Hydroxide, 10% (v/v) Analysis of standard solution 0.17 M Analysis of standard solution 0.30 M Analysis of standard solution of 0.35 M Analysis of standard solution, 0.01 M Analysis of standard solution, 0.02 M Analysis of standard solution, 0.05 M Analysis of standard solution, 0.25 M Analysis of standard solution, 0.5M Analysis standard, ≥98.0% (HPLC) Analysis standard, ≥99.8% (GC) Analysis standard, ≥99.9% (GC) Analytical Volumetric Solution, 0.1 M in Water Analytical Volumetric Solution,0.001M Analytical Volumetric Solution,0.00282M,1ml=0.1mgCl2 Analytical Volumetric Solution,0.004M Analytical Volumetric Solution,0.0125M Analytical Volumetric Solution,0.01M in Methanol Analytical Volumetric Solution,0.0250M Analytical Volumetric Solution,0.04M Analytical Volumetric Solution,0.0551M Analytical Volumetric Solution,0.09M Analytical Volumetric Solution,0.111M Analytical Volumetric Solution,0.1M in Ethanol Analytical Volumetric Solution,0.2M Analytical Volumetric Solution,0.5M in Ethanol Analytical Volumetric Solution,0.5M in Methanol Analytical Volumetric Solution,1.0M in Ethanol Analytical Volumetric Solution,1.0M in Methanol Analytical Volumetric Solution,10.0M Analytical Volumetric Solution,3.0M Analytical Volumetric Solution,3.57M Analytical Volumetric Solution,5.0M Analytical Volumetric Solution,6M Analytical Volumetric Solution,8.0M Analytical standards, ≥99.5% (GC) Analytical titration,0.02M Analytical titration,0.05M Analytical titration0.05M Approx Mw 90000 Approximately ~15% wt/vol in Ethyl Acetate,≥95% Aqueous solution ~0.206 M,≥99% Aqueous solution As,Cd,Cr:100μg/ml;Pb,Hg:200μg/ml(,in :5% HNO3,2% HCL) Au 23.5~23.8% in dilute HCl Au ≥47.5% Au≥51% Au≥82% Available chlorine 4.0 % Average Mw~216,000 by LS,Average Mn~80,000,Powder B344695 BAEE >10000 Unit/mg BC,99% BENTONE 27,应用在中等到高等极性溶剂 BENTONE 38,应用在极性溶剂体系中 BET:350-450㎡/g BF3 46.5% BF3:17.5 - 19.0 % BF3:30.0 - 35.0 % BOD5:56.6 mg/L,COD(Cr):87.6 mg/L,,in water BP2007,药用级 BR,10~25% BR,水溶性 BR,10-20u/mg BR,100u/mg BR,120u/g BR,28% BR,32.5万IU/g BR,40% BR,5万U/g BR,70万u/g BR,98% BR,99% BR,来源于牛奶 BS, Dye content 65 % Bentone SD-1,适于中至低极性溶剂 Bentone SD-2,适于中高极性溶剂 Bi,Se,Sn,Te,50μg/ml;As,P,Sb,100μg/ml;Fe,Ni,Pb,S,Zn,200μg/ml BioChemika, >= 96.0 % TLC BioChemika, ≥99% BioReagent, suitable for electrophoresis, 98.0-102.0% BioReagent, suitable for insect cell culture, 85% BioReagent, suitable for insect cell culture, ~1360 IU/g BioReagent, suitable for mouse embryo cell culture BioReagent, suitable for fluorescence, ≥98.0% (T) BioReagent,中颗粒 BioReagent,粗颗粒 BioReagent,细颗粒 BioXtra, ≥98.0% (TLC) Biochemical reagent Biological Stain grade Biological stain,生化试剂级 Biothnology grade Black granular Black granular,45% glass particles as reinforcer Boiling point 184-188℃ C14-C17混标,52% Cl,100ppm溶于环己烷 标准品 10ml C14:98% C16:30%, C18:21%, C18F1:45% C16:30%, C18:70% C16:50%, C18:45% C16:65-75%, C18:16-26% C16:98% C16:54%-62%;C18:38%-44% C18:30%, C16:70% C18:40% C18:50% C18:65% C18:98% C8:3%,C10:6%,C12:53%, C14:18%, C16:9%, C18:4% C=0.100mg/ml U=1% C=500μg/mL U=3%(k=2) CARBON 44%-45% CAU-10, Isophthalate:Al=0.9-1.0 CNTs / Mica:10/90 CNTs / Titanium Dioxide:10/90 CNTs / Titanium Dioxide:20/80 CNTs / Titanium Dioxide:6/94 CNTs/ Dispersant/ Epoxy resin:4.5/2.4/93.1 CNTs/ Hiblack 40B2:40/60 CNTs/ Polystyrene microsphere:20/80 CNTs/Dispersant: 90/10 CNTs含量:10wt% CNTs含量:15wt% COD(Mn):3.03mg/L in water CP ,99% CP,100目 CP,20-30目 CP,40.0% CP,60.0% CP,68% CP,85% CP,85.0% CP,94% CP,95 % CP,96% CP,98%,含0.025% BHT 稳定剂 CP,98%,含50ppmMEHQ稳定剂 CP,98.0% ,含20ppm MEHQ稳定剂 CP,>98.0% (GC) CP,>98.0%(HPLC) CP,>98.0%(T) CP,≥60.0% (GC) CP,≥65%(GC) CP,≥97% CP,≥98% CP,含10-15ppm 4-叔-丁基邻苯二酚稳定剂 CP,用于合成 CP-42 CP-52 CP-70 CP,10-20目 CP,60.0% CP,80% CP,88% CP,90.0% CP,99%,1-4mm CP,99%,粉末 CP,>98%(GC) CP,Co 43.0 - 47.0 % CP,Mn >44% CP,≥97.0%(RT) CP,≥98.0% CP,粉末 CTAB Free(波长 650 nm) CTAB Free(波长 650-850 nm) CTAB Free(波长 700 nm) CTAB Free(波长 750 nm) CTAB Free(波长 800 nm) CTAB Free(波长 850 nm) Ca: 20.0 ~ 24.0 % Ca:2060mg/L Mg:77.25mg/L 硬度:5465mg/L;基体: HCl Ca:2858mg/L Mg:90.50mg/L hardness7510mg/L;in HCl Calcium Hydroxide TS (Saturated Aqueous Solution) Calcium Standard for IC,100 mg/L Ca2+ in nitric acid Calcium Standard for IC,1000 mg/L Ca2+ in nitric acid Calorinatedbenzenes:1,2-Dichlorobenzene、1,3-Dichlorobenzene、1,4-Dichlorobenzene、1,2,4-trichlorobenzene,analytical standard Cd ≥75% Chromocyanine R method Citric Acid / Potassium(钾) Citrate (1:1), 0.45 Molar, pH 4.5 Citric Acid / Potassium(钾) Citrate, 0.6 Molar / 0.6 Molar, pH 4.2 Cl,13.3-15.8% Clear Aqueous Solution Clear Solution Co 7.8 - 8.2%,溶剂:40%-80%矿物油 Co 7.8 - 8.2%,溶剂:40%-80%的石脑油 Co 9-10% Collagen from cow calcaneal tendon,Type I Colloidal solution of silica particles coated with silane Contain ~30% Cis isomer Contains 50% sodium chloride Contains up to 20% 17-alpha Contains ~10% triethylammonium iodide Contains ~14% d3 Contains ≤10% Ethylene dichloride,≥95% Content(1-MCP): ≥4.0% Content(1-MCP): ≥4.0%,Carrier cyclodextrin Covenan 50ug/mL,in 0.1mol/L NaOH Co≥4.0%水溶液 Co:66%-70%,≤85um,分散在水中 Cr 24% Cu ~8% Cu:8% Cu:9.5%-10.9%,200目 Cu、Zn、Cd、Pb、Cr、Se、Sb、Ni、Ba、As each 100μg/mL in 10%HCl Cu含量33%-42.8% Cu含量:55-56% D,99%,85 wt.% in D2O D,99%(65 wt.% in D2O) D,99%,无水级 D,99.5%(0.03% TMS) D,99.5%, 含0.03 % (v/v) TMS D,99.6%(0.03% v/v TMS) D,99.6% D,99.60% D,99.8% (0.03% v/v TMS) D,99.8% (0.05% v/v TMS) D,99.9% D,99.94% D,99.96%(0.03% v/v TMS) D.99.9% +0.03%TMS D.99.9% +0.05%TMS D.99.9% +1%TMS D.99.9% D40 D50<600nm,99.95% metals basis D50<600nm,99.9% metals basis D60 D80 DS ~7 DS=0.7 ,200-500mPa.s Description:Non Ratio 10 NTU Description:Non Ratio 100 NTU Description:Non Ratio 1000 NTU Description:Non Ratio 20 NTU Description:Non Ratio 200 NTU Description:Non Ratio 40 NTU Description:Non Ratio 400 NTU Description:Non Ratio 4000 NTU Description:Non Ratio 5 NTU Description:Non Ratio 50 NTU Description:Non Ratio 500 NTU Description:Non Ratio 60 NTU Description:Non Ratio 800 NTU Description:Non Ratio 90 NTU Description:Ratio 0.0 NTU Description:Ratio 0.1 NTU Description:Ratio 0.2 NTU Description:Ratio 0.4 NTU Description:Ratio 0.5 NTU Description:Ratio 1 NTU Description:Ratio 10 NTU Description:Ratio 2 NTU Description:Ratio 20 NTU Description:Ratio 4 NTU Description:Ratio 40 NTU Description:Ratio 5 NTU Description:Ratio 50 NTU Description:Ratio 60 NTU Description:Ratio 90 NTU Digestion Acid, Water : Nitric Acid : Hydrochloric Acid, 2 : 2 : 1 Dilute R (125 g/L HNO₃) Dye content 15 % Dye content 30 % Dye content 30% Dye content 45 % Dye content 60 % Dye content 60% Dye content 65 % Dye content 75 % Dye content 75% Dye content 96% Dye content >85 % Dye content >85%